TW200506315A - Substrate holder, substrate processing apparatus, substrate inspection device and method of using the same - Google Patents

Substrate holder, substrate processing apparatus, substrate inspection device and method of using the same

Info

Publication number
TW200506315A
TW200506315A TW093113262A TW93113262A TW200506315A TW 200506315 A TW200506315 A TW 200506315A TW 093113262 A TW093113262 A TW 093113262A TW 93113262 A TW93113262 A TW 93113262A TW 200506315 A TW200506315 A TW 200506315A
Authority
TW
Taiwan
Prior art keywords
substrate
fluid layer
processing apparatus
inspection device
same
Prior art date
Application number
TW093113262A
Other languages
Chinese (zh)
Other versions
TWI242634B (en
Inventor
Ryu Ohtaguro
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200506315A publication Critical patent/TW200506315A/en
Application granted granted Critical
Publication of TWI242634B publication Critical patent/TWI242634B/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41B—SHIRTS; UNDERWEAR; BABY LINEN; HANDKERCHIEFS
    • A41B9/00—Undergarments
    • A41B9/001—Underpants or briefs
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41B—SHIRTS; UNDERWEAR; BABY LINEN; HANDKERCHIEFS
    • A41B2400/00—Functions or special features of shirts, underwear, baby linen or handkerchiefs not provided for in other groups of this subclass
    • A41B2400/38—Shaping the contour of the body or adjusting the figure
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41B—SHIRTS; UNDERWEAR; BABY LINEN; HANDKERCHIEFS
    • A41B2400/00—Functions or special features of shirts, underwear, baby linen or handkerchiefs not provided for in other groups of this subclass
    • A41B2400/44—Donning facilities
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41B—SHIRTS; UNDERWEAR; BABY LINEN; HANDKERCHIEFS
    • A41B2400/00—Functions or special features of shirts, underwear, baby linen or handkerchiefs not provided for in other groups of this subclass
    • A41B2400/60—Moisture handling or wicking function
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41B—SHIRTS; UNDERWEAR; BABY LINEN; HANDKERCHIEFS
    • A41B2500/00—Materials for shirts, underwear, baby linen or handkerchiefs not provided for in other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Jigs For Machine Tools (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A substrate holder, a substrate processing apparatus and a substrate inspection device capable of holding the substrate in a state of keeping the flatness possessed by the substrate itself, and performing measurement, process, and inspection with high precision, as well as the method of using the same, are provided. A substrate holder which holds the substrate above the face of a plate, comprises fluid layer forming means 11b,11d between substrate S and the face of the plate 11a for forming the fluid layer for floating substrate S and positioning means 13 holding substrate S stably by the fluid layer and abutting at least the under surface or the lateral surface of substrate S floated by the fluid layer for positioning the substrate at a predetermined position at the face of the plate 11a.
TW093113262A 2003-05-14 2004-05-12 Substrate holder, substrate processing apparatus, substrate inspection device and method of using the same TWI242634B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003136427A JP4268447B2 (en) 2003-05-14 2003-05-14 Substrate holder, substrate processing apparatus, substrate inspection apparatus, and methods of use thereof

Publications (2)

Publication Number Publication Date
TW200506315A true TW200506315A (en) 2005-02-16
TWI242634B TWI242634B (en) 2005-11-01

Family

ID=33526396

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093113262A TWI242634B (en) 2003-05-14 2004-05-12 Substrate holder, substrate processing apparatus, substrate inspection device and method of using the same

Country Status (4)

Country Link
JP (1) JP4268447B2 (en)
KR (1) KR100809648B1 (en)
CN (1) CN100378944C (en)
TW (1) TWI242634B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100830053B1 (en) * 2007-03-29 2008-05-16 주식회사 피앤드엠 Chuck for carrying substrate of non-contact type
KR100849084B1 (en) * 2007-05-22 2008-07-30 위아무역주식회사 Glass board align unit
JP2010040788A (en) * 2008-08-05 2010-02-18 Olympus Corp Lift device and substrate inspection device
CN102014361B (en) 2009-09-07 2014-02-19 华为技术有限公司 Authentication authorization accounting (AAA) session updating method, device and system
KR101190967B1 (en) 2009-12-22 2012-10-12 크루셜엠스 주식회사 Supply and an adhesion system consecutive both tape automation for a cellular phone case
CN202257028U (en) * 2011-09-13 2012-05-30 深圳市华星光电技术有限公司 Lcd exposure platform device and exposure system
KR101412114B1 (en) 2012-11-20 2014-06-26 리노정밀(주) Apparatus for testing
KR101716803B1 (en) 2014-12-18 2017-03-15 이채갑 Probe device
JP6018659B2 (en) * 2015-02-27 2016-11-02 株式会社日本製鋼所 Atmosphere forming apparatus and levitation conveyance method
JP6874314B2 (en) * 2016-09-30 2021-05-19 株式会社ニコン Object holding device, exposure device, flat panel display manufacturing method, and device manufacturing method
CN108766901B (en) * 2018-06-26 2020-07-31 上海华力微电子有限公司 Method for detecting flatness of wafer worktable
KR20210040684A (en) * 2019-10-04 2021-04-14 (주)포인트엔지니어링 Micro led display manufacturing device and method of manufacturing micro led display
KR102378017B1 (en) 2020-06-19 2022-03-25 리노정밀(주) Connector Jig and Conducting Wire Connecting Device and Connection Method of Such Connector Jig
KR20220086749A (en) 2020-12-16 2022-06-24 리노정밀(주) Substrate Inspection Apparatus for Easy Inspection

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6325916A (en) * 1986-07-17 1988-02-03 Sharp Corp Vaepor growth apparatus
JPH028121A (en) * 1988-06-22 1990-01-11 Hitachi Electron Eng Co Ltd Wafer conveyor
JPH05299492A (en) * 1992-04-17 1993-11-12 Nachi Fujikoshi Corp Wafer positioning apparatus
JPH0620904A (en) * 1992-07-03 1994-01-28 Seiko Epson Corp Coordinate measuring device
JPH06340333A (en) * 1993-05-31 1994-12-13 Hitachi Ltd Conveying device by gas flow
JPH07124837A (en) * 1993-10-29 1995-05-16 Nachi Fujikoshi Corp Positioning method and device for plate glass
JPH0846017A (en) * 1994-07-29 1996-02-16 Sony Corp Apparatus and method for positioning of board
JPH0961111A (en) * 1995-08-28 1997-03-07 Nikon Corp Method and device for measuring pattern coordinates
JP3691146B2 (en) * 1996-02-06 2005-08-31 東芝機械株式会社 XY stage and method for inspecting flat inspection object
JPH11165868A (en) * 1997-12-06 1999-06-22 Horiba Ltd Plate member holding device
JP2000062951A (en) * 1998-08-19 2000-02-29 Daiichi Shisetsu Kogyo Kk Conveying apparatus
JP2000216208A (en) * 1999-01-20 2000-08-04 Hitachi Ltd Method and system for visual inspection and manufacture of semiconductor device
JP3602359B2 (en) * 1999-02-10 2004-12-15 エスペック株式会社 Positioning device for flat work
CN102152966B (en) * 2003-04-30 2013-03-27 奥林巴斯株式会社 Substrate-levitating device

Also Published As

Publication number Publication date
JP4268447B2 (en) 2009-05-27
JP2004342771A (en) 2004-12-02
KR100809648B1 (en) 2008-03-05
CN1551327A (en) 2004-12-01
CN100378944C (en) 2008-04-02
KR20040098586A (en) 2004-11-20
TWI242634B (en) 2005-11-01

Similar Documents

Publication Publication Date Title
TW200506315A (en) Substrate holder, substrate processing apparatus, substrate inspection device and method of using the same
SG144740A1 (en) Methods and systems for processing a substrate using a dynamic liquid meniscus
SG148015A1 (en) Lithographic apparatus and device manufacturing method
SG115843A1 (en) Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
CN101378037B (en) Cutting method and cutting device
WO2009022457A1 (en) Substrate bonding apparatus and substrate bonding method
TW200610046A (en) System and method for process control using in-situ thickness measurement
BRPI0604244A (en) method of forming a workpiece, shaped article, and apparatus for processing a workpiece
SG123762A1 (en) Lithographic apparatus and method for determining z position errors/variations and substrate table flatness
ATE431963T1 (en) DEVICE AND METHOD FOR SURFACE TREATMENT OF SUBSTRATES
TW200731447A (en) Bonding means and bonding apparatus for supporting plate, and bonding method for supporting plate
WO2004032160A3 (en) Methods and systems for processing a substrate using a dynamic liquid meniscus
TW200600883A (en) Fine pattern modification device and modification method of the fine pattern defect
TW200712438A (en) Apparatus and method for measuring shape of both sides of a plate
ATE548751T1 (en) METHOD AND SYSTEM FOR REACTIVE ATOMIC PLASMA PROCESSING WITH ATMOSPHERIC PRESSURE FOR SURFACE MODIFICATIONS
TW200644075A (en) Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus background of the invention
TW200613927A (en) Imprint lithographic apparatus, device manufacturing method and device manufactured thereby
MY142184A (en) Method and apparatus for transporting a substrate using non-newtonian fluid
TW200710195A (en) Pressure-sensitive adhesive sheet, production method thereof and method of processing articles
TWI350914B (en) Systems and methods of inspecting a sample's surface and systems and methods for identifying a defect
TW200702650A (en) Method and device for obtaining work position information
WO2007035423A3 (en) Method and apparatus for vertically orienting substrate processing tools in a clean space
MY140551A (en) System for processing electronic devices
TW200802567A (en) Method of cutting and machining a silicon wafer
TW200734263A (en) Substrate exchange apparatus and substrate processing apparatus, and substrate inspection apparatus

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees