TW200510575A - Plating apparatus and method - Google Patents

Plating apparatus and method

Info

Publication number
TW200510575A
TW200510575A TW093125843A TW93125843A TW200510575A TW 200510575 A TW200510575 A TW 200510575A TW 093125843 A TW093125843 A TW 093125843A TW 93125843 A TW93125843 A TW 93125843A TW 200510575 A TW200510575 A TW 200510575A
Authority
TW
Taiwan
Prior art keywords
plating liquid
plating
impurity removal
removal means
feeds
Prior art date
Application number
TW093125843A
Other languages
English (en)
Chinese (zh)
Other versions
TWI373537B (ja
Inventor
Souichi Obata
Yuuichi Kameyama
Original Assignee
Almex Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Almex Inc filed Critical Almex Inc
Publication of TW200510575A publication Critical patent/TW200510575A/zh
Application granted granted Critical
Publication of TWI373537B publication Critical patent/TWI373537B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/06—Filtering particles other than ions
TW093125843A 2003-09-02 2004-08-27 Plating apparatus and method TW200510575A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003309954A JP4707941B2 (ja) 2003-09-02 2003-09-02 めっき処理装置およびめっき処理方法

Publications (2)

Publication Number Publication Date
TW200510575A true TW200510575A (en) 2005-03-16
TWI373537B TWI373537B (ja) 2012-10-01

Family

ID=34411963

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093125843A TW200510575A (en) 2003-09-02 2004-08-27 Plating apparatus and method

Country Status (4)

Country Link
JP (1) JP4707941B2 (ja)
KR (1) KR101133372B1 (ja)
CN (1) CN1637171A (ja)
TW (1) TW200510575A (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100934729B1 (ko) * 2007-10-29 2009-12-30 (주)화백엔지니어링 무전해 주석도금액 불순물 제거장치 및 방법
JP5457010B2 (ja) * 2007-11-01 2014-04-02 アルメックスＰｅ株式会社 連続めっき処理装置
CN102995094A (zh) * 2011-09-19 2013-03-27 代芳 电镀槽中金属离子浓度稳定的方法
JP2016130363A (ja) * 2015-01-09 2016-07-21 Tdk株式会社 めっき装置
TWI615363B (zh) * 2016-04-08 2018-02-21 科閎電子股份有限公司 降低電解液中至少一污染性陽離子濃度的方法
CN106917132B (zh) * 2017-04-27 2018-12-07 北京纽堡科技有限公司 一种电镀装置
CN107723745B (zh) * 2017-09-25 2019-09-17 杨家华 一种冶金电解槽装置
KR20190065527A (ko) 2017-12-02 2019-06-12 오준혁 회전 및 접이식 빨래건조대
JP7061792B2 (ja) * 2018-07-27 2022-05-02 日本表面化学株式会社 めっき装置及びめっき製品の製造方法
CN112941600A (zh) * 2021-01-25 2021-06-11 沛县卓凡科技服务中心 一种精密仪器电镀设备

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS554297Y2 (ja) * 1976-01-29 1980-01-31
JPH0294260U (ja) * 1989-01-13 1990-07-26
JP2001049499A (ja) * 1999-08-12 2001-02-20 Ebara Corp めっき装置
JP2001316893A (ja) * 2000-05-01 2001-11-16 Shimonoseki Mekki Kk 不溶性陽極を使用する表面処理方法及びその装置
JP2003013291A (ja) * 2001-06-29 2003-01-15 Almex Inc めっき処理装置
JP4014827B2 (ja) * 2001-07-25 2007-11-28 シャープ株式会社 メッキ処理装置

Also Published As

Publication number Publication date
KR20050024184A (ko) 2005-03-10
JP2005076100A (ja) 2005-03-24
KR101133372B1 (ko) 2012-04-06
CN1637171A (zh) 2005-07-13
JP4707941B2 (ja) 2011-06-22
TWI373537B (ja) 2012-10-01

Similar Documents

Publication Publication Date Title
TW200510575A (en) Plating apparatus and method
EP0841305A3 (en) Process and apparatus for the production of electrolyzed water
UA94710C2 (ru) Электрод, способ получения сплава и его использование в качестве анода, способ извлечения химически активного металла с использованием этого электрода и электролизер, который включает этот электрод
TW200738911A (en) Electrolytic apparatus for producing fluorine or nitrogen trifluoride
PT1583719E (pt) Método e aparelho para remoção de impurezas das águas residuais por electroflotação
WO2006020022A3 (en) System and method for producing copper powder by electrowinning in a flow-through electrowinning cell
EP1081096A3 (en) Electrolytic reduced water, anti-cancer drug, and producing method and apparatus thereof
UA88064C2 (ru) Устройство для поддержки анодов и способ его осуществления
PE20140643A1 (es) Electrorecuperacion de oro y plata a partir de soluciones de tiosulfato
RU2620228C1 (ru) Способ электрохимической регенерации медно-аммиачного травильного раствора
MXPA05004201A (es) Proceso de electrolisis y celda para el uso en el mismo.
MY140696A (en) Process for the preparation of metal hydroxides or basic metal carbonates
EP2531451B1 (en) Method and apparatus for the purification of hydrogen sulfide -containing aqueous solutions
WO2005080640A3 (en) Process and plant for electrodepositing copper
CN104152947A (zh) 分离回收废旧电路板中金属的悬浮电解装置
GB9810305D0 (en) Method and apparatus for the treatment of a melt
CA2883744C (en) System and method for oxidizing organic compounds while reducing carbon dioxide
CL2004001020A1 (es) Equipo de control de depositacion catodica perimetral, comprende perfiles guia catodos energizables mediante conductores electricos insertos en sentido longitudinal del perfil, fijados en lados opuestos de una estructura soportante de material aislan
TW200512057A (en) Electrolytic processing apparatus and electrolytic processing method
KR101297953B1 (ko) 코발트의 전해 채취 방법
CN202755076U (zh) 长效（寿）复合筐式阳极
WO2008142632A3 (en) Electrolytic cell and electrolyzing equipment
BR0212832B8 (pt) cÉlula para eletràlise de diafragma para a produÇço eletrolÍtica de cloro e soda cÁustica, mÉtodo para a produÇço de cloro e soda cÁustica em uma cÉlula e mÉtodo para incrementar a superfÍcie eletrolÍtica de uma cÉlula de eletràlise de diafragma.
FR2918673B1 (fr) Installation et procede pour l'etamage electrolytique de bandes d'acier
CN103103557A (zh) 新型电解槽

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees