TW200500393A - Lactone addition hindered amine compound - Google Patents
Lactone addition hindered amine compoundInfo
- Publication number
- TW200500393A TW200500393A TW093115030A TW93115030A TW200500393A TW 200500393 A TW200500393 A TW 200500393A TW 093115030 A TW093115030 A TW 093115030A TW 93115030 A TW93115030 A TW 93115030A TW 200500393 A TW200500393 A TW 200500393A
- Authority
- TW
- Taiwan
- Prior art keywords
- amine compound
- hindered amine
- substituted
- alkyl groups
- unsubstituted alkyl
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3432—Six-membered rings
- C08K5/3435—Piperidines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D211/40—Oxygen atoms
- C07D211/44—Oxygen atoms attached in position 4
- C07D211/46—Oxygen atoms attached in position 4 having a hydrogen atom as the second substituent in position 4
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Hydrogenated Pyridines (AREA)
- Polyesters Or Polycarbonates (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003150189 | 2003-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200500393A true TW200500393A (en) | 2005-01-01 |
Family
ID=33487169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093115030A TW200500393A (en) | 2003-05-28 | 2004-05-27 | Lactone addition hindered amine compound |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060205847A1 (zh) |
EP (1) | EP1642892A1 (zh) |
JP (1) | JPWO2004106303A1 (zh) |
TW (1) | TW200500393A (zh) |
WO (1) | WO2004106303A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI499866B (zh) * | 2009-09-24 | 2015-09-11 | Jsr Corp | Sensitive radiation linear resin composition |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009019062A (ja) * | 2006-03-30 | 2009-01-29 | Daicel Chem Ind Ltd | ポリウレタン組成物 |
JP5656213B2 (ja) * | 2010-01-19 | 2015-01-21 | 日本化薬株式会社 | カルボン酸組成物、及び該カルボン酸組成物を含有する硬化性樹脂組成物 |
US9969864B2 (en) * | 2013-07-08 | 2018-05-15 | Basf Se | Light stabilizers |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62143926A (ja) * | 1985-12-17 | 1987-06-27 | Daicel Chem Ind Ltd | ラクトン変性ジオ−ル |
US5246991A (en) * | 1989-05-23 | 1993-09-21 | Sumitomo Chemical Company, Limited | Polyvinyl chloride resin composition |
JP3714574B2 (ja) * | 1997-03-26 | 2005-11-09 | ダイセル化学工業株式会社 | 紫外線吸収剤とその製造方法および合成樹脂組成物 |
JP3714575B2 (ja) * | 1997-03-26 | 2005-11-09 | ダイセル化学工業株式会社 | 紫外線吸収剤とその製造方法及び合成樹脂組成物 |
JP2000095849A (ja) * | 1998-09-21 | 2000-04-04 | Daicel Chem Ind Ltd | ベンゾトリアゾール基含有ポリエステル、その製造方法、それを含む紫外線吸収剤、及び合成樹脂組成物 |
US6727300B2 (en) * | 2000-11-03 | 2004-04-27 | Cytec Technology Corp. | Polymeric articles containing hindered amine light stabilizers based on multi-functional carbonyl compounds |
-
2004
- 2004-05-27 TW TW093115030A patent/TW200500393A/zh unknown
- 2004-05-27 US US10/558,177 patent/US20060205847A1/en not_active Abandoned
- 2004-05-27 EP EP04735103A patent/EP1642892A1/en not_active Withdrawn
- 2004-05-27 WO PCT/JP2004/007638 patent/WO2004106303A1/ja active Application Filing
- 2004-05-27 JP JP2005506544A patent/JPWO2004106303A1/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI499866B (zh) * | 2009-09-24 | 2015-09-11 | Jsr Corp | Sensitive radiation linear resin composition |
Also Published As
Publication number | Publication date |
---|---|
US20060205847A1 (en) | 2006-09-14 |
EP1642892A1 (en) | 2006-04-05 |
JPWO2004106303A1 (ja) | 2006-07-20 |
WO2004106303A1 (ja) | 2004-12-09 |
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