TW200420199A - Mechanism for minimizing ion bombardment energy in a plasma chamber - Google Patents

Mechanism for minimizing ion bombardment energy in a plasma chamber

Info

Publication number
TW200420199A
TW200420199A TW093102033A TW93102033A TW200420199A TW 200420199 A TW200420199 A TW 200420199A TW 093102033 A TW093102033 A TW 093102033A TW 93102033 A TW93102033 A TW 93102033A TW 200420199 A TW200420199 A TW 200420199A
Authority
TW
Taiwan
Prior art keywords
plasma chamber
ion bombardment
bombardment energy
minimizing ion
breaks
Prior art date
Application number
TW093102033A
Other languages
English (en)
Inventor
Juan Jose Gonzalez
Andrew Shabalin
Fernando Gustavo Tomasel
Original Assignee
Advanced Energy Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Ind Inc filed Critical Advanced Energy Ind Inc
Publication of TW200420199A publication Critical patent/TW200420199A/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/28—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/24—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
TW093102033A 2003-01-31 2004-01-29 Mechanism for minimizing ion bombardment energy in a plasma chamber TW200420199A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/355,619 US6724148B1 (en) 2003-01-31 2003-01-31 Mechanism for minimizing ion bombardment energy in a plasma chamber

Publications (1)

Publication Number Publication Date
TW200420199A true TW200420199A (en) 2004-10-01

Family

ID=32069546

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093102033A TW200420199A (en) 2003-01-31 2004-01-29 Mechanism for minimizing ion bombardment energy in a plasma chamber

Country Status (5)

Country Link
US (1) US6724148B1 (zh)
JP (1) JP2006516805A (zh)
KR (1) KR20050106409A (zh)
TW (1) TW200420199A (zh)
WO (1) WO2004070742A2 (zh)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6822396B2 (en) * 2003-01-31 2004-11-23 Advanced Energy Industries, Inc. Transformer ignition circuit for a transformer coupled plasma source
ATE543199T1 (de) * 2005-05-23 2012-02-15 New Power Plasma Co Ltd Plasmakammer mit entladung induzierender brücke
JP5257917B2 (ja) * 2006-04-24 2013-08-07 株式会社ニューパワープラズマ 多重マグネチックコアが結合された誘導結合プラズマ反応器
US11615941B2 (en) 2009-05-01 2023-03-28 Advanced Energy Industries, Inc. System, method, and apparatus for controlling ion energy distribution in plasma processing systems
US9287086B2 (en) 2010-04-26 2016-03-15 Advanced Energy Industries, Inc. System, method and apparatus for controlling ion energy distribution
US9435029B2 (en) 2010-08-29 2016-09-06 Advanced Energy Industries, Inc. Wafer chucking system for advanced plasma ion energy processing systems
US9767988B2 (en) 2010-08-29 2017-09-19 Advanced Energy Industries, Inc. Method of controlling the switched mode ion energy distribution system
US9287092B2 (en) * 2009-05-01 2016-03-15 Advanced Energy Industries, Inc. Method and apparatus for controlling ion energy distribution
US9309594B2 (en) 2010-04-26 2016-04-12 Advanced Energy Industries, Inc. System, method and apparatus for controlling ion energy distribution of a projected plasma
US9362089B2 (en) 2010-08-29 2016-06-07 Advanced Energy Industries, Inc. Method of controlling the switched mode ion energy distribution system
US8723423B2 (en) * 2011-01-25 2014-05-13 Advanced Energy Industries, Inc. Electrostatic remote plasma source
US9220162B2 (en) * 2011-03-09 2015-12-22 Samsung Electronics Co., Ltd. Plasma generating apparatus and plasma generating method
US8884525B2 (en) 2011-03-22 2014-11-11 Advanced Energy Industries, Inc. Remote plasma source generating a disc-shaped plasma
US10225919B2 (en) 2011-06-30 2019-03-05 Aes Global Holdings, Pte. Ltd Projected plasma source
KR101241049B1 (ko) 2011-08-01 2013-03-15 주식회사 플라즈마트 플라즈마 발생 장치 및 플라즈마 발생 방법
US9210790B2 (en) 2012-08-28 2015-12-08 Advanced Energy Industries, Inc. Systems and methods for calibrating a switched mode ion energy distribution system
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
KR101909571B1 (ko) 2012-08-28 2018-10-19 어드밴스드 에너지 인더스트리즈 인코포레이티드 넓은 다이내믹 레인지 이온 에너지 바이어스 제어； 고속 이온 에너지 스위칭； 이온 에너지 제어와 펄스동작 바이어스 서플라이； 및 가상 전면 패널
JP5962773B2 (ja) * 2012-12-28 2016-08-03 ニュー パワー プラズマ カンパニー リミテッド プラズマ反応器及びこれを用いたプラズマ点火方法
KR101468726B1 (ko) * 2012-12-28 2014-12-08 주식회사 뉴파워 프라즈마 플라즈마 반응기
KR101930241B1 (ko) 2015-03-13 2018-12-18 어드밴스드 에너지 인더스트리즈 인코포레이티드 플라즈마 소스 디바이스 및 방법들
TWI767088B (zh) 2017-11-17 2022-06-11 新加坡商Ａｅｓ全球公司 電漿處理系統，用於調變其中的電源的控制方法及相關的電漿處理控制系統
EP3711080B1 (en) 2017-11-17 2023-06-21 AES Global Holdings, Pte. Ltd. Synchronized pulsing of plasma processing source and substrate bias
TW202329762A (zh) 2017-11-17 2023-07-16 新加坡商Aes 全球公司 用於在空間域和時間域上控制基板上的電漿處理之系統和方法，及相關的電腦可讀取媒體
JP2022541004A (ja) 2019-07-12 2022-09-21 エーイーエス グローバル ホールディングス， プライベート リミテッド 単一制御型スイッチを伴うバイアス供給装置
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6264812B1 (en) * 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
US6011704A (en) * 1997-11-07 2000-01-04 Sierra Applied Sciences, Inc. Auto-ranging power supply

Also Published As

Publication number Publication date
KR20050106409A (ko) 2005-11-09
JP2006516805A (ja) 2006-07-06
WO2004070742A3 (en) 2005-03-24
US6724148B1 (en) 2004-04-20
WO2004070742A2 (en) 2004-08-19

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