TW200304429A - Ozone water supplying apparatus - Google Patents

Ozone water supplying apparatus Download PDF

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Publication number
TW200304429A
TW200304429A TW092104843A TW92104843A TW200304429A TW 200304429 A TW200304429 A TW 200304429A TW 092104843 A TW092104843 A TW 092104843A TW 92104843 A TW92104843 A TW 92104843A TW 200304429 A TW200304429 A TW 200304429A
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Taiwan
Prior art keywords
ozone
ozone water
concentration
aforementioned
water
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TW092104843A
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Chinese (zh)
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TWI225038B (en
Inventor
Junji Mizutani
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Sasakura Eng Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/78Treatment of water, waste water, or sewage by oxidation with ozone
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2326Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles adding the flowing main component by suction means, e.g. using an ejector
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00Dissolving
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/21Measuring
    • B01F35/213Measuring of the properties of the mixtures, e.g. temperature, density or colour
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/21Measuring
    • B01F35/2132Concentration, pH, pOH, p(ION) or oxygen-demand
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/22Control or regulation
    • B01F35/221Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
    • B01F35/2211Amount of delivered fluid during a period
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80Forming a predetermined ratio of the substances to be mixed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80Forming a predetermined ratio of the substances to be mixed
    • B01F35/83Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
    • B01F35/833Flow control by valves, e.g. opening intermittently
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/312Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/78Details relating to ozone treatment devices
    • C02F2201/782Ozone generators
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/78Details relating to ozone treatment devices
    • C02F2201/784Diffusers or nozzles for ozonation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/23O3
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/23O3
    • C02F2209/235O3 in the gas phase

Abstract

An ozone water supplying apparatus (1) comprising an ejector (2) connected with a pure water introduction pipe (12) and an ozone gas introduction pipe (13) and sucking/mixing ozone gas through the ozone gas introduction pipe (13) by pure water flow being introduced through the pure water introduction pipe (12), and a pipe (5) for supplying ozone water produced by the ejector (2) to a use point, is characterized in that the ozone gas introduction pipe (13) is provided with a flow regulation mechanism (25), the ozone water supply pipe (5) is provided with a detector (24) for detecting the concentration of ozone water, and a control means (30) regulates the opening of the flow regulation mechanism (25) based on the concentration detected by the concentration detector (24). The ozone water supplying apparatus (1) can supply ozone water of a desired concentration intermittently and economically with high efficiency.

Description

200304429 玖、發明說明 (發明說明應敘明:發明所屬之技術領域、先前技術、内容、實施方式及圓式簡單說明) t發明所屬技領域j 發明領域 本發明係有關於一種電子零件等之製造步驟中,用以 5供給使用於清洗或剝離抗蝕劑等之臭氧水之臭氧水供給裝 置,特別是有關於一種可間歇性地供給臭氧水之臭氧水供 給裝置。 【先前技術】 φ 發明背景 10 ^主,聽水係使用於電子零件等之濕法清洗及微影 成像步驟之抗蝕劑剝離等,且係藉在臭氧水製造裝置中冑 . 臭氧溶解於超純水來製造。已知以知的習知臭氧水供給裝 置係如日本專利公開公報特開平7_185572號公報中所揭示 者’其構成如第3圖所示。 15 如同圖所示,該臭氧水供給裝置中,臭氧供給管52及 U & 54係連接於噴射器5〇,利用由供水管往喷射器 φ 2之水a ’由臭氧產生器%產生之臭氧則透過臭氧供給 2吸引至嘴射|| 5G内而與超純水混合,並生成臭氧水 。該臭氧水係供給至氣液分離裝置%,且在分離未溶狀 20臭氧後,透過臭氧水供給管6〇而供給至使用點。 ^ 離裝置58設有用以測定臭氧水之臭氧濃度之濃 曰十 並於臭氧水供給管60設有用以測定臭氧水之流 L里σ十64 ’而控制裝置66則根據濃度計62及流量計 64之檢測結果’藉電壓調整器68調整臭氧產生器56之電 5 200304429 玖、發明說明 壓。 然而,即使上述之臭氧水供給裝置使臭氧產生器56之 電壓產生變化,由於在喷射器50吸引之臭氧之量也不會立 刻產生變化,故有臭氧水濃度之追蹤性不佳之問題。因此 ' 5 ,必須間歇性地供給臭氧水時,在開始供給後不久之臭氧 水要安定至所期望之濃度則必須經過長時間的等待(根據上 述公報為5〜6分鐘),這期間不僅會浪費廢棄之臭氧水,且 有產生製程時間之損失等問題。 · 又,在多數個使用點使用臭氧水時,當分開臭氧供給 1〇管5且在各使用點製造臭氧水時,由於臭氧產生器56之電 壓變化會對全部的使用點中之臭氧流量造成影響。故要在 各使用點個別控制臭氧水濃度係困難的。另一方面,若構 造成將臭氧水供給管60分開且導至各使用點時,由於臭氧 水供給官60之移送距離必然會變長(例如,2〇〜ι〇〇⑹,故 15有溶解令之臭氧在移送中會進行自我分解而有臭氧濃度降 低之虞。因此,以往,必須在各使用點附近設置臭氧產i Φ 裝置而有°又備成本咼且在保養方面也有問題。 【^^明内容;J 發明之揭示 20 本發明係為解決上述問題而作成者,其目的在於提供 一種在經濟上可有效率地間歇供給所期望遭度之臭氧水之 臭氧水供給裝置。 本發明之前述目的係藉由臭氧水供給裝置而達成 且4臭氧水供給裝置具有··一噴射器,係連接純水 6 200304429 玖、發明說明 導入管及臭氧導入管,並藉由透過前述純水導入管導 入之純水之水流,透過前述臭氧導入管以吸引混合臭 、 氧者;及一臭氧水供給管,係將前述噴射器所生成之 臭氧水供給至使用點者,又’該臭氧導入管設有流量 5調整機構,而前述臭氧水供給管設有用以檢測臭氧水 濃度之濃度檢測器,且具有一根據前述濃度檢測器之 檢測進行前述流量調整機構之開度調整的控制機構。 前述控制機構宜在前述濃度檢測器之檢測濃度低於預 · 定濃度時,加大前述流量調整機構之開度,且當前述濃度 10檢測器之檢測濃度咼於預定濃度時,則縮小前述流量調整 機構之開度。 又,前述臭氧導入管之一端連接於臭氧產生裝置,另 一端則透過多數個分配管而連接於多數個前述喷射器。此 時,前述濃度檢測器宜分別設於連接於前述喷射器之前述 15臭氧水供給管。而且,前述控制機構宜根據前述濃度檢測 器之檢測,進行對應之前述流量調整機構之開度調整。 鲁 圖式簡單說明 第1圖係顯示有關本發明之一實施形態之臭氧水供給 裝置之概略構造方塊圖。 20 第2圖係顯示第1圖所示之臭氧水供給裝置之適用例 之方塊圖 第3圖係顯示習知之臭氧水供給裝置之概略構造方塊 圖。 7 200304429 玖、發明說明 I:實施方式3 發明實施之最佳形態 以下’參照添附圖式說明本發明之實施形態。第1圖 係顯示有關本發明之一實施形態之臭氧水供給裝置之概略 5構造方塊圖。如同圖所示,臭氧水供給裝置1係具有喷射 器2及氣液分離裝置3。 噴射器2係構成為接連有純水導入管12及臭氧導入管 13,當純水導入管12所導入之純水由喷嘴(未圖示)喷射時 ,則稭該水流由臭氧導入管13吸引導入臭氧且在内部加以 1〇 ’⑽合。導入之純水及臭氧可分別藉公知之純水製造裝置及 臭氧產生裝置來製造。純水製造裝置可使用,例如逆滲透 純水製造裝置,且以具有離子交換樹脂等之濾芯而可製造 冋純度之超純水者為佳。又,臭氧產生裝置可舉將純水進 行電氣分解且產生高濃度之臭氧之電解法臭氧產生裝置為 例並且宜具有可使一次侧之供給壓力為固定之壓力調整 閥、及用以處理過剩之臭氧之排氣臭氧分解器。 噴射器2之排出側係透過混合管4而連接於氣液分離 扁置3,而由噴射器2混合之純水及臭氧則透過混合管4 而導入於氣液分離裝置3。 乳液分離装置3係連接臭氧排出管14及臭氧水供給管 臭氧排出官14則連接於充填有臭氧分解觸媒之臭氧 分解器15。去a ★ ' 禾洛解於由混合管4導入氣液分離裝置3之純 二中之過剩的臭氧,則透過臭氧排出管14移送至臭氧分解 5而刀解成氧,且僅臭氧水可透過臭氧水供給管5供給 200304429 玖、發明說明 至使用點。又’有關氣液分離裝置亦可使公知者,例如, 利用離心力將臭氧水與臭氧分離之旋流式者、使氣液二相 流於檔板相撞之檔板式者、或使用鐵絲網進行氣液分離之 破沫式者等。 5 純水導入管12、臭氧水供給管5、及臭氧排出管14中 分別有純水供給閥21、臭氧水供給閥22、及臭氧排出閥 23設於其中,且這些開關係透過控制裝置3〇來控制。 又’臭氧水供給管5之中設溶解臭氧監測器24設於其 中,且臭氧導入管13具有流量調整機構25。溶解臭氧監 1〇測器24係用以檢測通過之臭氧水之臭氧濃度之濃度檢測器 ,並將檢測結果輸出至控制裝置3〇。溶解臭氧監測器24 且使用反應特性良好之直線式,但即使為抽樣式亦可藉修 正反應時間來使用。又,流量調整機構25係由如可連續地 變化臭氧導人管13之開度之可變配流閥等構成,並藉控制 15裝置30調整開度。 其次,說明具有以上構造之臭氧水供給裝置之動作。 在臭氧水供給時,係藉使純水供給閥21、臭氧水供給閥Μ 、及臭氧排出㈣23任-者皆為開放狀態而將臭氧及純水導 入噴射器2。導人喷射n 2之純水宜為高度精製之超純水 >〇 • 供給臭氧於臭氧導入管13之臭氧產生裝置(未圖示) 之供給壓力宜在0.1〜0.3MPaG之範圍内。 業、’·二‘入噴射器2之臭氧及純水在通過噴射器2及混 合管4之過程中成為充分混合之臭氧水,且在氣液分離裝 置3除去過剩之臭氧後,透過臭氧水供給管5供給臭氧水 200304429 玖、發明說明 供給之臭氧水的/辰度可藉溶解臭氧監測器24而經常進行 檢測並輸入至控制裝置30。 控制裝置30係當臭氧水濃度高於所期望濃度時,將流 量調整機構25之開度縮小,且使導入於喷射器2之臭氧之 5流量減少,此外,當臭氧水濃度低於所期望濃度時,則將 流篁調整機構25之開度放大,且使導入於喷射器2之臭氧 之流量增多。其結果是即使臭氧水之供給量等有所變動, 亦可將臭氧水濃度之保持在大略所期望之值。 · 在間歇供給臭氧水等期間,當臭氧水之停止信號輸入 1〇至控制裝置30時,控制裝置30則使純水供給閥21及臭氧 排出閥23為關閉狀態,而停止臭氧水之供給。且,由於往 喷射器2之臭氧之導入係藉伴隨水流之吸引力來進行,因 此當關閉純水供給閥21而要導入於喷射器2之純水之水流 沒有時,往喷射器2之臭氧之導入亦停止。更進一步,藉 15關閉臭氧排出閥23可防止殘留於氣液分離裝置3之臭氧往 外部洩漏。其結果是不會浪費地廢棄純水及臭氧,而可停 · 止臭氧水之供給。又,在臭氧水之供給停止期間,在臭氧 產生裝置產生之臭氧中產生過剩之臭氧時,可藉如具備該 臭氧產生裝置之前述排氣臭氧分解器(未圖示)來進行分解 20 〇 停止預定期間之供給後,當臭氧水之要求信號輸入至 控制裴置30時,控制裝置30則使純水供給閥21及臭氧排 出閥23為開放狀態,再度開始往喷射器2之純水之供給。 藉此,噴射器2内會產生純水之水流,同時也開始臭氧之 10 200304429 砍、發明說明 吸引。由臭氧水供給管5供給之臭氧水之濃度在再度開始 供給後不久會有點不安定,但藉控制裝置川根據溶解純 監測器24之檢測而調整流量調整機構25之開度,可維持 . 所期望之值。因此’臭氧水之供給開始不久後,可供給戶斤 5期望濃度之臭氧水,且不需浪費地廢棄臭氧水。由控制裝 置30控制之純水供給閥21及臭氧排出闕η之開關、及流 量調整機構25之職調整係在,供給臭氧水期間反覆地 進行。 籲 在多數個使用點使用臭氧水時,係如第2圖所示,構 10造成將連接於1台之臭氧產生裝置4G之臭氧導人管13分 開’然後由分配管l3a、13b、13c、13d將臭氧導引各使用 點附近。分配管13a〜13d中分別設有流量調整機構25。又 ,喷射器2、氣液分離裝置3、臭氧水供給管5、純水導入 管12、及控制裝置30等也設置於各使用點,而控制裝置 15 3〇則根據溶解臭氧監測器24之檢測,調整對應於使用點 之分配管13a〜13d之流量調整機構25之開度。 · 藉該等構造,即使臭氧之產生源為丨處,由於在個別· 之多數個使用點中,可個別控制臭氧水之濃度,因此可減 少设備成本,同時亦容易進行保養。又,由於可以臭氧之 20狀怨移送至各使用點之後才製造臭氧水,因此不需以臭氧 水之狀態進行長距離移送,而移送中之臭氧會進行自然分 解,且可防止臭氧水之濃度降低之問題。尤其,在使用藉 短波長(185nm)之紫外線分解含有有機物之純度極高之超純 水時’利用該等構造之臭氧水供給裝置之效果更明顯。 11 200304429 玖、發明說明 實施例 第2圖所示之構造中,臭氧產生裝置係使用將純水進 行電氣分解來產生高濃度之臭氧之電解法臭氧產生裝置, 並使用臭氧之最大產生量為48g/h者。而且,將臭氧之壓 5 力控制成經常維持在O.IMPaG,並使產生之臭氧的濃度為 230g/m3,且藉由臭氧導入管13分歧之分配管13a〜13d, 均等地分配至各臭氧供給裝置1。臭氧導入管13及分配管 13a〜13d係使用内徑4mm、外徑6mm之氟素樹脂管路,由 臭氧產生裝置40至各使用點之臭氧流路係分別作成40m、 10 60m、70m、及80m。又,各臭氧水供給裝置1中,透過純 水導入管12導入臭氧水製造裝置2之純水之流量,係設定 成由臭氧水供給管4供給之臭氧水在穩定狀態下為流量2.5 L/分、濃度20ppm。又,氣液分離裝置3係使用旋風式, 而流量調整機構係使用可變式配流閥。溶解臭氧監測器24 15 則係使用篩檢式之溶解臭氧監測器。 在該條件下,使純水供給閥21、臭氧水供給闊22、及 臭氧排出閥23為開放狀態,開始供給臭氧水。而且,距離 臭氧產生裝置40最遠之使用點中,在測定由臭氧水供給管 5供給之臭氧水之濃度時,係如以下所示之表1。 12 20 200304429 玖、發明說明 表1 臭氧水濃度 __(ppm) 供給開始時 0 5秒後 16 10秒後 19 20秒後 21 30秒後 20 由表1可清楚明瞭’由臭氧水製造裝置2所排出之臭 氧水濃度在臭氧水供給開始時為Qppm,但會隨著時間而 急速上昇,而在10秒後成為19 ppm與大略所期望之值(2〇 ppm)。隨著臭氧水濃度接近期望值,控制裝置3〇會漸漸 縮小流量調整機構25之開度,藉此,臭氧水濃度在之後亦 會維持在大略的期望值。又,該結果亦與其他使用點之情 況相同。 產業上之可利用性 根據本發明之臭氧水供給裝置,由於可在臭氧水之供 給開始後不久,供給所期望濃度之臭氧水,因此間歇供給 臭氧水時,可防止廢棄供給開始後之臭氧水之浪費,更可 解決等待臭氧水之濃度至安定化之時間。 13 200304429 玖、發明說明 L圖式簡單說明3 第1圖係顯示有關本發明之一實施形態之臭氧水供給 裝置之概略構造方塊圖。 第2圖係顯示第1圖所示之臭氧水供給裝置之適用力 5 之方塊圖 第3圖係顯示習知之臭氧水供給裝置之概略構造方塊 圖。 【圖式之主要元件代表符號表】 1...臭氧供給裝置 52...供給管 2,50···喷射管 54...供水管 3,58··.氣液分離裝置 56...臭氧產生器 4…混合管 62…濃度計 5,60…臭氧水供給管 64…流量計 12…純水導入管 68...電壓調整器 13…臭氧導入管 13a〜13d··.分配管 14…臭氧排出管 15…臭氧分解器 21…純水供給閥 22.··臭氧水供給閥 23...臭氧排出閥 24…溶解臭氧監測器 25…流量調整機構 30,66...控制裝置 14200304429 发明 Description of the invention (The description of the invention should state: the technical field to which the invention belongs, prior art, contents, embodiments, and brief explanations) tThe technical field to which the invention belongsj Field of the invention The present invention relates to the manufacture of an electronic part, etc. In the step, an ozone water supply device for supplying ozone water used for cleaning or stripping of a resist and the like, and particularly relates to an ozone water supply device capable of intermittently supplying ozone water. [Prior art] φ Background of the invention 10 ^ Master, listening to water is used for wet cleaning of electronic parts, etc., and resist stripping in lithography imaging steps, and it is made in an ozone water manufacturing device. Ozone is dissolved in ultra Made with pure water. The conventional known ozone water supply device is disclosed in Japanese Patent Laid-Open Publication No. 7-185572 'and its structure is shown in FIG. 3. 15 As shown in the figure, in this ozone water supply device, the ozone supply pipe 52 and U & 54 are connected to the ejector 50, and the water a ′ from the water supply pipe to the ejector φ 2 is generated by the ozone generator%. Ozone is drawn into the mouth through the ozone supply 2 || 5G and mixed with ultrapure water to generate ozone water. This ozone water system is supplied to the gas-liquid separation device, and after the undissolved 20 ozone is separated, it is supplied to the use point through the ozone water supply pipe 60. ^ The separating device 58 is provided with a concentration of ten for measuring the ozone concentration of ozone water, and the ozone water supply pipe 60 is provided with a means for measuring the flow of ozone water σ ten 64 'while the control device 66 is based on a concentration meter 62 and a flow meter. The test result of 64 'adjusts the electricity of the ozone generator 56 by the voltage regulator 68. 200304429 5. The invention explains the pressure. However, even if the above-mentioned ozone water supply device changes the voltage of the ozone generator 56, since the amount of ozone sucked by the ejector 50 does not change immediately, there is a problem that the traceability of the ozone water concentration is not good. Therefore, when it is necessary to supply ozone water intermittently, it is necessary to wait a long time to stabilize the ozone water to the desired concentration shortly after the start of supply (5 to 6 minutes according to the above bulletin). Wasted ozone water is wasted, and there are problems such as loss of process time. In addition, when ozone water is used at a plurality of use points, when the ozone supply pipe 10 is separated and ozone water is produced at each use point, the change in voltage of the ozone generator 56 will cause ozone flow at all the use points. influences. Therefore, it is difficult to individually control the concentration of ozone water at each use point. On the other hand, if the ozone water supply pipe 60 is configured to be separated and guided to each use point, the transfer distance of the ozone water supply officer 60 will inevitably become longer (for example, 20 to 500,000), so 15 will dissolve. Ozone may be self-decomposed during transportation and the ozone concentration may be reduced. Therefore, in the past, it was necessary to install an ozone-producing device i Φ near each point of use, which was costly, and also had problems in maintenance. [^ ^ 明 内容; J Disclosure of the Invention 20 The present invention was made to solve the above problems, and its object is to provide an ozone water supply device that can economically and efficiently intermittently supply ozone water of a desired degree. The foregoing object is achieved by an ozone water supply device and the 4 ozone water supply device has an ejector connected to pure water 6 200304429 玖, an introduction pipe of the invention and an ozone introduction pipe, and passing through the aforementioned pure water introduction pipe The water flow of the introduced pure water passes through the aforementioned ozone introduction pipe to attract the mixed odor and oxygen; and an ozone water supply pipe is used to supply the ozone water generated by the aforementioned ejector to the In addition, the ozone introduction pipe is provided with a flow rate 5 adjustment mechanism, and the aforementioned ozone water supply pipe is provided with a concentration detector for detecting the concentration of ozone water, and has a mechanism for performing the aforementioned flow adjustment mechanism based on the detection of the aforementioned concentration detector. A control mechanism for adjusting the opening degree. The foregoing control mechanism should increase the opening degree of the flow rate adjusting mechanism when the detection concentration of the concentration detector is lower than a predetermined concentration, and when the detection concentration of the concentration 10 detector is less than a predetermined value. At the time of concentration, the opening degree of the flow rate adjusting mechanism is reduced. In addition, one end of the ozone introduction pipe is connected to an ozone generating device, and the other end is connected to a plurality of ejectors through a plurality of distribution pipes. At this time, the concentration detection The devices should be respectively provided in the aforementioned 15 ozone water supply pipes connected to the aforementioned ejectors. In addition, the aforementioned control mechanism should adjust the opening degree of the aforementioned flow adjustment mechanism corresponding to the detection by the aforementioned concentration detector. 1 is a block diagram showing a schematic structure of an ozone water supply device according to an embodiment of the present invention 20 Fig. 2 is a block diagram showing an application example of the ozone water supply device shown in Fig. 1. Fig. 3 is a block diagram showing a schematic structure of a conventional ozone water supply device. 7 200304429 发明 Description of the invention I: Embodiment 3 BEST MODE FOR IMPLEMENTING THE INVENTION Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Fig. 1 is a block diagram showing a schematic 5 structure of an ozone water supply device according to an embodiment of the present invention. As shown in the figure, ozone water The supply device 1 includes an ejector 2 and a gas-liquid separation device 3. The ejector 2 is composed of a pure water introduction pipe 12 and an ozone introduction pipe 13, and when the pure water introduced by the pure water introduction pipe 12 is a nozzle (not shown) (Shown) At the time of spraying, the water stream is sucked and introduced into the ozone by the ozone introduction pipe 13 and 10 'coupled inside. The introduced pure water and ozone can be produced by a known pure water production device and ozone generation device, respectively. A pure water production device can be used, such as a reverse osmosis pure water production device, and a filter element having an ion exchange resin or the like can be used to produce ultrapure water of high purity. In addition, the ozone generating device may be an electrolytic ozone generating device that electrolytically decomposes pure water and generates high-concentration ozone. The ozone generating device may include a pressure regulating valve capable of fixing the supply pressure on the primary side, and a device for treating excess Ozone exhaust ozone decomposer. The discharge side of the ejector 2 is connected to the gas-liquid separation unit 3 through the mixing pipe 4, and the pure water and ozone mixed by the ejector 2 are introduced into the gas-liquid separation device 3 through the mixing pipe 4. The emulsion separation device 3 is connected to an ozone discharge pipe 14 and an ozone water supply pipe. The ozone discharge officer 14 is connected to an ozone decomposer 15 filled with an ozone decomposition catalyst. Go to a ★ 'Hollow dissolves the excess ozone in the pure second introduced into the gas-liquid separation device 3 through the mixing tube 4, and then transfers it to the ozone decomposition 5 through the ozone exhaust pipe 14 to decompose it into oxygen, and only ozone water can pass through ozone The water supply pipe 5 supplies 200304429, and the invention is explained to the point of use. Also related to the gas-liquid separation device can be known, for example, a swirling type that separates ozone water from ozone by centrifugal force, a baffle type that allows gas-liquid two-phase flow to collide with a baffle plate, or a barbed wire Liquid-separated foaming type and so on. 5 The pure water introduction pipe 12, the ozone water supply pipe 5, and the ozone discharge pipe 14 are respectively provided with a pure water supply valve 21, an ozone water supply valve 22, and an ozone discharge valve 23, and these open relationships pass through the control device 3. 〇 to control. A dissolved ozone monitor 24 is provided in the ozone water supply pipe 5, and the ozone introduction pipe 13 includes a flow rate adjustment mechanism 25. The dissolved ozone monitor 10 detector 24 is a concentration detector for detecting the ozone concentration of the ozone water passing therethrough, and outputs the detection result to the control device 30. The dissolved ozone monitor 24 has a linear type with good response characteristics, but it can be used by modifying the reaction time even if it is a pumping type. The flow rate adjusting mechanism 25 is composed of, for example, a variable distribution valve that can continuously change the opening degree of the ozone guide pipe 13, and adjusts the opening degree by controlling the device 30. Next, the operation of the ozone water supply device having the above structure will be described. When supplying ozone water, the pure water supply valve 21, the ozone water supply valve M, and the ozone discharge ㈣23 are all opened, and ozone and pure water are introduced into the ejector 2. The pure water for injection n 2 should be highly purified ultra-pure water.> • The supply pressure of the ozone generating device (not shown) for supplying ozone to the ozone introduction pipe 13 should be in the range of 0.1 to 0.3 MPaG. The ozone and pure water that enters the ejector 2 into the ejector 2 become fully mixed ozone water when passing through the ejector 2 and the mixing pipe 4, and after the excess ozone is removed by the gas-liquid separation device 3, the ozone water passes through the ozone water. The supply pipe 5 supplies ozone water 200304429 玖, description of the invention The ozone of the supplied ozone water can be constantly detected by the dissolved ozone monitor 24 and input to the control device 30. When the ozone water concentration is higher than the desired concentration, the control device 30 reduces the opening degree of the flow rate adjustment mechanism 25 and reduces the 5 flow rate of the ozone introduced into the ejector 2. In addition, when the ozone water concentration is lower than the desired concentration At this time, the opening degree of the flow adjustment mechanism 25 is enlarged, and the flow rate of ozone introduced into the ejector 2 is increased. As a result, even if the supply amount of the ozone water is changed, the concentration of the ozone water can be maintained at a substantially desired value. · During intermittent supply of ozone water, etc., when the stop signal of ozone water is input 10 to the control device 30, the control device 30 closes the pure water supply valve 21 and the ozone discharge valve 23, and stops the supply of ozone water. In addition, since the introduction of ozone to the ejector 2 is performed by the attraction force accompanying the water flow, when the pure water supply valve 21 is closed and the flow of pure water to be introduced into the ejector 2 is not present, the ozone to the ejector 2 is not present. The import also stopped. Furthermore, closing the ozone discharge valve 23 by 15 can prevent the ozone remaining in the gas-liquid separation device 3 from leaking to the outside. As a result, pure water and ozone are not wasted, and the supply of ozone water can be stopped. In addition, when the supply of ozone water is stopped, when excess ozone is generated in the ozone generated by the ozone generating device, decomposition can be performed by the aforementioned exhaust ozone decomposer (not shown) provided with the ozone generating device, and the decomposition is stopped. After a predetermined period of time, when the ozone water request signal is input to the control unit 30, the control device 30 opens the pure water supply valve 21 and the ozone discharge valve 23 and restarts the supply of pure water to the ejector 2 . As a result, a stream of pure water will be generated in the ejector 2 and at the same time, the ozone will be cut. The concentration of ozone water supplied by the ozone water supply pipe 5 will be a little unstable shortly after the supply is started again, but by the control device Chuan adjusts the opening of the flow adjustment mechanism 25 according to the detection of the dissolved pure monitor 24, which can be maintained. Expected value. Therefore, shortly after the start of the supply of the ozone water, the household can supply ozone water of a desired concentration, and the ozone water need not be wasted. The pure water supply valve 21 and the switch for ozone discharge 阙 η controlled by the control device 30 and the adjustment of the flow adjustment mechanism 25 are performed repeatedly during the supply of ozone water. When the ozone water is used at most use points, as shown in FIG. 2, the structure 10 separates the ozone guide pipe 13 connected to an ozone generating device 4G, and then the distribution pipes 13a, 13b, 13c, 13d Guide ozone near each point of use. Each of the distribution pipes 13a to 13d is provided with a flow rate adjustment mechanism 25. In addition, the ejector 2, the gas-liquid separation device 3, the ozone water supply pipe 5, the pure water introduction pipe 12, and the control device 30 are also provided at each use point, and the control device 15 30 is based on the dissolved ozone monitor 24. Detect and adjust the opening degree of the flow adjustment mechanism 25 of the distribution pipes 13a to 13d corresponding to the point of use. · With these structures, even if the source of ozone is at one place, the concentration of ozone water can be controlled individually at most points of use, so equipment costs can be reduced and maintenance is also easy. In addition, because ozone water can be transferred to various use points before producing ozone water, it is not necessary to carry out long-distance transfer in the state of ozone water, and the ozone in the transfer will be naturally decomposed, and the concentration of ozone water can be prevented Reduce the problem. In particular, when the ultra-pure water containing organic matter is decomposed by ultraviolet rays with a short wavelength (185 nm), the effect of using such a structured ozone water supply device is more pronounced. 11 200304429 (2) In the structure shown in the second embodiment of the invention, the ozone generating device is an electrolytic ozone generating device that uses electrolytic decomposition of pure water to generate high-concentration ozone, and the maximum amount of ozone used is 48 g. / h 者. In addition, the pressure of ozone is controlled to be constantly maintained at 0.1 MPaG, and the concentration of ozone generated is 230 g / m3, and is distributed equally to each ozone through the distribution pipes 13a to 13d where the ozone introduction pipe 13 diverges. Supplying device 1. The ozone introduction pipe 13 and the distribution pipes 13a to 13d are fluorine resin pipes with an inner diameter of 4 mm and an outer diameter of 6 mm. The ozone flow path from the ozone generating device 40 to each use point is made 40m, 10 60m, 70m, and 80m. In addition, in each ozone water supply device 1, the flow rate of pure water introduced into the ozone water production device 2 through the pure water introduction pipe 12 is set such that the ozone water supplied by the ozone water supply pipe 4 has a flow rate of 2.5 L / in a steady state. Min, concentration 20ppm. The gas-liquid separation device 3 uses a cyclone type, and the flow rate adjustment mechanism uses a variable flow valve. Dissolved ozone monitors 24 15 are screened-type dissolved ozone monitors. Under these conditions, the pure water supply valve 21, the ozone water supply valve 22, and the ozone discharge valve 23 are opened, and the supply of ozone water is started. When the concentration of the ozone water supplied from the ozone water supply pipe 5 is measured at the point of use furthest from the ozone generating device 40, it is as shown in Table 1 below. 12 20 200304429 发明, Description of the invention Table 1 Ozone water concentration __ (ppm) At the start of supply 0 5 seconds after 16 10 seconds after 19 20 seconds after 21 30 seconds after 20 It is clear from Table 1 that the device is made by ozone water 2 The discharged ozone water concentration was Qppm at the beginning of the ozone water supply, but it increased rapidly with time, and became 19 ppm and approximately the desired value (20 ppm) after 10 seconds. As the ozone water concentration approaches the desired value, the control device 30 will gradually reduce the opening degree of the flow rate adjustment mechanism 25, whereby the ozone water concentration will be maintained at a roughly desired value afterwards. This result is the same as that of other use points. Industrial Applicability According to the ozone water supply device of the present invention, ozone water of a desired concentration can be supplied shortly after the start of the supply of ozone water. Therefore, when the ozone water is intermittently supplied, the ozone water after the start of the waste supply can be prevented. The waste can solve the waiting time from the concentration of ozone water to stabilization. 13 200304429 发明 、 Explanation of the invention L scheme brief description 3 The first diagram is a block diagram showing a schematic structure of an ozone water supply device according to an embodiment of the present invention. Fig. 2 is a block diagram showing the applicable force 5 of the ozone water supply device shown in Fig. 1. Fig. 3 is a block diagram showing a schematic structure of a conventional ozone water supply device. [Representative symbols for main components of the drawing] 1 ... Ozone supply device 52 ... Supply pipe 2,50 ... Spray pipe 54 ... Water supply pipe 3,58 ... Gas-liquid separation device 56 .. .Ozone generator 4 ... Mixing pipe 62 ... Concentration meter 5,60 ... Ozone water supply pipe 64 ... Flow meter 12 ... Pure water introduction pipe 68 ... Voltage regulator 13 ... Ozone introduction pipe 13a ~ 13d ... 14 ... Ozone discharge pipe 15 ... Ozone decomposer 21 ... Pure water supply valve 22 .... Ozone water supply valve 23 ... Ozone discharge valve 24 ... Dissolved ozone monitor 25 ... Flow adjustment mechanism 30, 66 ... Control device 14

Claims (1)

200304429 拾、申請專利範圍 i 一種臭氧水供給裝置,具有: 一噴射器,係連接純水導入管及臭氧導入管,並藉 由透過前述純水導入管導入之純水之水流,透過前述 臭氧導入管以吸引混合臭氧者;及 一臭氧水供給管,係將前述喷射器所生成之臭氧 水供給至使用點者; 又’該臭氧導入管設有流量調整機構,而前述臭 氧水供給管設有用以檢測臭氧水濃度之濃度檢測器, 且具有一根據前述濃度檢測器之檢測進行前述流量調 整機構之開度調整的控制機構。 2·如申請專利範圍第丨項之臭氧水供給裝置,其中該控 制機構係在前述濃度檢測器之檢測濃度低於預定濃度 時’加大前述流量調整機構之開度,且當前述濃度檢 測器之檢測濃度高於預定濃度時,則縮小前述流量調 整機構之開度。 3.如申請專利範圍第1項之臭氧水供給裝置,其中該臭 氧導入管之一端連接於臭氧產生裝置,另一端則透過 多數個分配管而連接於多數個前述喷射器, 而前述濃度檢測器係分別設於連接於前述各喷射器 之前述臭氧水供給管,且前述流量調整機構係設於前 述各分配管, 且前述控制機構係根據前述濃度檢測器之檢測,進 行對應之前述流量調整機構之開度調整。 15200304429 Patent application scope i An ozone water supply device having: an ejector connected to a pure water introduction pipe and an ozone introduction pipe, and introduced through the aforementioned ozone through the flow of pure water introduced through the aforementioned pure water introduction pipe To attract those who mix ozone; and an ozone water supply pipe, which supplies the ozone water generated by the aforementioned ejector to the point of use; and 'the ozone introduction pipe is provided with a flow adjustment mechanism, and the aforementioned ozone water supply pipe is provided with A concentration detector for detecting the concentration of ozone water, and a control mechanism for adjusting the opening degree of the flow rate adjusting mechanism according to the detection of the concentration detector. 2. If the ozone water supply device according to item 丨 of the patent application scope, wherein the control mechanism is to 'increase the opening of the aforementioned flow adjustment mechanism when the detected concentration of the aforementioned concentration detector is lower than a predetermined concentration, and when the aforementioned concentration detector When the detected concentration is higher than the predetermined concentration, the opening degree of the aforementioned flow rate adjusting mechanism is reduced. 3. The ozone water supply device according to item 1 of the patent application scope, wherein one end of the ozone introduction pipe is connected to an ozone generating device, and the other end is connected to a plurality of the aforementioned injectors through a plurality of distribution pipes, and the aforementioned concentration detector It is provided on the ozone water supply pipe connected to each of the ejectors, and the flow rate adjustment mechanism is provided on each of the distribution pipes, and the control mechanism performs the corresponding flow adjustment mechanism according to the detection by the concentration detector. Opening adjustment. 15
TW092104843A 2002-03-08 2003-03-06 Ozone water supplying apparatus TWI225038B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112067568A (en) * 2020-09-24 2020-12-11 常州瑞择微电子科技有限公司 High-concentration ozone water detection device and method

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100673076B1 (en) * 2005-06-10 2007-01-24 청호나이스 주식회사 Apparatus for manufacturing Ozone sterilized water capable of regulating concentration of ozone
CN2830388Y (en) * 2005-07-21 2006-10-25 徐名勇 Spraying atomized and gas storage ozonidate generator
JP4746515B2 (en) * 2006-10-31 2011-08-10 株式会社Ihiシバウラ Ozone water generator
JP4557262B2 (en) * 2006-11-07 2010-10-06 佐藤工業株式会社 Gas dissolved water production equipment
JP5682904B2 (en) * 2009-08-12 2015-03-11 国立大学法人九州工業大学 High concentration dissolved water generating apparatus and high concentration dissolved water generating system
KR100981285B1 (en) * 2010-06-18 2010-09-10 한국기계연구원 Production method to useing ozone functional water production system and ozone functional water production system equal concentration for siliconwafer
KR101222491B1 (en) * 2011-08-01 2013-01-16 한국기계연구원 Production apparatus and method of equal concentration functional water for batch type and in-line type of siliconwafer
JP2013086011A (en) * 2011-10-17 2013-05-13 Asahi Organic Chemicals Industry Co Ltd Method for producing ozonated water and apparatus for producing ozonated water
JP2013094696A (en) * 2011-10-28 2013-05-20 Sharp Corp Solution producing apparatus and ozone water producing apparatus, and sanitary equipment cleaning apparatus equipped with the same
JP2016064386A (en) * 2014-09-18 2016-04-28 株式会社荏原製作所 Gas dissolved water production device and method
JP6826437B2 (en) 2016-01-15 2021-02-03 株式会社荏原製作所 Supply liquid manufacturing equipment and supply liquid manufacturing method
JP6491279B2 (en) * 2017-07-26 2019-03-27 オルガノ株式会社 Water sampling dispenser and correction method thereof
KR102564803B1 (en) * 2021-05-20 2023-08-07 홍승훈 System for dissolving gas
IT202200007652A1 (en) * 2022-04-19 2023-10-19 Micheletti Eng & Consulting Sagl SYSTEM AND SYSTEM FOR SPRAYING OZONED WATER AT HIGH PRESSURE

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06134023A (en) * 1992-10-23 1994-05-17 Ishikawajima Harima Heavy Ind Co Ltd Ozone concentration control device for ozonized water
JPH0859207A (en) * 1994-08-19 1996-03-05 Tokico Ltd Device for forming ozone water
JPH10337580A (en) * 1997-06-04 1998-12-22 Tokico Ltd Ozone water generating device
JP4228164B2 (en) * 1999-07-21 2009-02-25 株式会社ササクラ Ozone water supply device with equalized branch system ozone flow rate
JP2002126480A (en) * 2000-10-20 2002-05-08 Yaskawa Electric Corp Ozonized water treatment equipment
JP2002316027A (en) * 2001-04-19 2002-10-29 Ebara Corp Device and method for manufacturing gas-dissolved water, device and method for ultrasonic cleaning

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112067568A (en) * 2020-09-24 2020-12-11 常州瑞择微电子科技有限公司 High-concentration ozone water detection device and method

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