TW200303970A - Light source unit, lighting device, exposure device and exposure method - Google Patents

Light source unit, lighting device, exposure device and exposure method Download PDF

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Publication number
TW200303970A
TW200303970A TW092101775A TW92101775A TW200303970A TW 200303970 A TW200303970 A TW 200303970A TW 092101775 A TW092101775 A TW 092101775A TW 92101775 A TW92101775 A TW 92101775A TW 200303970 A TW200303970 A TW 200303970A
Authority
TW
Taiwan
Prior art keywords
light
light source
illumination
scope
wavelength
Prior art date
Application number
TW092101775A
Other languages
English (en)
Chinese (zh)
Inventor
Motoo Koyama
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200303970A publication Critical patent/TW200303970A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW092101775A 2002-03-07 2003-01-28 Light source unit, lighting device, exposure device and exposure method TW200303970A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002061589A JP2003257846A (ja) 2002-03-07 2002-03-07 光源ユニット、照明装置、露光装置及び露光方法

Publications (1)

Publication Number Publication Date
TW200303970A true TW200303970A (en) 2003-09-16

Family

ID=28034835

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092101775A TW200303970A (en) 2002-03-07 2003-01-28 Light source unit, lighting device, exposure device and exposure method

Country Status (4)

Country Link
JP (1) JP2003257846A (ko)
KR (1) KR20030074264A (ko)
CN (1) CN1444099A (ko)
TW (1) TW200303970A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005124831A1 (ja) * 2004-06-18 2005-12-29 Nikon Corporation 光検出装置、照明光学装置、露光装置、および露光方法
JP5723652B2 (ja) * 2011-03-30 2015-05-27 株式会社オーク製作所 測光装置および露光装置
NL2009020A (en) * 2011-07-22 2013-01-24 Asml Netherlands Bv Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device.
KR101946830B1 (ko) 2017-10-19 2019-02-12 주식회사 한진엔지니어링 발전소 바텀애쉬와 질석을 포함하는 건축 내장재 보드의 제조방법
CN111656284B (zh) * 2018-01-24 2024-04-12 株式会社尼康 曝光装置及曝光方法

Also Published As

Publication number Publication date
KR20030074264A (ko) 2003-09-19
JP2003257846A (ja) 2003-09-12
CN1444099A (zh) 2003-09-24

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