TW200303970A - Light source unit, lighting device, exposure device and exposure method - Google Patents
Light source unit, lighting device, exposure device and exposure method Download PDFInfo
- Publication number
- TW200303970A TW200303970A TW092101775A TW92101775A TW200303970A TW 200303970 A TW200303970 A TW 200303970A TW 092101775 A TW092101775 A TW 092101775A TW 92101775 A TW92101775 A TW 92101775A TW 200303970 A TW200303970 A TW 200303970A
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- light source
- illumination
- scope
- wavelength
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002061589A JP2003257846A (ja) | 2002-03-07 | 2002-03-07 | 光源ユニット、照明装置、露光装置及び露光方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200303970A true TW200303970A (en) | 2003-09-16 |
Family
ID=28034835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW092101775A TW200303970A (en) | 2002-03-07 | 2003-01-28 | Light source unit, lighting device, exposure device and exposure method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2003257846A (ko) |
KR (1) | KR20030074264A (ko) |
CN (1) | CN1444099A (ko) |
TW (1) | TW200303970A (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005124831A1 (ja) * | 2004-06-18 | 2005-12-29 | Nikon Corporation | 光検出装置、照明光学装置、露光装置、および露光方法 |
JP5723652B2 (ja) * | 2011-03-30 | 2015-05-27 | 株式会社オーク製作所 | 測光装置および露光装置 |
NL2009020A (en) * | 2011-07-22 | 2013-01-24 | Asml Netherlands Bv | Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device. |
KR101946830B1 (ko) | 2017-10-19 | 2019-02-12 | 주식회사 한진엔지니어링 | 발전소 바텀애쉬와 질석을 포함하는 건축 내장재 보드의 제조방법 |
CN111656284B (zh) * | 2018-01-24 | 2024-04-12 | 株式会社尼康 | 曝光装置及曝光方法 |
-
2002
- 2002-03-07 JP JP2002061589A patent/JP2003257846A/ja active Pending
-
2003
- 2003-01-28 TW TW092101775A patent/TW200303970A/zh unknown
- 2003-03-06 KR KR10-2003-0013970A patent/KR20030074264A/ko not_active Application Discontinuation
- 2003-03-07 CN CN03107145A patent/CN1444099A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20030074264A (ko) | 2003-09-19 |
JP2003257846A (ja) | 2003-09-12 |
CN1444099A (zh) | 2003-09-24 |
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