SI3815125T1 - Sistem vira obloka za katodo - Google Patents

Sistem vira obloka za katodo

Info

Publication number
SI3815125T1
SI3815125T1 SI201930253T SI201930253T SI3815125T1 SI 3815125 T1 SI3815125 T1 SI 3815125T1 SI 201930253 T SI201930253 T SI 201930253T SI 201930253 T SI201930253 T SI 201930253T SI 3815125 T1 SI3815125 T1 SI 3815125T1
Authority
SI
Slovenia
Prior art keywords
cathode
source system
arc source
arc
source
Prior art date
Application number
SI201930253T
Other languages
English (en)
Inventor
Torbjorn Joelsson
Original Assignee
Impact Coatings Ab (Publ)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Impact Coatings Ab (Publ) filed Critical Impact Coatings Ab (Publ)
Publication of SI3815125T1 publication Critical patent/SI3815125T1/sl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32605—Removable or replaceable electrodes or electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K9/00—Arrangements for cooling or ventilating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Discharge Heating (AREA)
SI201930253T 2018-06-27 2019-06-14 Sistem vira obloka za katodo SI3815125T1 (sl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE1850797A SE542687C2 (en) 2018-06-27 2018-06-27 Arc source system for a cathode
PCT/EP2019/065703 WO2020002007A1 (en) 2018-06-27 2019-06-14 Arc source system for a cathode
EP19732933.7A EP3815125B1 (en) 2018-06-27 2019-06-14 Arc source system for a cathode

Publications (1)

Publication Number Publication Date
SI3815125T1 true SI3815125T1 (sl) 2022-10-28

Family

ID=67003461

Family Applications (1)

Application Number Title Priority Date Filing Date
SI201930253T SI3815125T1 (sl) 2018-06-27 2019-06-14 Sistem vira obloka za katodo

Country Status (7)

Country Link
US (1) US11373846B2 (sl)
EP (1) EP3815125B1 (sl)
KR (1) KR20210022113A (sl)
ES (1) ES2920494T3 (sl)
SE (1) SE542687C2 (sl)
SI (1) SI3815125T1 (sl)
WO (1) WO2020002007A1 (sl)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
DE3148354A1 (de) * 1981-12-07 1983-06-09 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur kathodenzerstaeubung eines metalles
US6689254B1 (en) 1990-10-31 2004-02-10 Tokyo Electron Limited Sputtering apparatus with isolated coolant and sputtering target therefor
DE9102052U1 (de) * 1991-02-21 1991-06-13 Hauzer Holding B.V., Venlo Indirekt gekühlter Verdampfer mit Schnellwechselsystem
DE4223091C1 (en) * 1992-07-14 1993-07-01 Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts.
DE4301516C2 (de) * 1993-01-21 2003-02-13 Applied Films Gmbh & Co Kg Targetkühlung mit Wanne
DE19508406A1 (de) 1995-03-09 1996-09-12 Leybold Ag Kathodenanordnung für eine Vorrichtung zum Zerstäuben eines Target-Paares
JP3917348B2 (ja) * 1999-05-26 2007-05-23 株式会社神戸製鋼所 アーク蒸発源、真空蒸着装置及び真空蒸着方法
DE10126985A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Anordnung zur Stromzuführung für eine Kathode einer Lichtbogen-Verdampfungsvorrichtung
FR2842348B1 (fr) 2002-07-10 2004-09-10 Tecmachine Cathode pour pulverisation sous vide
FR2842347B1 (fr) 2002-07-10 2004-12-03 Tecmachine Cathode pour machine de traitement par pulverisation sous vide
PL1609880T3 (pl) 2004-06-22 2008-10-31 Applied Mat Gmbh & Co Kg Katoda do rozpylania jonowego do procesów nakładania powłok
JP5063143B2 (ja) * 2007-03-02 2012-10-31 株式会社リケン アーク式蒸発源
AT13830U1 (de) * 2013-04-22 2014-09-15 Plansee Se Lichtbogenverdampfungs-Beschichtungsquelle

Also Published As

Publication number Publication date
KR20210022113A (ko) 2021-03-02
EP3815125A1 (en) 2021-05-05
SE542687C2 (en) 2020-06-23
EP3815125B1 (en) 2022-05-18
WO2020002007A1 (en) 2020-01-02
SE1850797A1 (en) 2019-12-28
US20210257190A1 (en) 2021-08-19
ES2920494T3 (es) 2022-08-04
US11373846B2 (en) 2022-06-28

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