SG92726A1 - Thermosensitive trransfer film and method of using the same - Google Patents

Thermosensitive trransfer film and method of using the same

Info

Publication number
SG92726A1
SG92726A1 SG200004236A SG200004236A SG92726A1 SG 92726 A1 SG92726 A1 SG 92726A1 SG 200004236 A SG200004236 A SG 200004236A SG 200004236 A SG200004236 A SG 200004236A SG 92726 A1 SG92726 A1 SG 92726A1
Authority
SG
Singapore
Prior art keywords
trransfer
thermosensitive
film
same
trransfer film
Prior art date
Application number
SG200004236A
Other languages
English (en)
Inventor
Katsutoshi Ohno
Koji Fujita
Teruhisa Shimada
Norio Yabe
Original Assignee
Sony Corp
Jujo Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp, Jujo Paper Co Ltd filed Critical Sony Corp
Publication of SG92726A1 publication Critical patent/SG92726A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H01J9/2277—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines by other processes, e.g. serigraphy, decalcomania

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Decoration By Transfer Pictures (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Laminated Bodies (AREA)
SG200004236A 1999-07-30 2000-07-27 Thermosensitive trransfer film and method of using the same SG92726A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11217347A JP2001043796A (ja) 1999-07-30 1999-07-30 感熱性転写フィルム及びその使用方法

Publications (1)

Publication Number Publication Date
SG92726A1 true SG92726A1 (en) 2002-11-19

Family

ID=16702761

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200004236A SG92726A1 (en) 1999-07-30 2000-07-27 Thermosensitive trransfer film and method of using the same

Country Status (7)

Country Link
US (1) US6482556B1 (ja)
EP (1) EP1079275A3 (ja)
JP (1) JP2001043796A (ja)
KR (1) KR100716629B1 (ja)
CN (1) CN1196161C (ja)
SG (1) SG92726A1 (ja)
TW (1) TW525209B (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001328229A (ja) * 2000-05-23 2001-11-27 Sony Corp 転写フィルム、転写フィルムによる表示装置用パネルの薄膜形成方法及びこの方法により形成した薄膜を有する表示装置
KR100399787B1 (ko) * 2001-05-04 2003-09-29 삼성에스디아이 주식회사 기판과 이 기판의 제조방법 및 이 기판을 가지는 플라즈마표시장치
DE10142232B4 (de) 2001-08-29 2021-04-29 Roche Diabetes Care Gmbh Verfahren zur Herstellung eines analytischen Hilfsmittels mit Lanzette und Testelement
KR20030047586A (ko) * 2001-12-11 2003-06-18 삼성에스디아이 주식회사 열전사를 이용한 형광 스크린 제조 방법
JP2004171950A (ja) * 2002-11-20 2004-06-17 Sony Corp 表示装置及びカラー陰極線管
JP2004296453A (ja) * 2003-02-06 2004-10-21 Sharp Corp 固体撮像装置、半導体ウエハ、光学装置用モジュール、固体撮像装置の製造方法及び光学装置用モジュールの製造方法
JP2004319095A (ja) 2003-04-11 2004-11-11 Sony Corp 感熱性転写フィルムおよび表示装置の製造方法
US7741003B2 (en) * 2004-03-30 2010-06-22 Hitachi Global Storage Technologies Netherlands B.V. Photoresist transfer pads
KR20140059376A (ko) 2012-11-07 2014-05-16 삼성디스플레이 주식회사 유기막 형성 장치 및 유기 발광 표시 장치의 제조 방법
GB2615134A (en) * 2022-01-31 2023-08-02 Screenline Pvt Ltd Thermal transfer sticker and system and methods of preparing same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01118567A (ja) * 1987-11-02 1989-05-11 Idemitsu Petrochem Co Ltd 難燃性ポリエステル組成物
US5340673A (en) * 1992-03-25 1994-08-23 Sony Corporation Method of manufacturing a phosphor screen of a cathode ray tube
US5476737A (en) * 1992-03-25 1995-12-19 Sony Corporation method of forming a phosphor screen of a cathode ray tube

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5545506A (en) * 1992-01-28 1996-08-13 Hoechst Celanese Corporation Method of producing an image using a negative working, peel developable, single sheet color proofing system
JP3800650B2 (ja) * 1995-11-17 2006-07-26 凸版印刷株式会社 プラズマディスプレイパネルの製造方法
US5645963A (en) * 1995-11-20 1997-07-08 Minnesota Mining And Manufacturing Company Method for making color filter elements using laminable colored photosensitive materials
EP1387384A1 (en) * 1996-01-22 2004-02-04 Hitachi Chemical Co., Ltd. Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same
JPH09274103A (ja) * 1996-04-04 1997-10-21 Sony Corp カラーフィルター組成物、カラー表示装置およびその製造方法
US5856064A (en) * 1996-09-10 1999-01-05 Minnesota Mining And Manufacturing Company Dry peel-apart imaging or proofing system
EP0887833B1 (en) * 1997-05-22 2006-08-16 Hitachi Chemical Co., Ltd. Process for preparing phosphor pattern for field emission panel and photosensitive element

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01118567A (ja) * 1987-11-02 1989-05-11 Idemitsu Petrochem Co Ltd 難燃性ポリエステル組成物
US5340673A (en) * 1992-03-25 1994-08-23 Sony Corporation Method of manufacturing a phosphor screen of a cathode ray tube
US5476737A (en) * 1992-03-25 1995-12-19 Sony Corporation method of forming a phosphor screen of a cathode ray tube

Also Published As

Publication number Publication date
CN1284730A (zh) 2001-02-21
EP1079275A3 (en) 2002-10-30
CN1196161C (zh) 2005-04-06
KR100716629B1 (ko) 2007-05-09
KR20010049939A (ko) 2001-06-15
JP2001043796A (ja) 2001-02-16
TW525209B (en) 2003-03-21
US6482556B1 (en) 2002-11-19
EP1079275A2 (en) 2001-02-28

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