SG80626A1 - A photo resist composition - Google Patents

A photo resist composition

Info

Publication number
SG80626A1
SG80626A1 SG9902145A SG1999002145A SG80626A1 SG 80626 A1 SG80626 A1 SG 80626A1 SG 9902145 A SG9902145 A SG 9902145A SG 1999002145 A SG1999002145 A SG 1999002145A SG 80626 A1 SG80626 A1 SG 80626A1
Authority
SG
Singapore
Prior art keywords
resist composition
photo resist
photo
composition
resist
Prior art date
Application number
SG9902145A
Other languages
English (en)
Inventor
Koji Ichikawa
Nobuhito Fukui
Koshiro Ochiai
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of SG80626A1 publication Critical patent/SG80626A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
SG9902145A 1998-05-08 1999-05-07 A photo resist composition SG80626A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP12602398 1998-05-08
JP36075698A JP3743187B2 (ja) 1998-05-08 1998-12-18 フォトレジスト組成物

Publications (1)

Publication Number Publication Date
SG80626A1 true SG80626A1 (en) 2001-05-22

Family

ID=26462293

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9902145A SG80626A1 (en) 1998-05-08 1999-05-07 A photo resist composition

Country Status (8)

Country Link
US (1) US6153349A (de)
EP (1) EP0955563B1 (de)
JP (1) JP3743187B2 (de)
KR (1) KR100569615B1 (de)
CN (1) CN1167982C (de)
DE (1) DE69905968T2 (de)
SG (1) SG80626A1 (de)
TW (1) TW581930B (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI277830B (en) * 1999-01-28 2007-04-01 Sumitomo Chemical Co Resist composition
US6200728B1 (en) * 1999-02-20 2001-03-13 Shipley Company, L.L.C. Photoresist compositions comprising blends of photoacid generators
TW538316B (en) * 2001-01-19 2003-06-21 Sumitomo Chemical Co Chemical amplifying type positive resist composition
JP2003280198A (ja) * 2002-03-20 2003-10-02 Sumitomo Chem Co Ltd 化学増幅型ポジ型レジスト組成物
US6858378B1 (en) * 2002-04-17 2005-02-22 Sandia National Laboratories Photoimageable composition
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
US7148265B2 (en) * 2002-09-30 2006-12-12 Rohm And Haas Electronic Materials Llc Functional polymer
KR20040084850A (ko) * 2003-03-28 2004-10-06 스미또모 가가꾸 고교 가부시끼가이샤 화학 증폭 레지스트 조성물
JP4583860B2 (ja) * 2004-10-04 2010-11-17 富士通株式会社 レジストパターン厚肉化材料、レジストパターンの形成方法、並びに、半導体装置及びその製造方法
US7927779B2 (en) 2005-06-30 2011-04-19 Taiwan Semiconductor Manufacturing Companym, Ltd. Water mark defect prevention for immersion lithography
US20070002296A1 (en) * 2005-06-30 2007-01-04 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography defect reduction
US8383322B2 (en) 2005-08-05 2013-02-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography watermark reduction
TW200715067A (en) * 2005-09-06 2007-04-16 Koninkl Philips Electronics Nv Lithographic method
TW200715068A (en) * 2005-09-06 2007-04-16 Koninkl Philips Electronics Nv Lithographic method
US7993808B2 (en) * 2005-09-30 2011-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. TARC material for immersion watermark reduction
US20100178611A1 (en) * 2006-04-13 2010-07-15 Nuflare Technology, Inc. Lithography method of electron beam
US20070243487A1 (en) * 2006-04-13 2007-10-18 Nuflare Technology, Inc. Forming method of resist pattern and writing method of charged particle beam
US8518628B2 (en) 2006-09-22 2013-08-27 Taiwan Semiconductor Manufacturing Company, Ltd. Surface switchable photoresist
US7749680B2 (en) * 2007-01-05 2010-07-06 Hynix Semiconductor Inc. Photoresist composition and method for forming pattern of a semiconductor device
JP5703197B2 (ja) 2011-01-18 2015-04-15 富士フイルム株式会社 化学増幅型レジスト組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク、並びに、高分子化合物
JP5723829B2 (ja) 2011-11-10 2015-05-27 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、マスクブランクス及びパターン形成方法
JP5919122B2 (ja) 2012-07-27 2016-05-18 富士フイルム株式会社 樹脂組成物及びそれを用いたパターン形成方法
CN103309160B (zh) * 2013-07-03 2015-08-26 北京科华微电子材料有限公司 一种负性化学放大光刻胶及其成像方法
WO2015194330A1 (ja) * 2014-06-19 2015-12-23 富士フイルム株式会社 感放射線性又は感活性光線性樹脂組成物、並びに、それを用いたレジスト膜、マスクブランクス、レジストパターン形成方法、電子デバイスの製造方法、及び電子デバイス

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0704762A1 (de) * 1994-09-02 1996-04-03 Wako Pure Chemical Industries Ltd Resistmaterial und Herstellung von Mustern
EP0756203A1 (de) * 1995-07-26 1997-01-29 Hoechst Industry Limited Strahlungsempfindliche Zusammensetzung

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE244904T1 (de) * 1995-12-21 2003-07-15 Wako Pure Chem Ind Ltd Polymerzusammensetzung und rezistmaterial
EP0789279B2 (de) * 1996-02-09 2004-12-08 Wako Pure Chemical Industries Ltd Polymer und Resistmaterial

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0704762A1 (de) * 1994-09-02 1996-04-03 Wako Pure Chemical Industries Ltd Resistmaterial und Herstellung von Mustern
EP0756203A1 (de) * 1995-07-26 1997-01-29 Hoechst Industry Limited Strahlungsempfindliche Zusammensetzung

Also Published As

Publication number Publication date
EP0955563A1 (de) 1999-11-10
KR19990088114A (ko) 1999-12-27
KR100569615B1 (ko) 2006-04-11
DE69905968T2 (de) 2003-12-24
JP3743187B2 (ja) 2006-02-08
EP0955563B1 (de) 2003-03-19
CN1235281A (zh) 1999-11-17
JP2000029220A (ja) 2000-01-28
US6153349A (en) 2000-11-28
DE69905968D1 (de) 2003-04-24
TW581930B (en) 2004-04-01
CN1167982C (zh) 2004-09-22

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