SG78391A1 - Semiconductor device manufacturing method - Google Patents

Semiconductor device manufacturing method

Info

Publication number
SG78391A1
SG78391A1 SG1999004534A SG1999004534A SG78391A1 SG 78391 A1 SG78391 A1 SG 78391A1 SG 1999004534 A SG1999004534 A SG 1999004534A SG 1999004534 A SG1999004534 A SG 1999004534A SG 78391 A1 SG78391 A1 SG 78391A1
Authority
SG
Singapore
Prior art keywords
semiconductor device
device manufacturing
manufacturing
semiconductor
Prior art date
Application number
SG1999004534A
Other languages
English (en)
Inventor
Ryuji Kono
Akihiko Ariga
Hideo Miura
Hiroyuki Ohta
Yoshishige Endo
Masatoshi Kanamaru
Atsushi Hosogane
Shinji Tanaka
Naoto Ban
Hideyuki Aoki
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of SG78391A1 publication Critical patent/SG78391A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013—Alloys
    • H01L2924/014—Solder alloys

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Dicing (AREA)
  • Tests Of Electronic Circuits (AREA)
SG1999004534A 1998-09-18 1999-09-14 Semiconductor device manufacturing method SG78391A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10264413A JP2000100882A (ja) 1998-09-18 1998-09-18 半導体装置の製造方法とその検査方法、及び、それらの方法に用いる冶具

Publications (1)

Publication Number Publication Date
SG78391A1 true SG78391A1 (en) 2001-02-20

Family

ID=17402832

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1999004534A SG78391A1 (en) 1998-09-18 1999-09-14 Semiconductor device manufacturing method

Country Status (7)

Country Link
US (2) US6479305B2 (ko)
JP (1) JP2000100882A (ko)
KR (1) KR100368585B1 (ko)
CN (1) CN1207767C (ko)
MY (1) MY122198A (ko)
SG (1) SG78391A1 (ko)
TW (1) TW495922B (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6265232B1 (en) * 1998-08-21 2001-07-24 Micron Technology, Inc. Yield based, in-line defect sampling method
US6548764B1 (en) * 2000-06-07 2003-04-15 Micron Technology, Inc. Semiconductor packages and methods for making the same
DE60217980T2 (de) * 2001-02-06 2007-11-22 Yamazaki Mazak K.K. Verfahren zur Herstellung einer Haltevorrichtung für dreidimensionale lineare Schneidbearbeitung
US7018849B2 (en) * 2002-01-15 2006-03-28 Piasio Roger N Process for (A) separating biological/ligands from dilute solutions and (B) conducting an immunochromatographic assay thereof employing superparamagnetic particles throughtout
DE102004027489B4 (de) 2004-06-04 2017-03-02 Infineon Technologies Ag Verfahren zum Anordnen von Chips eines ersten Substrats auf einem zweiten Substrat
US7364983B2 (en) * 2005-05-04 2008-04-29 Avery Dennison Corporation Method and apparatus for creating RFID devices
US7733106B2 (en) * 2005-09-19 2010-06-08 Formfactor, Inc. Apparatus and method of testing singulated dies
JP2008130932A (ja) * 2006-11-22 2008-06-05 Shinkawa Ltd 側面電極付半導体チップ及びその製造方法並びにその半導体チップを積層した３次元実装モジュール
US20080252330A1 (en) * 2007-04-16 2008-10-16 Verigy Corporation Method and apparatus for singulated die testing
TW201140664A (en) * 2010-05-05 2011-11-16 Aptos Technology Inc Method for acquiring recycled chips and method for fabricating semiconductor package
JP5515024B2 (ja) * 2010-11-24 2014-06-11 株式会社日本マイクロニクス チップ積層デバイス検査方法及びチップ積層デバイス再配列ユニット並びにチップ積層デバイス用検査装置
US20160131702A1 (en) * 2014-11-10 2016-05-12 Teradyne, Inc. Assembling devices for probe card testing
JP6292104B2 (ja) * 2014-11-17 2018-03-14 三菱電機株式会社 窒化物半導体装置の製造方法
US20240312848A1 (en) * 2021-02-10 2024-09-19 Mitsui Chemicals Tohcello, Inc. Electronic component manufacturing method, manufacturing film, and manufacturing tool

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63204621A (ja) 1987-02-20 1988-08-24 Hitachi Ltd エ−ジング装置
JPH03131048A (ja) 1989-10-17 1991-06-04 Toshiba Corp ベアチップｉｃのバーンイン方法
US5453991A (en) * 1992-03-18 1995-09-26 Kabushiki Kaisha Toshiba Integrated circuit device with internal inspection circuitry
US5489538A (en) * 1992-08-21 1996-02-06 Lsi Logic Corporation Method of die burn-in
JP3134738B2 (ja) * 1995-09-28 2001-02-13 安藤電気株式会社 ハンドリングシステム

Also Published As

Publication number Publication date
JP2000100882A (ja) 2000-04-07
CN1248792A (zh) 2000-03-29
US6479305B2 (en) 2002-11-12
US6573112B2 (en) 2003-06-03
KR100368585B1 (ko) 2003-01-24
TW495922B (en) 2002-07-21
KR20000023219A (ko) 2000-04-25
MY122198A (en) 2006-03-31
US20020064893A1 (en) 2002-05-30
CN1207767C (zh) 2005-06-22
US20030027365A1 (en) 2003-02-06

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