SG70995A1 - Anti-reflection film - Google Patents

Anti-reflection film

Info

Publication number
SG70995A1
SG70995A1 SG1996010214A SG1996010214A SG70995A1 SG 70995 A1 SG70995 A1 SG 70995A1 SG 1996010214 A SG1996010214 A SG 1996010214A SG 1996010214 A SG1996010214 A SG 1996010214A SG 70995 A1 SG70995 A1 SG 70995A1
Authority
SG
Singapore
Prior art keywords
reflection film
reflection
film
Prior art date
Application number
SG1996010214A
Other languages
English (en)
Inventor
Barret Lippey
Hiroichi Ishikawa
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of SG70995A1 publication Critical patent/SG70995A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
SG1996010214A 1995-07-06 1996-07-05 Anti-reflection film SG70995A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17092595 1995-07-06

Publications (1)

Publication Number Publication Date
SG70995A1 true SG70995A1 (en) 2000-03-21

Family

ID=15913909

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996010214A SG70995A1 (en) 1995-07-06 1996-07-05 Anti-reflection film

Country Status (5)

Country Link
EP (1) EP0753762B1 (de)
KR (1) KR970007401A (de)
CN (1) CN1141442A (de)
DE (1) DE69620065T2 (de)
SG (1) SG70995A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5728456A (en) * 1996-02-01 1998-03-17 Optical Coating Laboratory, Inc. Methods and apparatus for providing an absorbing, broad band, low brightness, antireflection coating
TW415922B (en) * 1996-06-11 2000-12-21 Asahi Glass Co Ltd Light absorptive anti-reflector and method for manufacturing the same
JP2000047007A (ja) 1998-07-31 2000-02-18 Sony Corp 反射防止膜及び陰極線管
US6572990B1 (en) * 1998-11-30 2003-06-03 Asahi Glass Company, Limited Transportation equipment window antireflection film, glass with antireflection film, laminated glass and production method therefor
AU781979B2 (en) * 2000-01-26 2005-06-23 Carl Zeiss Vision Australia Holdings Ltd Anti-static, anti-reflection coating
EP1170618B1 (de) 2000-07-03 2010-06-16 Sony Corporation Optische mehrschichtige Struktur, optische Schalteinrichtung, und Bildanzeigevorrichtung
JP4016178B2 (ja) * 2001-11-06 2007-12-05 ソニー株式会社 表示装置及び反射防止用基体
US6972136B2 (en) * 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
KR100745985B1 (ko) * 2004-06-28 2007-08-06 삼성전자주식회사 이미지 센서
CN100388013C (zh) * 2005-01-14 2008-05-14 索尼株式会社 光学设备、透镜镜筒、图像拾取设备和电子设备
KR100687102B1 (ko) * 2005-03-30 2007-02-26 삼성전자주식회사 이미지 센서 및 그 제조 방법.
KR101504785B1 (ko) * 2007-08-21 2015-03-20 데쿠세리아루즈 가부시키가이샤 반사 방지 필름
WO2009131206A1 (ja) * 2008-04-24 2009-10-29 旭硝子株式会社 低反射ガラスおよびディスプレイ用保護板
DE102009012546A1 (de) 2009-03-10 2010-09-23 X-Fab Semiconductor Foundries Ag Modifizierte Siliziumnitridschicht mit multivalentemn Eigenschaften zur Anwendung bei der Fertigung von fotoempfindlichen Bauelementen
JP5683146B2 (ja) 2010-06-24 2015-03-11 キヤノン株式会社 光学膜の製造方法および光学素子の製造方法
FR2968774B1 (fr) * 2010-12-10 2013-02-08 Essilor Int Article d'optique comportant un revetement antireflet a faible reflexion dans le domaine ultraviolet et le domaine visible
WO2012133216A1 (ja) * 2011-03-25 2012-10-04 Hoya株式会社 プラスチックレンズ
KR20130047634A (ko) * 2011-10-28 2013-05-08 호야 가부시키가이샤 반사 방지막 및 광학 소자
JP6051960B2 (ja) 2012-03-19 2016-12-27 株式会社リコー 導電性薄膜、導電性薄膜形成用塗布液、電界効果型トランジスタ、及び電界効果型トランジスタの製造方法
US11476641B1 (en) 2019-06-25 2022-10-18 Mac Thin Films, Inc. Window for laser protection
EP4237883A1 (de) * 2020-10-27 2023-09-06 Essilor International Optischer artikel zur bereitstellung von sehkorrektur für vorrichtungen mit augenverfolgungsvorrichtung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5133751B2 (de) * 1972-07-27 1976-09-21
JPH0719551B2 (ja) * 1985-04-22 1995-03-06 東レ株式会社 電磁波シールド性を有する光学フィルター
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5190807A (en) * 1990-10-18 1993-03-02 Diamonex, Incorporated Abrasion wear resistant polymeric substrate product
EP0564709B1 (de) * 1991-12-13 1996-01-24 Balzers Aktiengesellschaft Beschichtetes transparentes Substrat, Verwendung hiervon, Verfahren und Anlage zur Herstellung der Schichten, und Hafnium-Oxinitrid (HfOxNy) mit 1,5 x/y 3 und 2,6 n 2,8

Also Published As

Publication number Publication date
EP0753762A1 (de) 1997-01-15
DE69620065T2 (de) 2002-11-14
KR970007401A (ko) 1997-02-21
DE69620065D1 (de) 2002-05-02
CN1141442A (zh) 1997-01-29
EP0753762B1 (de) 2002-03-27

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