SG65015A1 - Substrate treatment system - Google Patents
Substrate treatment systemInfo
- Publication number
- SG65015A1 SG65015A1 SG1997003146A SG1997003146A SG65015A1 SG 65015 A1 SG65015 A1 SG 65015A1 SG 1997003146 A SG1997003146 A SG 1997003146A SG 1997003146 A SG1997003146 A SG 1997003146A SG 65015 A1 SG65015 A1 SG 65015A1
- Authority
- SG
- Singapore
- Prior art keywords
- treatment system
- substrate treatment
- substrate
- treatment
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Ventilation (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24726096 | 1996-08-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG65015A1 true SG65015A1 (en) | 1999-05-25 |
Family
ID=17160842
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1997003146A SG65015A1 (en) | 1996-08-29 | 1997-08-27 | Substrate treatment system |
Country Status (5)
Country | Link |
---|---|
US (1) | US5944894A (ko) |
EP (1) | EP0827186A3 (ko) |
KR (1) | KR100458647B1 (ko) |
SG (1) | SG65015A1 (ko) |
TW (1) | TW353780B (ko) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW420829B (en) * | 1997-05-22 | 2001-02-01 | Tokyo Electron Ltd | Treatment device and method, impurity removing apparatus |
JP3425592B2 (ja) * | 1997-08-12 | 2003-07-14 | 東京エレクトロン株式会社 | 処理装置 |
SG76561A1 (en) * | 1997-09-22 | 2000-11-21 | Tokyo Electron Ltd | Processing apparatus and method |
US6190063B1 (en) * | 1998-01-09 | 2001-02-20 | Tokyo Electron Ltd. | Developing method and apparatus |
JPH11347917A (ja) * | 1998-06-09 | 1999-12-21 | Ebara Corp | ポリッシング装置 |
JP4052736B2 (ja) * | 1998-07-21 | 2008-02-27 | 株式会社荏原製作所 | ポリッシング装置 |
ES2190290B1 (es) * | 1999-03-24 | 2004-11-16 | Jose Luis Perez Diaz | Metodo y sistema de ventilacion y climatizacion esteril. |
JP4021118B2 (ja) * | 1999-04-28 | 2007-12-12 | 東京エレクトロン株式会社 | 基板処理装置 |
KR100630511B1 (ko) | 1999-09-03 | 2006-09-29 | 동경 엘렉트론 주식회사 | 기판처리장치 |
TW487950B (en) * | 1999-10-25 | 2002-05-21 | Tokyo Electron Ltd | Substrate processing system and substrate processing method |
US6298685B1 (en) * | 1999-11-03 | 2001-10-09 | Applied Materials, Inc. | Consecutive deposition system |
JP3590328B2 (ja) * | 2000-05-11 | 2004-11-17 | 東京エレクトロン株式会社 | 塗布現像処理方法及び塗布現像処理システム |
US6379056B1 (en) | 2000-09-12 | 2002-04-30 | Tokyo Electron Limited | Substrate processing apparatus |
JP3616748B2 (ja) | 2000-11-07 | 2005-02-02 | 東京エレクトロン株式会社 | 現像処理方法,現像処理装置及び処理装置 |
JP2002184671A (ja) * | 2000-12-14 | 2002-06-28 | Tokyo Electron Ltd | 基板処理システム及び基板処理方法 |
KR20020057232A (ko) * | 2000-12-30 | 2002-07-11 | 주식회사 현대 디스플레이 테크놀로지 | 분리/일체형 실링 오븐 |
US6897165B2 (en) * | 2001-06-06 | 2005-05-24 | Matsushita Electric Industrial Co., Ltd. | Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber |
EP1406293A4 (en) * | 2001-07-12 | 2007-11-28 | Tokyo Electron Ltd | WAFER PROCESSING DEVICE AND SYSTEM FOR ADJUSTING A TRANSFER MECHANISM |
CN100419984C (zh) * | 2001-07-12 | 2008-09-17 | 东京毅力科创株式会社 | 基板的处理装置及运送装置调整系统 |
JP3886424B2 (ja) * | 2001-08-28 | 2007-02-28 | 鹿児島日本電気株式会社 | 基板処理装置及び方法 |
DE10143628A1 (de) * | 2001-09-06 | 2003-03-27 | M & W Zander Facility Eng Gmbh | Anlage und Verfahren zur Abluftaufbereitung, insbesondere bei Reinraumanlagen |
US6641635B1 (en) * | 2001-09-19 | 2003-11-04 | Lsi Logic Corporation | Liquid based air filtration system |
JP2003156858A (ja) * | 2001-11-22 | 2003-05-30 | Tokyo Electron Ltd | 基板処理方法及び基板処理システム |
KR100487549B1 (ko) * | 2002-09-26 | 2005-05-03 | 삼성전자주식회사 | 반도체 제조 설비를 위한 공기 공급 장치 |
US20050026455A1 (en) * | 2003-05-30 | 2005-02-03 | Satomi Hamada | Substrate processing apparatus and substrate processing method |
WO2005038887A1 (ja) * | 2003-10-21 | 2005-04-28 | Nikon Corporation | 環境制御装置、デバイス製造装置、デバイス製造方法、露光装置 |
CA2453909A1 (en) * | 2003-12-22 | 2005-06-22 | Dryair Inc. | Method and apparatus for controlling humidity and mold |
CA2537015A1 (en) * | 2006-02-20 | 2007-08-20 | Dryair Inc. | Drying occupied buildings |
US20050217484A1 (en) * | 2004-01-06 | 2005-10-06 | Claude Bourgault | Method and portable apparatus for cooling and heating structures |
JP4361811B2 (ja) * | 2004-01-09 | 2009-11-11 | 東京エレクトロン株式会社 | 半導体製造装置 |
JP4418699B2 (ja) * | 2004-03-24 | 2010-02-17 | キヤノン株式会社 | 露光装置 |
KR100706795B1 (ko) * | 2005-08-17 | 2007-04-12 | 삼성전자주식회사 | 오염 제어 시스템 및 방법, 그리고 상기 시스템을 가지는반도체 제조 설비 |
JP4840168B2 (ja) * | 2007-01-31 | 2011-12-21 | 東京エレクトロン株式会社 | 加熱装置、加熱方法及び記憶媒体 |
KR100897546B1 (ko) * | 2007-09-28 | 2009-05-15 | 세메스 주식회사 | 기판 세정 장치 |
US8950414B2 (en) * | 2009-07-31 | 2015-02-10 | Tokyo Electron Limited | Liquid processing apparatus, liquid processing method, and storage medium |
JP5562759B2 (ja) * | 2009-11-04 | 2014-07-30 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5964740B2 (ja) * | 2012-12-21 | 2016-08-03 | 株式会社荏原製作所 | 研磨装置 |
JP2018528379A (ja) * | 2015-07-29 | 2018-09-27 | モビエアー ピーティーイー. リミテッドMobiair Pte Ltd. | ゼロエネルギー加熱、換気、空調動作を達成することができるプロセスおよび設備 |
JP7023065B2 (ja) * | 2016-09-13 | 2022-02-21 | 株式会社Screenホールディングス | 基板処理装置 |
WO2018051825A1 (ja) | 2016-09-13 | 2018-03-22 | 株式会社Screenホールディングス | 基板処理装置 |
US11056358B2 (en) * | 2017-11-14 | 2021-07-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer cleaning apparatus and method |
JP7300817B2 (ja) * | 2018-09-21 | 2023-06-30 | 株式会社Screenホールディングス | 基板処理装置および基板処理装置の制御方法 |
KR20230092188A (ko) * | 2021-12-17 | 2023-06-26 | 삼성전자주식회사 | 기판 처리 장치 및 방법 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2099328B (en) * | 1981-05-29 | 1984-08-01 | Coal Industry Patents Ltd | Dust filter apparatus |
DE3531288A1 (de) * | 1985-09-02 | 1986-05-22 | Helmut 2408 Timmendorfer Strand Dalk | Reinraumtechnische arbeitskabine |
US5143552A (en) * | 1988-03-09 | 1992-09-01 | Tokyo Electron Limited | Coating equipment |
US5531801A (en) * | 1994-02-08 | 1996-07-02 | Sewell; Frederic D. | Liquid spray air purification and controlled humidification apparatus with air quality monitor and controller |
DE19504213A1 (de) * | 1995-02-09 | 1996-08-22 | Prantner Gmbh Verfahrenstechni | Verfahren zur Reinigung von ammoniumhaltigem Abwasser |
JP3401121B2 (ja) * | 1995-04-21 | 2003-04-28 | 大日本スクリーン製造株式会社 | 基板への回転式塗布装置 |
KR970006728A (ko) * | 1995-07-12 | 1997-02-21 | 한승준 | 자동차 키이스위치의 자동복귀장치 |
-
1997
- 1997-08-23 EP EP97114632A patent/EP0827186A3/en not_active Withdrawn
- 1997-08-25 TW TW086112198A patent/TW353780B/zh not_active IP Right Cessation
- 1997-08-27 SG SG1997003146A patent/SG65015A1/en unknown
- 1997-08-27 US US08/917,734 patent/US5944894A/en not_active Expired - Fee Related
- 1997-08-29 KR KR1019970043252A patent/KR100458647B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW353780B (en) | 1999-03-01 |
KR100458647B1 (ko) | 2005-06-13 |
KR19980019186A (ko) | 1998-06-05 |
EP0827186A3 (en) | 1999-12-15 |
US5944894A (en) | 1999-08-31 |
EP0827186A2 (en) | 1998-03-04 |
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