SG171511A1 - Method for producing a single crystal composed of silicon by remelting granules - Google Patents
Method for producing a single crystal composed of silicon by remelting granulesInfo
- Publication number
- SG171511A1 SG171511A1 SG201006688-4A SG2010066884A SG171511A1 SG 171511 A1 SG171511 A1 SG 171511A1 SG 2010066884 A SG2010066884 A SG 2010066884A SG 171511 A1 SG171511 A1 SG 171511A1
- Authority
- SG
- Singapore
- Prior art keywords
- single crystal
- silicon
- plate
- producing
- tube
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009052745A DE102009052745A1 (de) | 2009-11-11 | 2009-11-11 | Verfahren zur Herstellung eines Einkristalls aus Silizium durch Umschmelzen von Granulat |
Publications (1)
Publication Number | Publication Date |
---|---|
SG171511A1 true SG171511A1 (en) | 2011-06-29 |
Family
ID=43128203
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG201006688-4A SG171511A1 (en) | 2009-11-11 | 2010-09-15 | Method for producing a single crystal composed of silicon by remelting granules |
SG2013024112A SG189726A1 (en) | 2009-11-11 | 2010-09-15 | Method for producing a single crystal composed of silicon by remelting granules |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2013024112A SG189726A1 (en) | 2009-11-11 | 2010-09-15 | Method for producing a single crystal composed of silicon by remelting granules |
Country Status (10)
Country | Link |
---|---|
US (1) | US8834627B2 (ja) |
EP (1) | EP2322695B1 (ja) |
JP (1) | JP5183719B2 (ja) |
KR (1) | KR101294453B1 (ja) |
CN (1) | CN102061512B (ja) |
AT (1) | ATE534758T1 (ja) |
DE (1) | DE102009052745A1 (ja) |
DK (1) | DK2322695T3 (ja) |
SG (2) | SG171511A1 (ja) |
TW (1) | TWI424101B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012215677B3 (de) * | 2012-09-04 | 2013-10-10 | Siltronic Ag | Verfahren zum Herstellen eines Einkristalls aus Silizium |
DE102014207149A1 (de) * | 2014-04-14 | 2015-10-29 | Siltronic Ag | Vorrichtung und Verfahren zur Herstellung eines Einkristalls aus Silizium |
DE102014210936B3 (de) * | 2014-06-06 | 2015-10-22 | Siltronic Ag | Vorrichtung und Verfahren zur Herstellung eines Kristalls aus Halbleitermaterial |
DE102017202420A1 (de) * | 2017-02-15 | 2018-08-16 | Siltronic Ag | Verfahren und Anlage zum Ziehen eines Einkristalls nach dem FZ-Verfahren |
CN116288650B (zh) * | 2023-05-24 | 2023-08-29 | 苏州晨晖智能设备有限公司 | 以颗粒硅为原料的硅单晶生长装置和生长方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5108720A (en) * | 1991-05-20 | 1992-04-28 | Hemlock Semiconductor Corporation | Float zone processing of particulate silicon |
JP3053958B2 (ja) * | 1992-04-10 | 2000-06-19 | 光弘 丸山 | 浮遊帯溶融法による結晶の製造装置 |
DE19538020A1 (de) * | 1995-10-12 | 1997-04-17 | Wacker Siltronic Halbleitermat | Verfahren und Vorrichtung zur Herstellung von Einkristallen aus Silicium |
JP3644227B2 (ja) | 1997-12-22 | 2005-04-27 | 信越半導体株式会社 | シリコン単結晶の製造方法及び製造装置 |
JPH11292682A (ja) * | 1998-04-02 | 1999-10-26 | Shin Etsu Handotai Co Ltd | シリコン単結晶の製造方法および製造装置 |
DE10204178B4 (de) * | 2002-02-01 | 2008-01-03 | Siltronic Ag | Verfahren und Vorrichtung zum Herstellen eines Einkristalls aus Halbleitermaterial |
TWM246495U (en) * | 2003-10-31 | 2004-10-11 | Hon Hai Prec Ind Co Ltd | Automatic apparatus for assembling bearig to motor |
DE102008013326B4 (de) | 2008-03-10 | 2013-03-28 | Siltronic Ag | Induktionsheizspule und Verfahren zum Schmelzen von Granulat aus Halbleitermaterial |
CA2795395C (en) * | 2010-04-13 | 2018-05-29 | Schmid Silicon Technology Gmbh | Production of monocrystalline semiconductor materials |
-
2009
- 2009-11-11 DE DE102009052745A patent/DE102009052745A1/de not_active Withdrawn
-
2010
- 2010-09-15 SG SG201006688-4A patent/SG171511A1/en unknown
- 2010-09-15 SG SG2013024112A patent/SG189726A1/en unknown
- 2010-09-21 CN CN201010294175XA patent/CN102061512B/zh not_active Expired - Fee Related
- 2010-10-20 TW TW099135735A patent/TWI424101B/zh not_active IP Right Cessation
- 2010-10-26 AT AT10188864T patent/ATE534758T1/de active
- 2010-10-26 DK DK10188864.2T patent/DK2322695T3/da active
- 2010-10-26 EP EP10188864A patent/EP2322695B1/de not_active Not-in-force
- 2010-10-28 US US12/913,970 patent/US8834627B2/en not_active Expired - Fee Related
- 2010-11-10 KR KR1020100111530A patent/KR101294453B1/ko active IP Right Grant
- 2010-11-11 JP JP2010253104A patent/JP5183719B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2011102234A (ja) | 2011-05-26 |
EP2322695B1 (de) | 2011-11-23 |
US8834627B2 (en) | 2014-09-16 |
KR101294453B1 (ko) | 2013-08-07 |
CN102061512A (zh) | 2011-05-18 |
SG189726A1 (en) | 2013-05-31 |
TWI424101B (zh) | 2014-01-21 |
EP2322695A1 (de) | 2011-05-18 |
JP5183719B2 (ja) | 2013-04-17 |
DE102009052745A1 (de) | 2011-05-12 |
CN102061512B (zh) | 2013-12-11 |
US20110107960A1 (en) | 2011-05-12 |
KR20110052501A (ko) | 2011-05-18 |
DK2322695T3 (da) | 2012-02-27 |
ATE534758T1 (de) | 2011-12-15 |
TW201132810A (en) | 2011-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG171511A1 (en) | Method for producing a single crystal composed of silicon by remelting granules | |
TW201129729A (en) | Device for producing a single crystal composed of silicon by remelting granules | |
MX2008003924A (es) | Procesos de pigmento organico. | |
WO2008025872A3 (en) | Crystal manufacturing | |
MX2013010763A (es) | Dispositivo de dispensacion de adhesivo que tiene unidad de separador ciclonico optimizada. | |
MY152943A (en) | Method for producing a silicon ingot | |
EP2334849A4 (en) | GRAFIT MELT TAG FOR ELECTROMAGNETIC SILICON INDUCTION HEATING AND SILICONE MELTING AND REFINEMENT DEVICE USING GRAFIT MELT TAG | |
WO2016029085A3 (en) | Induction melter for glass melting and systems and methods for controlling induction-based melters | |
EP2465830A4 (en) | LOWLY COLORED HIGH TRANSMITTANCE GLASS, AND METHOD FOR MANUFACTURING THE SAME | |
SG166718A1 (en) | A method and an apparatus for growing a silicon single crystal from a melt | |
CL2013001216A1 (es) | Metodo para controlar el equilibrio termico de un horno de fusion de suspension que comprende una cuba de reaccion un horno inferior y un conducto de captacion en donde la cuba de reaccion tiene una estructura de cuba dicha estructura de cuba con al menos un medio de enfriamiento para alimentar material endotermico a la camara de reaccion; y horno de fusion de suspension. | |
CN105478690B (zh) | 用于上引法结晶器的石墨模具 | |
EP2511244A4 (en) | Method for monitoring glass melting furnace, method for controlling introduction of raw material, and device for controlling introduction of raw material | |
WO2012173438A3 (en) | Apparatus for fabricating ingot | |
SG171512A1 (en) | Method for pulling a single crystal composed of silicon with a section having a diameter that remains constant | |
WO2014064648A3 (en) | Gasification devices and methods | |
MX352104B (es) | Sistemas y metodos para la fundicion de materiales metalicos. | |
WO2012108618A3 (ko) | 마이크로 웨이브를 이용한 단결정 성장장치 및 그 성장방법 | |
WO2013019026A3 (en) | Apparatus for fabricating ingot | |
JP2011140421A5 (ja) | ||
WO2012177012A3 (en) | Apparatus for fabricating ingot | |
MY165871A (en) | Method and apparatus for producing a single crystal | |
MY160009A (en) | Method for producing a silicon single crystal | |
CN203976976U (zh) | 一种改进型蓝宝石长晶炉通气结构 | |
MY187928A (en) | Process for producing silicon single crystal |