SG170759A1 - Method and apparatus for angular-resolved spectroscopic lithography characterization - Google Patents
Method and apparatus for angular-resolved spectroscopic lithography characterizationInfo
- Publication number
- SG170759A1 SG170759A1 SG201102077-3A SG2011020773A SG170759A1 SG 170759 A1 SG170759 A1 SG 170759A1 SG 2011020773 A SG2011020773 A SG 2011020773A SG 170759 A1 SG170759 A1 SG 170759A1
- Authority
- SG
- Singapore
- Prior art keywords
- angular
- resolved spectroscopic
- characterization
- lithography characterization
- spectroscopic lithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Environmental & Geological Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Computer Hardware Design (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/526,243 US7573584B2 (en) | 2006-09-25 | 2006-09-25 | Method and apparatus for angular-resolved spectroscopic lithography characterization |
Publications (1)
Publication Number | Publication Date |
---|---|
SG170759A1 true SG170759A1 (en) | 2011-05-30 |
Family
ID=38829227
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200708751-3A SG141384A1 (en) | 2006-09-25 | 2007-09-14 | Method and apparatus for angular-resolved spectroscopic lithography characterization |
SG201102077-3A SG170759A1 (en) | 2006-09-25 | 2007-09-14 | Method and apparatus for angular-resolved spectroscopic lithography characterization |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200708751-3A SG141384A1 (en) | 2006-09-25 | 2007-09-14 | Method and apparatus for angular-resolved spectroscopic lithography characterization |
Country Status (7)
Country | Link |
---|---|
US (1) | US7573584B2 (ko) |
EP (1) | EP1903397B1 (ko) |
JP (2) | JP4555847B2 (ko) |
KR (1) | KR100923543B1 (ko) |
CN (1) | CN101154055B (ko) |
SG (2) | SG141384A1 (ko) |
TW (1) | TWI371662B (ko) |
Families Citing this family (25)
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US7317531B2 (en) * | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
US7791727B2 (en) * | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
US20080144036A1 (en) * | 2006-12-19 | 2008-06-19 | Asml Netherlands B.V. | Method of measurement, an inspection apparatus and a lithographic apparatus |
US9746785B2 (en) * | 2008-06-02 | 2017-08-29 | Asml Netherlands B.V. | Sub-wavelength segmentation in measurement targets on substrates |
WO2009150089A1 (en) * | 2008-06-11 | 2009-12-17 | Asml Netherlands B.V. | Apparatus and method for inspecting a substrate |
KR101357081B1 (ko) * | 2008-06-26 | 2014-02-03 | 에이에스엠엘 네델란즈 비.브이. | 오버레이 측정 장치, 리소그래피 장치, 및 이러한 오버레이 측정 장치를 이용하는 디바이스 제조 방법 |
CN102272678A (zh) | 2008-12-30 | 2011-12-07 | Asml荷兰有限公司 | 检验方法和设备、光刻设备、光刻处理单元和器件制造方法 |
JP5277348B2 (ja) * | 2009-05-11 | 2013-08-28 | エーエスエムエル ネザーランズ ビー.ブイ. | オーバーレイエラーを決定する方法 |
NL2004656A (en) | 2009-05-12 | 2010-11-15 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL2005459A (en) | 2009-12-08 | 2011-06-09 | Asml Netherlands Bv | Inspection method and apparatus, and corresponding lithographic apparatus. |
NL2009294A (en) * | 2011-08-30 | 2013-03-04 | Asml Netherlands Bv | Method and apparatus for determining an overlay error. |
CN103307997B (zh) * | 2012-03-09 | 2016-12-14 | 上海微电子装备有限公司 | 一种角分辨散射测量装置及其测量方法 |
US8817273B2 (en) * | 2012-04-24 | 2014-08-26 | Nanometrics Incorporated | Dark field diffraction based overlay |
CN103453845B (zh) * | 2012-06-05 | 2016-07-06 | 上海微电子装备有限公司 | 一种散射计量的装置和测量方法 |
US9719920B2 (en) | 2013-07-18 | 2017-08-01 | Kla-Tencor Corporation | Scatterometry system and method for generating non-overlapping and non-truncated diffraction images |
KR102069253B1 (ko) * | 2013-07-18 | 2020-01-22 | 케이엘에이 코포레이션 | 스캐터로메트리 측정들을 위한 조명 구성들 |
WO2015031337A1 (en) | 2013-08-27 | 2015-03-05 | Kla-Tencor Corporation | Removing process-variation-related inaccuracies from scatterometry measurements |
CN106164733B (zh) * | 2014-03-31 | 2020-06-30 | 科磊股份有限公司 | 使用散射术计量的焦点测量 |
CN107078074B (zh) * | 2014-11-25 | 2021-05-25 | 科磊股份有限公司 | 分析及利用景观 |
CN104897078B (zh) * | 2015-05-19 | 2017-12-22 | 哈尔滨工业大学 | 一种基于可见光反射光谱特性的超精密车削加工表面三维微观形貌的测量方法 |
CN105180825A (zh) * | 2015-05-19 | 2015-12-23 | 哈尔滨工业大学 | 一种基于可见光反射光谱特性的超精密车削加工表面三维微观形貌测量装置 |
CN105004286B (zh) * | 2015-05-19 | 2017-12-22 | 哈尔滨工业大学 | 一种基于激光束衍射光斑特性的超精密车削加工表面三维微观形貌测量方法 |
CN109154562A (zh) * | 2016-05-11 | 2019-01-04 | Ipg光子公司 | 用于测量平板显示器的光纤激光退火多晶硅薄膜的形态特性的过程和系统 |
CN109328182B (zh) * | 2016-06-29 | 2021-10-29 | 株式会社小原 | 光学玻璃、预制件以及光学元件 |
US10775323B2 (en) | 2016-10-18 | 2020-09-15 | Kla-Tencor Corporation | Full beam metrology for X-ray scatterometry systems |
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SG123587A1 (en) * | 2002-12-16 | 2006-07-26 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2004286512A (ja) * | 2003-03-20 | 2004-10-14 | Minolta Co Ltd | 多波長光源装置及び光学測定装置 |
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US7791727B2 (en) * | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
US20060109463A1 (en) * | 2004-11-22 | 2006-05-25 | Asml Netherlands B.V. | Latent overlay metrology |
US7453577B2 (en) * | 2004-12-14 | 2008-11-18 | Asml Netherlands B.V. | Apparatus and method for inspecting a patterned part of a sample |
US7528953B2 (en) * | 2005-03-01 | 2009-05-05 | Kla-Tencor Technologies Corp. | Target acquisition and overlay metrology based on two diffracted orders imaging |
US7898662B2 (en) * | 2006-06-20 | 2011-03-01 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
-
2006
- 2006-09-25 US US11/526,243 patent/US7573584B2/en active Active
-
2007
- 2007-09-14 SG SG200708751-3A patent/SG141384A1/en unknown
- 2007-09-14 SG SG201102077-3A patent/SG170759A1/en unknown
- 2007-09-17 TW TW096134732A patent/TWI371662B/zh active
- 2007-09-18 JP JP2007240597A patent/JP4555847B2/ja active Active
- 2007-09-18 EP EP07253682A patent/EP1903397B1/en active Active
- 2007-09-21 KR KR1020070096772A patent/KR100923543B1/ko active IP Right Grant
- 2007-09-21 CN CN2007101527905A patent/CN101154055B/zh active Active
-
2010
- 2010-07-16 JP JP2010161443A patent/JP4719817B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US7573584B2 (en) | 2009-08-11 |
JP2008109104A (ja) | 2008-05-08 |
KR100923543B1 (ko) | 2009-10-27 |
JP4719817B2 (ja) | 2011-07-06 |
CN101154055B (zh) | 2010-11-24 |
EP1903397A3 (en) | 2009-07-08 |
TW200821770A (en) | 2008-05-16 |
SG141384A1 (en) | 2008-04-28 |
TWI371662B (en) | 2012-09-01 |
KR20080027748A (ko) | 2008-03-28 |
JP2010251798A (ja) | 2010-11-04 |
EP1903397A2 (en) | 2008-03-26 |
CN101154055A (zh) | 2008-04-02 |
EP1903397B1 (en) | 2012-07-25 |
JP4555847B2 (ja) | 2010-10-06 |
US20080074666A1 (en) | 2008-03-27 |
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