SG168513A1 - A method of reducing the dimension of an imprint structure on a substrate - Google Patents
A method of reducing the dimension of an imprint structure on a substrateInfo
- Publication number
- SG168513A1 SG168513A1 SG201005707-3A SG2010057073A SG168513A1 SG 168513 A1 SG168513 A1 SG 168513A1 SG 2010057073 A SG2010057073 A SG 2010057073A SG 168513 A1 SG168513 A1 SG 168513A1
- Authority
- SG
- Singapore
- Prior art keywords
- imprint structure
- dimension
- moiety
- substrate
- inorganic
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
- B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
- B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23114709P | 2009-08-04 | 2009-08-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG168513A1 true SG168513A1 (en) | 2011-02-28 |
Family
ID=43534211
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG201005707-3A SG168513A1 (en) | 2009-08-04 | 2010-08-04 | A method of reducing the dimension of an imprint structure on a substrate |
Country Status (3)
Country | Link |
---|---|
US (1) | US9904165B2 (ja) |
JP (1) | JP5349419B2 (ja) |
SG (1) | SG168513A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG188770A1 (en) * | 2011-09-22 | 2013-04-30 | Agency Science Tech & Res | A process for making a patterned metal oxide structure |
FR2995245B1 (fr) * | 2012-09-10 | 2015-05-15 | Saint Gobain | Vitrage decoratif a couche reflechissante deposee sur un substrat texture |
WO2014085511A2 (en) * | 2012-11-27 | 2014-06-05 | The Regents Of The University Of California | Polymerized metal-organic material for printable photonic devices |
JP6213994B2 (ja) * | 2014-03-28 | 2017-10-18 | 国立研究開発法人産業技術総合研究所 | 光酸化剤による導電性膜印刷用親水性パターン形成方法 |
US11281094B2 (en) * | 2018-11-15 | 2022-03-22 | Applied Materials, Inc. | Method for via formation by micro-imprinting |
CN115477864A (zh) * | 2021-05-31 | 2022-12-16 | 京东方科技集团股份有限公司 | 紫外光固化纳米压印材料和压印模板 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005053006A (ja) * | 2003-08-06 | 2005-03-03 | Nippon Sheet Glass Co Ltd | 微小成形体の製造方法 |
US20060081557A1 (en) * | 2004-10-18 | 2006-04-20 | Molecular Imprints, Inc. | Low-k dielectric functional imprinting materials |
JP2006168147A (ja) * | 2004-12-15 | 2006-06-29 | Aitesu:Kk | 有機無機ハイブリッド材料とナノインプリント技術を用いた微細構造体の製造方法および微細構造体 |
JP2007080455A (ja) * | 2005-09-16 | 2007-03-29 | Toshiba Corp | インプリント材料およびそれを用いたパタン形成方法 |
JP4940784B2 (ja) * | 2006-06-28 | 2012-05-30 | 凸版印刷株式会社 | インプリント用モールドおよびインプリント用モールド製造方法 |
-
2010
- 2010-08-04 SG SG201005707-3A patent/SG168513A1/en unknown
- 2010-08-04 JP JP2010175558A patent/JP5349419B2/ja active Active
- 2010-08-04 US US12/849,954 patent/US9904165B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20110031658A1 (en) | 2011-02-10 |
JP2011068126A (ja) | 2011-04-07 |
US9904165B2 (en) | 2018-02-27 |
JP5349419B2 (ja) | 2013-11-20 |
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