SG161176A1 - Solid-state image pickup element, solid-state image pickup device and production method therefor - Google Patents
Solid-state image pickup element, solid-state image pickup device and production method thereforInfo
- Publication number
- SG161176A1 SG161176A1 SG200906919-6A SG2009069196A SG161176A1 SG 161176 A1 SG161176 A1 SG 161176A1 SG 2009069196 A SG2009069196 A SG 2009069196A SG 161176 A1 SG161176 A1 SG 161176A1
- Authority
- SG
- Singapore
- Prior art keywords
- conductive type
- region
- hole portion
- solid
- image pickup
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 abstract 5
- 239000012535 impurity Substances 0.000 abstract 3
- 238000006243 chemical reaction Methods 0.000 abstract 2
- 238000002955 isolation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14806—Structural or functional details thereof
- H01L27/14812—Special geometry or disposition of pixel-elements, address lines or gate-electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14689—MOS based technologies
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
It is intended to provide a solid-state image pickup element capable of reducing an area of a read channel to increase a ratio of a surface area of a light-receiving section to the overall surface area of one pixel. The solid-state image pickup element comprises a first-conductive type planar semiconductor layer formed on a second- conductive type planar semiconductor layer, a hole portion formed in the first- conductive type planar semiconductor layer to define a hole therein, a first- conductive type high-concentration impurity region formed in a bottom wall of the hole portion, a first-conductive type high-concentration impurity-doped element isolation region formed in a part of a sidewall of the hole portion and connected to the first- conductive type high-concentration impurity region, a second-conductive type photoelectric conversion region formed beneath the first-conductive type high- concentration impurity region and in a part of a lower region of the remaining part of the sidewall of the hole portion, and adapted to undergo a change in charge amount upon receiving light, a transfer electrode formed on the sidewall of the hole portion through a gate dielectric film, a second-conductive type CCD channel region formed in a top surface of the first-conductive type planar semiconductor layerand in a part of an upper region of the remaining part of the sidewall of the hole portion, and a read channel formed in a region of the first- conductive type planar semiconductor layer sandwiched between the second-conductive type photoelectric conversion region and the second-conductive type CCD channel region. (Figure 4)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2008/069321 WO2010046994A1 (en) | 2008-10-24 | 2008-10-24 | Solid-state image sensor, solid-state image pickup device and its manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG161176A1 true SG161176A1 (en) | 2010-05-27 |
Family
ID=41506530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200906919-6A SG161176A1 (en) | 2008-10-24 | 2009-10-16 | Solid-state image pickup element, solid-state image pickup device and production method therefor |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP2180516A3 (en) |
KR (1) | KR101274794B1 (en) |
CN (1) | CN101728410B (en) |
SG (1) | SG161176A1 (en) |
TW (1) | TWI538182B (en) |
WO (2) | WO2010046994A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE202010016472U1 (en) | 2009-12-15 | 2011-03-24 | Isensee, Gerrit Ragnar Ulrich Friedrich, Maspalomas | Module for simulating an occupied seat contact mat in vehicles |
JP2024069731A (en) * | 2021-03-17 | 2024-05-22 | ソニーセミコンダクタソリューションズ株式会社 | Photoelectric conversion element and imaging device |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59129463A (en) * | 1983-01-14 | 1984-07-25 | Nec Corp | Solid-state image pickup device |
JPH01168059A (en) * | 1987-12-24 | 1989-07-03 | Fuji Photo Film Co Ltd | Solid state image sensor |
JP2517375B2 (en) * | 1988-12-19 | 1996-07-24 | 三菱電機株式会社 | Solid-state imaging device, charge transfer device used in the device, and manufacturing method thereof |
JPH02278874A (en) * | 1989-04-20 | 1990-11-15 | Hitachi Ltd | Solid state image sensor and manufacture thereof |
JPH02304976A (en) * | 1989-05-19 | 1990-12-18 | Nec Corp | Solid image-puckup element |
JPH03161970A (en) * | 1989-11-21 | 1991-07-11 | Toshiba Corp | Solid-state image sensing device |
JP2719027B2 (en) * | 1990-04-02 | 1998-02-25 | 松下電子工業株式会社 | Method for manufacturing charge transfer device |
JP3247163B2 (en) * | 1992-09-14 | 2002-01-15 | 株式会社東芝 | Solid-state imaging device and manufacturing method thereof |
JPH06252375A (en) * | 1993-03-01 | 1994-09-09 | Hitachi Ltd | Solid-state image pickup device |
JPH06268189A (en) * | 1993-03-15 | 1994-09-22 | Toshiba Corp | Solid-state image sensing device |
JPH10107249A (en) * | 1996-09-27 | 1998-04-24 | Sony Corp | Manufacture of solid image-pickup element |
JPH10189936A (en) * | 1996-12-26 | 1998-07-21 | Sony Corp | Solid-state image sensor and manufacture thereof |
KR100475733B1 (en) * | 1997-10-07 | 2005-07-07 | 삼성전자주식회사 | Ccd type image sensor and manufacturing method thereof |
JP3152300B2 (en) | 1998-09-17 | 2001-04-03 | 日本電気株式会社 | Solid-state imaging device and method of manufacturing the same |
JP2000196060A (en) | 1998-12-24 | 2000-07-14 | Nec Corp | Solid-state image sensor and manufacture thereof |
JP2001308309A (en) * | 2000-04-26 | 2001-11-02 | Sony Corp | Solid-state image pickup element and its manufacturing method |
EP1341235A3 (en) * | 2002-02-28 | 2006-05-10 | Canon Kabushiki Kaisha | Image pickup apparatus |
KR100690884B1 (en) * | 2005-04-28 | 2007-03-09 | 삼성전자주식회사 | Image sensor and fabricating method for the same |
JP2008112831A (en) * | 2006-10-30 | 2008-05-15 | Fujifilm Corp | Solid-state imaging element, and imaging apparatus equipped with it |
JP5114968B2 (en) * | 2007-02-20 | 2013-01-09 | 富士通セミコンダクター株式会社 | Semiconductor device and manufacturing method thereof |
-
2008
- 2008-10-24 WO PCT/JP2008/069321 patent/WO2010046994A1/en active Application Filing
-
2009
- 2009-10-16 SG SG200906919-6A patent/SG161176A1/en unknown
- 2009-10-21 TW TW098135560A patent/TWI538182B/en active
- 2009-10-23 EP EP09173948.2A patent/EP2180516A3/en not_active Withdrawn
- 2009-10-23 KR KR1020090101455A patent/KR101274794B1/en active IP Right Grant
- 2009-10-26 CN CN2009101806404A patent/CN101728410B/en active Active
- 2009-10-26 WO PCT/JP2009/068320 patent/WO2010047412A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP2180516A3 (en) | 2013-10-23 |
WO2010047412A1 (en) | 2010-04-29 |
WO2010046994A1 (en) | 2010-04-29 |
CN101728410A (en) | 2010-06-09 |
TWI538182B (en) | 2016-06-11 |
KR101274794B1 (en) | 2013-06-13 |
KR20100045944A (en) | 2010-05-04 |
EP2180516A2 (en) | 2010-04-28 |
CN101728410B (en) | 2013-10-30 |
TW201017875A (en) | 2010-05-01 |
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