SG161142A1 - Thin film formation apparatus and magnetic recording medium manufacturing method - Google Patents

Thin film formation apparatus and magnetic recording medium manufacturing method

Info

Publication number
SG161142A1
SG161142A1 SG200905698-7A SG2009056987A SG161142A1 SG 161142 A1 SG161142 A1 SG 161142A1 SG 2009056987 A SG2009056987 A SG 2009056987A SG 161142 A1 SG161142 A1 SG 161142A1
Authority
SG
Singapore
Prior art keywords
film formation
sputtering
substrate
thin film
recording medium
Prior art date
Application number
SG200905698-7A
Other languages
English (en)
Inventor
Einstein Noel Abarra
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Publication of SG161142A1 publication Critical patent/SG161142A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
SG200905698-7A 2008-10-31 2009-08-26 Thin film formation apparatus and magnetic recording medium manufacturing method SG161142A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008282384A JP5336151B2 (ja) 2008-10-31 2008-10-31 薄膜形成装置及び磁気記録媒体の製造方法

Publications (1)

Publication Number Publication Date
SG161142A1 true SG161142A1 (en) 2010-05-27

Family

ID=42130099

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200905698-7A SG161142A1 (en) 2008-10-31 2009-08-26 Thin film formation apparatus and magnetic recording medium manufacturing method

Country Status (4)

Country Link
US (1) US20100108495A1 (https=)
JP (1) JP5336151B2 (https=)
CN (1) CN101724816B (https=)
SG (1) SG161142A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8776542B2 (en) * 2009-12-25 2014-07-15 Canon Anelva Corporation Cooling system
TW201137143A (en) * 2010-04-28 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering system

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4392451A (en) * 1980-12-31 1983-07-12 The Boeing Company Apparatus for forming thin-film heterojunction solar cells employing materials selected from the class of I-III-VI2 chalcopyrite compounds
US4749465A (en) * 1985-05-09 1988-06-07 Seagate Technology In-line disk sputtering system
US4894133A (en) * 1985-11-12 1990-01-16 Virgle L. Hedgcoth Method and apparatus making magnetic recording disk
US5082747A (en) * 1985-11-12 1992-01-21 Hedgcoth Virgle L Magnetic recording disk and sputtering process and apparatus for producing same
US4902398A (en) * 1988-04-27 1990-02-20 American Thim Film Laboratories, Inc. Computer program for vacuum coating systems
JPH0449523A (ja) * 1990-06-18 1992-02-18 Denki Kagaku Kogyo Kk 磁気記録媒体の製造法及びその装置
JPH06195706A (ja) * 1992-12-25 1994-07-15 Hitachi Metals Ltd 薄膜磁気記録ディスクの製造方法
KR100262768B1 (ko) * 1996-04-24 2000-08-01 니시히라 순지 스퍼터성막장치
US6183523B1 (en) * 1997-03-03 2001-02-06 Tokyo Electron Limited Apparatus for thermal control of variously sized articles in vacuum
US5998730A (en) * 1997-05-13 1999-12-07 Canon Kabushiki Kaisha Production method for deposited film, production method for photoelectric conversion element, production apparatus for deposited film, production apparatus for photoelectric conversion element
US6093290A (en) * 1997-05-14 2000-07-25 Canon Kabushiki Kaisha Method of generating a reciprocating plurality of magnetic fluxes on a target
US6197165B1 (en) * 1998-05-06 2001-03-06 Tokyo Electron Limited Method and apparatus for ionized physical vapor deposition
CN1260599A (zh) * 1998-12-22 2000-07-19 佳能株式会社 处理衬底的设备和方法
JP2000307139A (ja) * 1999-04-21 2000-11-02 Fuji Electric Co Ltd 薄膜太陽電池の製造方法及び薄膜電極層形成装置
JP2003013218A (ja) * 2001-06-29 2003-01-15 Canon Inc 長時間スパッタリング方法
WO2004032189A2 (en) * 2002-09-30 2004-04-15 Miasolé Manufacturing apparatus and method for large-scale production of thin-film solar cells
WO2004061151A1 (en) * 2002-12-31 2004-07-22 Cardinal Cg Company Coater having substrate cleaning device and coating deposition methods employing such coater
US7967961B2 (en) * 2004-08-30 2011-06-28 Ulvac, Inc Film forming apparatus
JP4534906B2 (ja) * 2005-08-22 2010-09-01 富士電機デバイステクノロジー株式会社 磁気記録媒体およびその製造方法
JP2008176847A (ja) * 2007-01-17 2008-07-31 Showa Denko Kk 薄膜積層体の製造方法、及び薄膜積層体製造装置と磁気記録媒体および磁気記録再生装置
WO2009057715A1 (ja) * 2007-10-31 2009-05-07 Canon Anelva Corporation マグネトロンユニット、マグネトロンスパッタリング装置及び電子デバイスの製造方法
JP2010106349A (ja) * 2008-10-31 2010-05-13 Canon Anelva Corp スパッタ装置、薄膜形成装置及び磁気記録媒体の製造方法

Also Published As

Publication number Publication date
US20100108495A1 (en) 2010-05-06
CN101724816A (zh) 2010-06-09
JP2010106350A (ja) 2010-05-13
CN101724816B (zh) 2013-08-21
JP5336151B2 (ja) 2013-11-06

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