SG152187A1 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method - Google Patents

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Info

Publication number
SG152187A1
SG152187A1 SG200807879-2A SG2008078792A SG152187A1 SG 152187 A1 SG152187 A1 SG 152187A1 SG 2008078792 A SG2008078792 A SG 2008078792A SG 152187 A1 SG152187 A1 SG 152187A1
Authority
SG
Singapore
Prior art keywords
lithographic
beams
device manufacturing
processing cell
substrate
Prior art date
Application number
SG200807879-2A
Other languages
English (en)
Inventor
Straaijer Alexander
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG152187A1 publication Critical patent/SG152187A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
SG200807879-2A 2007-10-25 2008-10-22 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method SG152187A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US99602407P 2007-10-25 2007-10-25

Publications (1)

Publication Number Publication Date
SG152187A1 true SG152187A1 (en) 2009-05-29

Family

ID=40280773

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200807879-2A SG152187A1 (en) 2007-10-25 2008-10-22 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Country Status (8)

Country Link
US (1) US8115926B2 (ko)
EP (1) EP2053349A3 (ko)
JP (1) JP4871943B2 (ko)
KR (1) KR20090042195A (ko)
CN (1) CN101482702A (ko)
IL (1) IL194839A0 (ko)
SG (1) SG152187A1 (ko)
TW (1) TW200925794A (ko)

Families Citing this family (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036459A1 (nl) * 2008-02-13 2009-08-14 Asml Netherlands Bv Method and apparatus for angular-resolved spectroscopic lithography characterization.
WO2011101192A1 (en) * 2010-02-17 2011-08-25 Asml Netherlands B.V. Estimating substrate model parameters for lithographic apparatus control
NL2006229A (en) * 2010-03-18 2011-09-20 Asml Netherlands Bv Inspection method and apparatus, and associated computer readable product.
KR101793538B1 (ko) * 2010-07-19 2017-11-03 에이에스엠엘 네델란즈 비.브이. 오버레이 오차를 결정하는 장치 및 방법
NL2009004A (en) * 2011-07-20 2013-01-22 Asml Netherlands Bv Inspection method and apparatus, and lithographic apparatus.
US9213227B2 (en) * 2011-08-18 2015-12-15 Nikon Corporation Custom color or polarization sensitive CCD for separating multiple signals in autofocus projection system
GB201115807D0 (en) 2011-09-13 2011-10-26 Univ St Andrews Controlling light transmission through a medium
US9255887B2 (en) 2013-06-19 2016-02-09 Kla-Tencor Corporation 2D programmable aperture mechanism
KR102164337B1 (ko) * 2014-04-28 2020-10-12 가부시키가이샤 니콘 패턴 노광 장치
NL2017300A (en) * 2015-08-27 2017-03-01 Asml Netherlands Bv Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
NL2017881B1 (en) * 2015-12-18 2017-10-17 Ultratech Inc Full-wafer inspection methods having selectable pixel density
WO2017153133A1 (en) 2016-03-08 2017-09-14 Asml Netherlands B.V. Inspection apparatus and method, lithographic apparatus, method of manufacturing devices and computer program
US10048132B2 (en) * 2016-07-28 2018-08-14 Kla-Tencor Corporation Simultaneous capturing of overlay signals from multiple targets
WO2018233947A1 (en) 2017-06-20 2018-12-27 Asml Netherlands B.V. DETERMINATION OF EDGE ROUGHNESS PARAMETERS
KR102374949B1 (ko) 2017-07-25 2022-03-15 에이에스엠엘 네델란즈 비.브이. 파라미터 결정 방법 및 그 장치
EP3451060A1 (en) * 2017-08-28 2019-03-06 ASML Netherlands B.V. Substrate, metrology apparatus and associated methods for a lithographic process
WO2019042809A1 (en) 2017-09-01 2019-03-07 Asml Netherlands B.V. OPTICAL SYSTEMS, METROLOGY APPARATUS AND ASSOCIATED METHODS
EP3454124A1 (en) * 2017-09-07 2019-03-13 ASML Netherlands B.V. Method to determine a patterning process parameter
JP6979529B2 (ja) 2017-09-11 2021-12-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィプロセスにおける計測
EP3457211A1 (en) 2017-09-13 2019-03-20 ASML Netherlands B.V. A method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatus
EP3474074A1 (en) 2017-10-17 2019-04-24 ASML Netherlands B.V. Scatterometer and method of scatterometry using acoustic radiation
EP3480659A1 (en) 2017-11-01 2019-05-08 ASML Netherlands B.V. Estimation of data in metrology
WO2019091678A1 (en) 2017-11-07 2019-05-16 Asml Netherlands B.V. Metrology apparatus and a method of determining a characteristic of interest
CN111542783A (zh) 2017-12-28 2020-08-14 Asml荷兰有限公司 用于确定衬底上的结构的感兴趣的特性的量测设备与方法
KR102544707B1 (ko) 2018-02-27 2023-06-16 에이에스엠엘 네델란즈 비.브이. 기판 상의 하나 이상의 구조체의 특성을 결정하기 위한 계측 장치 및 방법
EP3570109A1 (en) 2018-05-14 2019-11-20 ASML Netherlands B.V. Illumination source for an inspection apparatus, inspection apparatus and inspection method
IL310215A (en) 2018-06-13 2024-03-01 Asml Netherlands Bv Metrological device
EP3582009A1 (en) 2018-06-15 2019-12-18 ASML Netherlands B.V. Reflector and method of manufacturing a reflector
EP3611569A1 (en) 2018-08-16 2020-02-19 ASML Netherlands B.V. Metrology apparatus and photonic crystal fiber
KR20210040134A (ko) 2018-09-04 2021-04-12 에이에스엠엘 네델란즈 비.브이. 계측 장치
EP3627226A1 (en) 2018-09-20 2020-03-25 ASML Netherlands B.V. Optical system, metrology apparatus and associated method
EP3629086A1 (en) * 2018-09-25 2020-04-01 ASML Netherlands B.V. Method and apparatus for determining a radiation beam intensity profile
US11087065B2 (en) 2018-09-26 2021-08-10 Asml Netherlands B.V. Method of manufacturing devices
EP3870547A1 (en) 2018-10-24 2021-09-01 ASML Netherlands B.V. Optical fibers and production methods therefor
EP3650941A1 (en) 2018-11-12 2020-05-13 ASML Netherlands B.V. Method of determining the contribution of a processing apparatus to a substrate parameter
WO2020114684A1 (en) 2018-12-03 2020-06-11 Asml Netherlands B.V. Method of manufacturing devices
EP3696606A1 (en) 2019-02-15 2020-08-19 ASML Netherlands B.V. A metrology apparatus with radiation source having multiple broadband outputs
EP3702840A1 (en) 2019-03-01 2020-09-02 ASML Netherlands B.V. Alignment method and associated metrology device
EP3705942A1 (en) 2019-03-04 2020-09-09 ASML Netherlands B.V. Hollow-core photonic crystal fiber based optical component for broadband radiation generation
CN116643348A (zh) 2019-03-25 2023-08-25 Asml荷兰有限公司 频率拓宽装置和方法
WO2020200637A1 (en) 2019-04-03 2020-10-08 Asml Netherlands B.V. Optical fiber
EP3739389A1 (en) 2019-05-17 2020-11-18 ASML Netherlands B.V. Metrology tools comprising aplanatic objective singlet
CN114008499A (zh) 2019-06-21 2022-02-01 Asml荷兰有限公司 安装式中空芯部光纤布置
EP3758168A1 (en) 2019-06-25 2020-12-30 ASML Netherlands B.V. Hollow-core photonic crystal fiber based optical component for broadband radiation generation
EP3611567A3 (en) 2019-07-23 2020-05-13 ASML Netherlands B.V. Improvements in metrology targets
JP2022542070A (ja) 2019-07-24 2022-09-29 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
EP3783439A1 (en) 2019-08-22 2021-02-24 ASML Netherlands B.V. Metrology device and detection apparatus therefor
CN114430875A (zh) 2019-09-02 2022-05-03 Asml荷兰有限公司 基于光子晶体光纤的宽带光源的模式控制
KR20220035963A (ko) 2019-09-03 2022-03-22 에이에스엠엘 네델란즈 비.브이. 광대역 방사선을 시준하기 위한 어셈블리
CN114514465A (zh) 2019-09-18 2022-05-17 Asml荷兰有限公司 中空芯部光纤中的改进的宽带辐射生成
EP4365653A2 (en) 2019-10-24 2024-05-08 ASML Netherlands B.V. Hollow-core photonic crystal fiber based optical component for broadband radiation generation
EP4053086A1 (en) 2019-11-07 2022-09-07 ASML Netherlands B.V. Method of manufacture of a capillary for a hollow-core photonic crystal fiber
EP3851904B1 (en) 2020-01-15 2023-02-01 ASML Netherlands B.V. Method, assembly, and apparatus for improved control of broadband radiation generation
US11309202B2 (en) * 2020-01-30 2022-04-19 Kla Corporation Overlay metrology on bonded wafers
EP3889681A1 (en) 2020-03-31 2021-10-06 ASML Netherlands B.V. An assembly including a non-linear element and a method of use thereof
EP3913429A1 (en) 2020-05-19 2021-11-24 ASML Netherlands B.V. A supercontinuum radiation source and associated metrology devices
JP2023540186A (ja) 2020-09-03 2023-09-22 エーエスエムエル ネザーランズ ビー．ブイ． 中空コアフォトニック結晶ファイバベースの広帯域放射ジェネレータ
KR20220032922A (ko) 2020-09-08 2022-03-15 삼성전자주식회사 퓨필 타원 편광 계측 장치 및 방법, 및 그 방법을 이용한 반도체 소자 제조방법
WO2022122325A1 (en) 2020-12-10 2022-06-16 Asml Netherlands B.V. Hollow-core photonic crystal fiber based broadband radiation generator
CN113091624B (zh) * 2021-03-04 2022-08-16 上海精测半导体技术有限公司 一种探测反射光变化的装置及方法
WO2023160924A1 (en) * 2022-02-22 2023-08-31 Asml Netherlands B.V. Method and apparatus for reflecting pulsed radiation
JP2023142214A (ja) * 2022-03-24 2023-10-05 株式会社Ｓｃｒｅｅｎホールディングス 光学装置、露光装置および露光方法
CN115407621B (zh) * 2022-11-01 2023-03-24 合肥新晶集成电路有限公司 曝光套刻精度的控制方法、控制装置及套刻系统

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5166752A (en) * 1990-01-11 1992-11-24 Rudolph Research Corporation Simultaneous multiple angle/multiple wavelength ellipsometer and method
JPH05157521A (ja) * 1991-08-29 1993-06-22 Nkk Corp エリプソパラメータ測定方法及びエリプソメータ
US5880838A (en) * 1996-06-05 1999-03-09 California Institute Of California System and method for optically measuring a structure
US6757056B1 (en) * 2001-03-26 2004-06-29 Candela Instruments Combined high speed optical profilometer and ellipsometer
US6031615A (en) * 1997-09-22 2000-02-29 Candela Instruments System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness
US7068833B1 (en) * 2000-08-30 2006-06-27 Kla-Tencor Corporation Overlay marks, methods of overlay mark design and methods of overlay measurements
ATE467810T1 (de) 2001-03-26 2010-05-15 Candela Instr System zur messung von phasendifferenzen von reflektierten lichtsignalen
US6678046B2 (en) * 2001-08-28 2004-01-13 Therma-Wave, Inc. Detector configurations for optical metrology
WO2004053426A1 (en) 2002-12-05 2004-06-24 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
US6965431B2 (en) 2003-02-28 2005-11-15 Ut-Battelle, Llc Integrated tunable optical sensor (ITOS) system
IL162290A (en) * 2004-06-01 2013-06-27 Nova Measuring Instr Ltd Optical measurement system
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7161669B2 (en) * 2005-05-06 2007-01-09 Kla- Tencor Technologies Corporation Wafer edge inspection
US7692792B2 (en) * 2006-06-22 2010-04-06 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7701577B2 (en) * 2007-02-21 2010-04-20 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Also Published As

Publication number Publication date
EP2053349A2 (en) 2009-04-29
TW200925794A (en) 2009-06-16
IL194839A0 (en) 2009-08-03
KR20090042195A (ko) 2009-04-29
EP2053349A3 (en) 2009-06-24
CN101482702A (zh) 2009-07-15
US20090168062A1 (en) 2009-07-02
JP2009177134A (ja) 2009-08-06
JP4871943B2 (ja) 2012-02-08
US8115926B2 (en) 2012-02-14

Similar Documents

Publication Publication Date Title
SG152187A1 (en) Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
TW200951636A (en) Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
Matković et al. Spectroscopic imaging ellipsometry and Fano resonance modeling of graphene
WO2011159725A3 (en) Discrete polarization scatterometry
EP2010877A4 (en) POLARIZATION-BASED INTERFEROMETRIC DETECTOR
TW200717186A (en) Exposure apparatus and method
TW200710592A (en) Lithographic device, and method
SG143131A1 (en) Inspection method and apparatus,lithographic apparatus, lithographic processing cell and device manufacturing method
WO2014189967A3 (en) Polarization properties imaging systems
BR112013000048A2 (pt) sistemas e métodos para medir o uso de potência elétrica em uma estrutura e sistemas e métodos de calibrar os mesmos
WO2007075675A3 (en) High precision code plates and geophones
JP2010109257A5 (ko)
JP2014132695A5 (ko)
WO2006116356A3 (en) Method and apparatus for measuring dimensional changes in transparent substrates
CN102706539A (zh) 相位延迟量分布和快轴方位角分布实时测量装置和方法
CN108036744B (zh) 一种纳米薄膜制备过程的大面积动态测量装置及方法
IL273001B2 (en) Metrology method and instruments
Tiefenauer et al. Monolayer graphene coupled to a flexible plasmonic nanograting for ultrasensitive strain monitoring
Guo et al. Full-field stress determination in photoelasticity with phase shifting technique
WO2013087431A3 (en) Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell
Xi et al. An analytical model for the polarization of synchrotron radiation in a soft X-ray region
EP2629063A3 (en) Photoelectric encoder
Feng et al. The impact of signal–noise ratio on degree of linear polarization measurement
Soskin et al. New polarization singularities of partially coherent light beams
TW200725775A (en) Systems and methods for optical measurement