SG148093A1 - Multi laser system - Google Patents

Multi laser system

Info

Publication number
SG148093A1
SG148093A1 SG200802587-6A SG2008025876A SG148093A1 SG 148093 A1 SG148093 A1 SG 148093A1 SG 2008025876 A SG2008025876 A SG 2008025876A SG 148093 A1 SG148093 A1 SG 148093A1
Authority
SG
Singapore
Prior art keywords
laser
laser beam
substrate
receiving
oscillator
Prior art date
Application number
SG200802587-6A
Other languages
English (en)
Inventor
Kyu Dong Sung
Original Assignee
Eo Technics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eo Technics Co Ltd filed Critical Eo Technics Co Ltd
Publication of SG148093A1 publication Critical patent/SG148093A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Optical Communication System (AREA)
SG200802587-6A 2007-05-09 2008-04-03 Multi laser system SG148093A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070045105A KR100864863B1 (ko) 2007-05-09 2007-05-09 멀티 레이저 시스템

Publications (1)

Publication Number Publication Date
SG148093A1 true SG148093A1 (en) 2008-12-31

Family

ID=39670417

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200802587-6A SG148093A1 (en) 2007-05-09 2008-04-03 Multi laser system

Country Status (10)

Country Link
US (1) US7672344B2 (ja)
EP (1) EP1990124B1 (ja)
JP (1) JP2008279503A (ja)
KR (1) KR100864863B1 (ja)
CN (1) CN101304154B (ja)
AT (1) ATE439939T1 (ja)
DE (1) DE602008000099D1 (ja)
MY (1) MY147896A (ja)
SG (1) SG148093A1 (ja)
TW (1) TWI369723B (ja)

Families Citing this family (13)

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US20100147811A1 (en) * 2008-12-11 2010-06-17 Sobey Mark S Apparatus for laser scribing of dielectric-coated semiconductor wafers
KR100933934B1 (ko) 2009-04-15 2009-12-28 주식회사 비앤비시스템 멀티파장 피부재생 레이저장치
TWI640384B (zh) * 2011-03-21 2018-11-11 美商伊雷克托科學工業股份有限公司 在物品上建立標記的方法、雷射標記裝置、具有標記的物品、具有標記的經陽極氧化的物品及經陽極氧化的物品
US9092955B2 (en) * 2013-03-22 2015-07-28 Konkuk University Industrial Cooperation Corp Laser apparatus capable of controlling a photo-mechanical effect and method using the same
US8854406B1 (en) * 2013-04-01 2014-10-07 Telesis Technologies, Inc. Collective marking of a surface by steering multiple laser beams generated by a laser controller
US9782855B2 (en) * 2013-06-11 2017-10-10 Fundació Institut De Ciències Fotòniques Protective structure for tables and optical table comprising said protective structure
JP6621128B2 (ja) * 2013-12-05 2019-12-18 テレシス テクノロジーズ，インコーポレイテッド レーザコントローラで生成した複数のレーザビームを操作することによる面への集中的マーキング
KR20150102180A (ko) * 2014-02-27 2015-09-07 삼성디스플레이 주식회사 레이저 빔 조사 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101742132B1 (ko) * 2015-08-10 2017-05-31 주식회사 이오테크닉스 레이저 가공장치
CN105798469B (zh) * 2016-05-16 2017-09-05 广州广源激光科技有限公司 一种多激光头激光切割机
KR102012297B1 (ko) 2017-09-07 2019-08-20 (주)에이치피케이 멀티빔 스캐너 시스템을 이용한 패턴 형성방법
KR102103216B1 (ko) * 2017-12-28 2020-04-22 주식회사 에스에프에이 레이저를 이용한 기판 처리장치
KR102550517B1 (ko) * 2018-09-18 2023-07-03 삼성디스플레이 주식회사 레이저 가공 장치 및 이의 제조 방법

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JP2755400B2 (ja) 1988-11-15 1998-05-20 シチズン時計株式会社 描画装置
US5166493A (en) * 1989-01-10 1992-11-24 Canon Kabushiki Kaisha Apparatus and method of boring using laser
US5168454A (en) * 1989-10-30 1992-12-01 International Business Machines Corporation Formation of high quality patterns for substrates and apparatus therefor
JP2559947B2 (ja) * 1992-05-26 1996-12-04 新日本製鐵株式会社 薄肉鋳片鋳造用冷却ドラムのディンプル加工装置および加工方法
US5892611A (en) 1993-08-11 1999-04-06 Asahi Kogaku Kogyo Kabushiki Kaisha Laser drawing apparatus
WO1996020435A1 (fr) 1994-12-28 1996-07-04 Shinozaki Manufacturing Co., Ltd. Procede et appareil de traitement de rouleaux et autres par faisceau laser
DE19707834A1 (de) * 1996-04-09 1997-10-16 Zeiss Carl Fa Materialbestrahlungsgerät und Verfahren zum Betrieb von Materialbestrahlungsgeräten
DE69737991T2 (de) 1996-11-20 2008-04-30 Ibiden Co., Ltd., Ogaki Laserbearbeitungsvorrichtung, verfahren und vorrichtung zur herstellung einer mehrschichtigen, gedruckten leiterplatte
US5798867A (en) 1997-02-04 1998-08-25 Miyachi Technos Corporation Laser beam-splitting apparatus
JP2000108141A (ja) * 1998-10-07 2000-04-18 Shinozaki Seisakusho:Kk 金型の残渣除去方法及び残渣除去装置
JP2000202664A (ja) * 1999-01-08 2000-07-25 Sumitomo Heavy Ind Ltd レ―ザ穴あけ加工方法
JP2002542043A (ja) 1999-04-27 2002-12-10 ジーエスアイ ルモニクス インコーポレイテッド 多重レーザビームを使用する材料処理システム及び方法
JP4580065B2 (ja) * 2000-07-10 2010-11-10 ミヤチテクノス株式会社 レーザ溶接方法及び装置
JP4346254B2 (ja) * 2001-03-30 2009-10-21 住友重機械工業株式会社 レーザ加工装置とレーザ加工方法
US6770546B2 (en) * 2001-07-30 2004-08-03 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
JP2003200279A (ja) 2001-10-24 2003-07-15 Seiko Epson Corp 基板の電気配線切断方法及びその装置、並びに電子デバイスの製造方法及びその装置
JP3822188B2 (ja) * 2002-12-26 2006-09-13 日立ビアメカニクス株式会社 多重ビームレーザ穴あけ加工装置
WO2005084873A1 (ja) * 2004-03-02 2005-09-15 Sumitomo Heavy Industries, Ltd. レーザ照射装置及びパターン描画方法
WO2005124842A1 (en) * 2004-06-18 2005-12-29 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device
KR100562423B1 (ko) * 2004-09-08 2006-03-23 주식회사 이오테크닉스 웨이퍼 절단용 레이저 시스템 및 이를 이용한 웨이퍼 절단방법
KR100723935B1 (ko) * 2005-10-18 2007-05-31 주식회사 한광옵토 레이저 패턴 가공 장치
KR100709171B1 (ko) 2005-11-08 2007-04-18 주식회사 이오테크닉스 레이저 빔 분할을 이용한 레이저 가공 장치

Also Published As

Publication number Publication date
US20080279232A1 (en) 2008-11-13
CN101304154B (zh) 2011-06-29
DE602008000099D1 (de) 2009-10-01
TW200905735A (en) 2009-02-01
EP1990124A1 (en) 2008-11-12
EP1990124B1 (en) 2009-08-19
ATE439939T1 (de) 2009-09-15
TWI369723B (en) 2012-08-01
KR100864863B1 (ko) 2008-10-23
MY147896A (en) 2013-01-31
JP2008279503A (ja) 2008-11-20
US7672344B2 (en) 2010-03-02
CN101304154A (zh) 2008-11-12

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