SG145535A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG145535A1
SG145535A1 SG200307094-3A SG2003070943A SG145535A1 SG 145535 A1 SG145535 A1 SG 145535A1 SG 2003070943 A SG2003070943 A SG 2003070943A SG 145535 A1 SG145535 A1 SG 145535A1
Authority
SG
Singapore
Prior art keywords
pupil plane
lithographic apparatus
position dependence
dependence
intensity distribution
Prior art date
Application number
SG200307094-3A
Other languages
English (en)
Inventor
Heine Melle Mulder
Jan Hoegee
Armand Eugene Albert Koolen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP02080031A external-priority patent/EP1426823A1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG145535A1 publication Critical patent/SG145535A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200307094-3A 2002-12-02 2003-12-01 Lithographic apparatus and device manufacturing method SG145535A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02080031A EP1426823A1 (en) 2002-12-02 2002-12-02 Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP03076401 2003-05-09

Publications (1)

Publication Number Publication Date
SG145535A1 true SG145535A1 (en) 2008-09-29

Family

ID=32510130

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200307094-3A SG145535A1 (en) 2002-12-02 2003-12-01 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (1) US6958806B2 (ja)
JP (1) JP4034262B2 (ja)
KR (1) KR100588117B1 (ja)
CN (1) CN1504830A (ja)
SG (1) SG145535A1 (ja)
TW (1) TWI281099B (ja)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI437618B (zh) 2004-02-06 2014-05-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US20080100816A1 (en) * 2006-10-31 2008-05-01 Asml Netherlands B.V. Lithographic apparatus and method
WO2008061681A2 (de) * 2006-11-21 2008-05-29 Carl Zeiss Smt Ag Beleuchtungsoptik für die projektions-mikrolithografie sowie mess- und überwachungsverfahren für eine derartige beleuchtungsoptik
US7990520B2 (en) 2006-12-18 2011-08-02 Carl Zeiss Smt Gmbh Microlithography illumination systems, components and methods
DE102008003916A1 (de) * 2007-01-23 2008-07-24 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit Messvorrichtung sowie Verfahren zum Messen einer Bestrahlungsstärkeverteilung
JP5211487B2 (ja) * 2007-01-25 2013-06-12 株式会社ニコン 露光方法及び露光装置並びにマイクロデバイスの製造方法
EP2511765B1 (de) 2007-02-06 2019-04-03 Carl Zeiss SMT GmbH Regelvorrichtung zur Regelung einer flächigen Anordnung individuell ansteuerbarer Strahlablenkungselemente in einer mikrolithographischen Projektionsbelichtungsanlage
US8451427B2 (en) * 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US20090091730A1 (en) * 2007-10-03 2009-04-09 Nikon Corporation Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
EP2179329A1 (en) * 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179330A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2010004008A (ja) * 2007-10-31 2010-01-07 Nikon Corp 光学ユニット、照明光学装置、露光装置、露光方法、およびデバイス製造方法
US9116346B2 (en) * 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
EP2209135A4 (en) * 2007-11-06 2011-06-08 Nikon Corp OPTICAL LIGHTING DEVICE AND EXPOSURE DEVICE
KR101708943B1 (ko) * 2007-11-06 2017-02-21 가부시키가이샤 니콘 제어 장치, 노광 방법 및 노광 장치
JP5326259B2 (ja) 2007-11-08 2013-10-30 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
US8040492B2 (en) * 2007-11-27 2011-10-18 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
WO2009080231A1 (en) 2007-12-21 2009-07-02 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic exposure apparatus
KR101695034B1 (ko) * 2008-05-28 2017-01-10 가부시키가이샤 니콘 공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법
EP2470939A1 (en) * 2009-08-26 2012-07-04 Carl Zeiss Laser Optics GmbH Metrology module for laser system
DE102010006326A1 (de) 2010-01-29 2011-08-04 Asml Netherlands B.V. Anordnung zur Verwendung in einer Projektionsbelichtungsanlage für die Mikrolithographie mit einem reflektiven optischen Element
DE102011085132A1 (de) * 2010-11-24 2012-05-24 Carl Zeiss Smt Gmbh Optische Baugruppe für die Projektionslithografie
US10120283B2 (en) * 2011-06-06 2018-11-06 Nikon Corporation Illumination method, illumination optical device, and exposure device
JPWO2013164997A1 (ja) * 2012-05-02 2015-12-24 株式会社ニコン 瞳輝度分布の評価方法および改善方法、照明光学系およびその調整方法、露光装置、露光方法、並びにデバイス製造方法
DE102013218991A1 (de) * 2013-09-20 2015-03-26 Carl Zeiss Smt Gmbh Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0526242B1 (en) * 1991-08-02 1995-12-27 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
US5684567A (en) * 1992-06-25 1997-11-04 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern
US6040894A (en) * 1996-10-29 2000-03-21 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0687956B2 (de) 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
EP0949541B1 (en) 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithography apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0526242B1 (en) * 1991-08-02 1995-12-27 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
US5684567A (en) * 1992-06-25 1997-11-04 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern
US6040894A (en) * 1996-10-29 2000-03-21 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
RESEARCH DISCLOSURE VOL. 407, NO.018 *

Also Published As

Publication number Publication date
KR20040048355A (ko) 2004-06-09
JP4034262B2 (ja) 2008-01-16
TW200424792A (en) 2004-11-16
KR100588117B1 (ko) 2006-06-09
US6958806B2 (en) 2005-10-25
CN1504830A (zh) 2004-06-16
US20040114123A1 (en) 2004-06-17
TWI281099B (en) 2007-05-11
JP2004289123A (ja) 2004-10-14

Similar Documents

Publication Publication Date Title
SG145535A1 (en) Lithographic apparatus and device manufacturing method
TWI266358B (en) Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
US8691124B2 (en) Alignment and imprint lithography
EP0834773A3 (en) Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
EP1670038A4 (en) OPTICAL ELEMENT AND EXPOSURE APPARATUS
WO2005031467A3 (en) Microlithographic projection exposure
GB2432666A (en) Interferometer calibration methods and apparatus
EP1014199A3 (en) Stage control apparatus and exposure apparatus
BR9610148A (pt) Sistema de metrologia de largura de banda elevada, dinamicamente rìgido, para a medição e o controle de processos de fabricação inteligentes.
TW200745772A (en) Exposure apparatus and device manufacturing method
EP1331519A3 (en) Exposure control
TW200500822A (en) Lithographic apparatus and device manufacturing method
EP1882987A3 (en) System and method to compensate for critical dimension non-uniformity in a lithography system
EP1426826A3 (en) Lithographic apparatus and device manufacturing method
HK1048790A1 (en) Method for applying coloured information on an object
TW200603075A (en) Information carrier, and system for positioning such an information carrier in an apparatus
WO2002009163A8 (fr) Procede et appareil de mesure de lumiere parasite, procede et systeme d'exposition, procede de reglage d'un systeme d'exposition
DE60002330D1 (de) Shack-hartmann wellenfrontsensor mit einem höheren als durch die linsenanordnung vorgegebenen räumlichem auflösungsvermögen
WO2003028942A1 (fr) Dispositif projetant de la lumiere et procede de projection de lumiere
ATE291787T1 (de) Laserlichtquelle mit diffraktiver optischer strahlintegration
DE60202137D1 (de) Stabilisiertes Fabry-Perot Interferometer und Verfahren zum Stabilisieren eines Fabry-Perot Interferometers
EP0886352A4 (en) LENS, SEMICONDUCTOR LASER ELEMENTS, DEVICE FOR MACHINE MACHINING OF LENS AND ELEMENT, METHOD FOR PRODUCING SEMICONDUCTOR LASER LENS, OPTICAL ELEMENT, DEVICE AND METHOD FOR MACHINING THE OPTICAL ELEMENT
EP1286220A3 (en) Exposure apparatus and exposing method
SE9804344D0 (sv) A system for microlithographic writing with improved precicion
TW200606595A (en) Exposure pattern forming method