SG139631A1 - Glass substrate for magnetic disk, its production method and magnetic disk - Google Patents

Glass substrate for magnetic disk, its production method and magnetic disk

Info

Publication number
SG139631A1
SG139631A1 SG200704286-4A SG2007042864A SG139631A1 SG 139631 A1 SG139631 A1 SG 139631A1 SG 2007042864 A SG2007042864 A SG 2007042864A SG 139631 A1 SG139631 A1 SG 139631A1
Authority
SG
Singapore
Prior art keywords
magnetic disk
glass substrate
water
production method
organic polymer
Prior art date
Application number
SG200704286-4A
Other languages
English (en)
Inventor
Hiroshi Usui
Osamu Miyahara
Katsuaki Miyatani
Yoshinori Kon
Iori Yoshida
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of SG139631A1 publication Critical patent/SG139631A1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/21—Circular sheet or circular blank

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Surface Treatment Of Glass (AREA)
  • Magnetic Record Carriers (AREA)
SG200704286-4A 2006-07-18 2007-06-12 Glass substrate for magnetic disk, its production method and magnetic disk SG139631A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006195396 2006-07-18
JP2006262514A JP4836731B2 (ja) 2006-07-18 2006-09-27 磁気ディスク用ガラス基板の製造方法

Publications (1)

Publication Number Publication Date
SG139631A1 true SG139631A1 (en) 2008-02-29

Family

ID=38972026

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200704286-4A SG139631A1 (en) 2006-07-18 2007-06-12 Glass substrate for magnetic disk, its production method and magnetic disk

Country Status (4)

Country Link
US (1) US7618723B2 (ja)
JP (1) JP4836731B2 (ja)
CN (1) CN101108467B (ja)
SG (1) SG139631A1 (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG10201501752PA (en) 2007-02-20 2015-05-28 Hoya Corp Magnetic disc substrate, magnetic disc, and magnetic disc device
JP4246791B2 (ja) * 2007-05-30 2009-04-02 東洋鋼鈑株式会社 磁気ディスク用ガラス基板の表面仕上げ方法
JP5321594B2 (ja) * 2008-10-17 2013-10-23 コニカミノルタ株式会社 ガラス基板の製造方法、および磁気記録媒体の製造方法
JP2010257562A (ja) * 2009-03-30 2010-11-11 Hoya Corp 磁気ディスク用基板及びその製造方法
US20110287698A1 (en) * 2010-05-18 2011-11-24 Hitachi Global Storage Technologies Netherlands B.V. System, method and apparatus for elastomer pad for fabricating magnetic recording disks
MY167649A (en) * 2011-09-30 2018-09-21 Hoya Corp Information Recording Medium Glass Substrate and Information Recording Medium
WO2014208762A1 (ja) * 2013-06-29 2014-12-31 Hoya株式会社 ガラス基板の製造方法及び磁気ディスクの製造方法、並びにガラス基板用研磨液組成物
US9303188B2 (en) 2014-03-11 2016-04-05 Cabot Microelectronics Corporation Composition for tungsten CMP
US9238754B2 (en) 2014-03-11 2016-01-19 Cabot Microelectronics Corporation Composition for tungsten CMP
US9303189B2 (en) 2014-03-11 2016-04-05 Cabot Microelectronics Corporation Composition for tungsten CMP
US9309442B2 (en) 2014-03-21 2016-04-12 Cabot Microelectronics Corporation Composition for tungsten buffing
US9127187B1 (en) 2014-03-24 2015-09-08 Cabot Microelectronics Corporation Mixed abrasive tungsten CMP composition
US9303190B2 (en) 2014-03-24 2016-04-05 Cabot Microelectronics Corporation Mixed abrasive tungsten CMP composition
CN107529477B (zh) * 2017-08-07 2020-02-18 清华大学 微晶玻璃化学机械抛光方法及微晶玻璃

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11181409A (ja) * 1997-12-19 1999-07-06 Kao Corp 研磨材組成物及びこれを用いた基板の製造方法
JP3998813B2 (ja) * 1998-06-15 2007-10-31 株式会社フジミインコーポレーテッド 研磨用組成物
US6595028B1 (en) * 1999-09-30 2003-07-22 Hoya Corporation Chemical reinforced glass substrate having desirable edge profile and method of manufacturing the same
US6733553B2 (en) * 2000-04-13 2004-05-11 Showa Denko Kabushiki Kaisha Abrasive composition for polishing semiconductor device and method for producing semiconductor device using the same
DE10063488A1 (de) * 2000-12-20 2002-06-27 Bayer Ag Polierslurry für das chemisch-mechanische Polieren von Siliciumdioxid-Filmen
US7887714B2 (en) * 2000-12-25 2011-02-15 Nissan Chemical Industries, Ltd. Cerium oxide sol and abrasive
US20030077982A1 (en) 2001-09-28 2003-04-24 Hoya Corporation Method of producing a glass substrate for a magnetic recording medium and method of producing a magnetic recording medium
JP3665777B2 (ja) 2001-09-28 2005-06-29 Ｈｏｙａ株式会社 磁気記録媒体用ガラス基板の製造方法、及び磁気記録媒体の製造方法
US6620215B2 (en) * 2001-12-21 2003-09-16 Dynea Canada, Ltd. Abrasive composition containing organic particles for chemical mechanical planarization
ATE455367T1 (de) 2002-07-22 2010-01-15 Seimi Chem Kk Halbleiterschleif prozess zu seiner herstellung und polierverfahren
JP4446371B2 (ja) * 2002-08-30 2010-04-07 花王株式会社 研磨液組成物
KR100663781B1 (ko) * 2003-01-31 2007-01-02 히다치 가세고교 가부시끼가이샤 Ｃμρ연마제 및 연마방법
TW200517478A (en) * 2003-05-09 2005-06-01 Sanyo Chemical Ind Ltd Polishing liquid for CMP process and polishing method
KR100611064B1 (ko) * 2004-07-15 2006-08-10 삼성전자주식회사 화학 기계적 연마 공정용 슬러리 조성물, 상기 슬러리조성물을 이용한 화학 기계적 연마 방법 및 상기 방법을이용한 게이트 패턴의 형성 방법
JP2006082138A (ja) 2004-09-14 2006-03-30 Hoya Corp 磁気ディスク用ガラス基板の製造方法及び磁気ディスク用ガラス基板、並びに、磁気ディスクの製造方法及び磁気ディスク
JP2006278522A (ja) 2005-03-28 2006-10-12 Seimi Chem Co Ltd 半導体集積回路装置用研磨剤、研磨方法および半導体集積回路装置の製造方法

Also Published As

Publication number Publication date
CN101108467A (zh) 2008-01-23
JP2008047271A (ja) 2008-02-28
JP4836731B2 (ja) 2011-12-14
CN101108467B (zh) 2011-06-08
US7618723B2 (en) 2009-11-17
US20080020679A1 (en) 2008-01-24

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