SG129279A1 - Controlling a position of a mass, especially in a lithographic apparatus - Google Patents
Controlling a position of a mass, especially in a lithographic apparatusInfo
- Publication number
- SG129279A1 SG129279A1 SG200401493A SG200401493A SG129279A1 SG 129279 A1 SG129279 A1 SG 129279A1 SG 200401493 A SG200401493 A SG 200401493A SG 200401493 A SG200401493 A SG 200401493A SG 129279 A1 SG129279 A1 SG 129279A1
- Authority
- SG
- Singapore
- Prior art keywords
- mass
- controlling
- lithographic apparatus
- control force
- controller
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B66—HOISTING; LIFTING; HAULING
- B66B—ELEVATORS; ESCALATORS OR MOVING WALKWAYS
- B66B1/00—Control systems of elevators in general
- B66B1/34—Details, e.g. call counting devices, data transmission from car to control system, devices giving information to the control system
- B66B1/46—Adaptations of switches or switchgear
- B66B1/52—Floor selectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B66—HOISTING; LIFTING; HAULING
- B66B—ELEVATORS; ESCALATORS OR MOVING WALKWAYS
- B66B1/00—Control systems of elevators in general
- B66B1/34—Details, e.g. call counting devices, data transmission from car to control system, devices giving information to the control system
- B66B1/46—Adaptations of switches or switchgear
- B66B1/468—Call registering systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B66—HOISTING; LIFTING; HAULING
- B66B—ELEVATORS; ESCALATORS OR MOVING WALKWAYS
- B66B2201/00—Aspects of control systems of elevators
- B66B2201/40—Details of the change of control mode
- B66B2201/46—Switches or switchgear
- B66B2201/4607—Call registering systems
- B66B2201/4653—Call registering systems wherein the call is registered using portable devices
Landscapes
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Computer Networks & Wireless Communication (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Control Of Position Or Direction (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03075660 | 2003-03-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG129279A1 true SG129279A1 (en) | 2007-02-26 |
Family
ID=32921593
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200401493A SG129279A1 (en) | 2003-03-06 | 2004-02-26 | Controlling a position of a mass, especially in a lithographic apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US7209219B2 (ja) |
JP (1) | JP3940403B2 (ja) |
KR (1) | KR100606494B1 (ja) |
CN (1) | CN100568102C (ja) |
SG (1) | SG129279A1 (ja) |
TW (1) | TWI270751B (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040204777A1 (en) * | 2003-04-14 | 2004-10-14 | Alon Harpaz | Precision motion control using feed forward of acceleration |
TWI243291B (en) * | 2003-05-13 | 2005-11-11 | Asml Netherlands Bv | Control system, lithographic apparatus, device manufacturing method, and device manufactured thereby |
US20040236453A1 (en) * | 2003-05-22 | 2004-11-25 | Gabor Szoboszlay | Method and apparatus for combining and generating trajectories |
US7289858B2 (en) * | 2004-05-25 | 2007-10-30 | Asml Netherlands B.V. | Lithographic motion control system and method |
US7657334B2 (en) * | 2005-09-16 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus and control method |
US7774287B2 (en) * | 2006-03-14 | 2010-08-10 | Asml Netherlands B.V. | System and method for moving a component through a setpoint profile, lithographic apparatus and device manufacturing method |
US7576832B2 (en) * | 2006-05-04 | 2009-08-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8014881B2 (en) * | 2007-02-15 | 2011-09-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP5156886B2 (ja) * | 2007-03-02 | 2013-03-06 | 富士機械製造株式会社 | 位置制御装置 |
NL1036292A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device. |
NL1036277A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Lithographic apparatus, stage system and stage control method. |
JP4922338B2 (ja) * | 2008-04-25 | 2012-04-25 | エーエスエムエル ネザーランズ ビー.ブイ. | 位置制御システム、リソグラフィ装置、および可動オブジェクトの位置を制御する方法 |
US8260440B2 (en) * | 2008-12-05 | 2012-09-04 | The Regents Of The University Of Michigan | Adaptive control based on retrospective cost optimization |
US7847924B2 (en) * | 2008-12-17 | 2010-12-07 | Lockheed Martin Corporation | Performance of an atom interferometric device through complementary filtering |
NL2006981A (en) * | 2010-07-26 | 2012-01-30 | Asml Netherlands Bv | Position control system, lithographic apparatus, and method to control a position of a movable object. |
JP5689704B2 (ja) * | 2010-08-08 | 2015-03-25 | 日本電産サンキョー株式会社 | モータ制御装置およびモータ制御方法 |
CN102087482B (zh) * | 2010-12-27 | 2012-10-03 | 中国科学院光电技术研究所 | 光刻机工件台同步运动误差校正控制系统 |
NL2008007A (en) * | 2011-01-20 | 2012-07-23 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
JP5383760B2 (ja) * | 2011-09-09 | 2014-01-08 | ファナック株式会社 | ワーク質量測定機能を備えたロボット |
EP3659491A1 (en) | 2011-12-13 | 2020-06-03 | EndoChoice Innovation Center Ltd. | Removable tip endoscope |
WO2015062791A1 (en) * | 2013-10-30 | 2015-05-07 | Asml Netherlands B.V. | Object positioning in lithography |
NL2016797A (en) * | 2015-06-19 | 2016-12-22 | Asml Netherlands Bv | Control system, positioning system, lithographic apparatus and device manufacturing method. |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2270998A (en) * | 1992-09-02 | 1994-03-30 | Fuji Electric Co Ltd | Positioning system |
US5877845A (en) * | 1996-05-28 | 1999-03-02 | Nippon Kogaku Kk | Scanning exposure apparatus and method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0276692A (ja) * | 1988-09-08 | 1990-03-16 | Fuji Electric Co Ltd | ロボットの適応制御方法 |
JPH0430205A (ja) * | 1990-05-25 | 1992-02-03 | Hitachi Ltd | ロボット制御装置 |
JPH06187045A (ja) * | 1992-09-02 | 1994-07-08 | Fuji Electric Co Ltd | 位置決め装置 |
JP3740189B2 (ja) * | 1995-07-18 | 2006-02-01 | 株式会社日立グローバルストレージテクノロジーズ | 位置決め適応制御装置並びに情報記憶装置 |
US6260282B1 (en) | 1998-03-27 | 2001-07-17 | Nikon Corporation | Stage control with reduced synchronization error and settling time |
JP3745167B2 (ja) * | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
EP1275036B1 (en) * | 2000-01-11 | 2005-10-26 | Electro Scientific Industries, Inc. | Abbe error correction system and method |
JP2002222760A (ja) * | 2001-01-29 | 2002-08-09 | Canon Inc | 露光方法及び露光装置並びにデバイスの製造方法 |
JP2004054838A (ja) * | 2002-07-24 | 2004-02-19 | Brother Ind Ltd | ワーク質量推定装置 |
-
2004
- 2004-01-23 US US10/762,569 patent/US7209219B2/en not_active Expired - Fee Related
- 2004-02-25 TW TW093104794A patent/TWI270751B/zh not_active IP Right Cessation
- 2004-02-26 SG SG200401493A patent/SG129279A1/en unknown
- 2004-03-05 CN CNB200410028619XA patent/CN100568102C/zh not_active Expired - Fee Related
- 2004-03-05 JP JP2004062666A patent/JP3940403B2/ja not_active Expired - Fee Related
- 2004-03-05 KR KR1020040014999A patent/KR100606494B1/ko not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2270998A (en) * | 1992-09-02 | 1994-03-30 | Fuji Electric Co Ltd | Positioning system |
US5877845A (en) * | 1996-05-28 | 1999-03-02 | Nippon Kogaku Kk | Scanning exposure apparatus and method |
Also Published As
Publication number | Publication date |
---|---|
CN1538242A (zh) | 2004-10-20 |
JP2004342082A (ja) | 2004-12-02 |
KR100606494B1 (ko) | 2006-08-01 |
CN100568102C (zh) | 2009-12-09 |
US7209219B2 (en) | 2007-04-24 |
JP3940403B2 (ja) | 2007-07-04 |
US20040176861A1 (en) | 2004-09-09 |
TWI270751B (en) | 2007-01-11 |
TW200424801A (en) | 2004-11-16 |
KR20040079314A (ko) | 2004-09-14 |
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