SG128573A1 - Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media - Google Patents

Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media

Info

Publication number
SG128573A1
SG128573A1 SG200603822A SG200603822A SG128573A1 SG 128573 A1 SG128573 A1 SG 128573A1 SG 200603822 A SG200603822 A SG 200603822A SG 200603822 A SG200603822 A SG 200603822A SG 128573 A1 SG128573 A1 SG 128573A1
Authority
SG
Singapore
Prior art keywords
recording media
discrete track
track recording
manufacturing
substrate
Prior art date
Application number
SG200603822A
Other languages
English (en)
Inventor
Yoshiyuki Kamata
Katsuyuki Naito
Akira Kikitsu
Masatoshi Sakurai
Masahiro Oka
Original Assignee
Toshiba Kk
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk, Showa Denko Kk filed Critical Toshiba Kk
Publication of SG128573A1 publication Critical patent/SG128573A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
SG200603822A 2005-06-28 2006-06-09 Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media SG128573A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005188387A JP4533809B2 (ja) 2005-06-28 2005-06-28 ディスクリートトラック媒体用基板の製造方法およびディスクリートトラック媒体の製造方法

Publications (1)

Publication Number Publication Date
SG128573A1 true SG128573A1 (en) 2007-01-30

Family

ID=37588483

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200603822A SG128573A1 (en) 2005-06-28 2006-06-09 Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media

Country Status (4)

Country Link
US (1) US7314833B2 (ja)
JP (1) JP4533809B2 (ja)
CN (1) CN100412697C (ja)
SG (1) SG128573A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5242109B2 (ja) * 2007-09-28 2013-07-24 エイチジーエスティーネザーランドビーブイ 垂直磁気記録媒体及びその製造方法、並びに磁気記録装置
JP2011507131A (ja) 2007-12-06 2011-03-03 インテバック・インコーポレイテッド パターン化媒体を商業的に製造するシステム及び方法
US8795763B2 (en) * 2007-12-26 2014-08-05 Headway Technologies, Inc. Perpendicular magnetic medium with shields between tracks
KR100918850B1 (ko) * 2008-01-25 2009-09-28 고려대학교 산학협력단 나노 임프린트 리소그래피와 리프트 오프 공정을 이용한나노 패턴 형성 방법
JP5238290B2 (ja) 2008-02-28 2013-07-17 昭和電工株式会社 磁気記録媒体の製造方法
JP2009245535A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 磁気記録媒体及びその製造方法
US8358481B2 (en) * 2008-04-02 2013-01-22 Headway Technologies, Inc. Nano-lithography with rotating target and servo-positioned tip
TW201022017A (en) * 2008-09-30 2010-06-16 Molecular Imprints Inc Particle mitigation for imprint lithography
US20100300884A1 (en) * 2009-05-26 2010-12-02 Wd Media, Inc. Electro-deposited passivation coatings for patterned media
US20200198090A1 (en) * 2018-12-13 2020-06-25 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Cmp apparatus and method of performing ceria-based cmp process

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3254762B2 (ja) 1992-10-29 2002-02-12 松下電器産業株式会社 ブラスト処理法とブラスト処理装置
JP2737709B2 (ja) * 1995-07-28 1998-04-08 日本電気株式会社 半導体装置の製造方法およびその装置
US5853962A (en) * 1996-10-04 1998-12-29 Eco-Snow Systems, Inc. Photoresist and redeposition removal using carbon dioxide jet spray
US5908510A (en) * 1996-10-16 1999-06-01 International Business Machines Corporation Residue removal by supercritical fluids
US6343609B1 (en) * 1998-08-13 2002-02-05 International Business Machines Corporation Cleaning with liquified gas and megasonics
JP2001110050A (ja) * 1999-10-05 2001-04-20 Japan Science & Technology Corp 高密度磁気記録媒体パターンドメディアとその製造方法
JP3715152B2 (ja) * 1999-10-22 2005-11-09 松下電器産業株式会社 マスター情報担体の製造方法
JP4210045B2 (ja) * 2001-06-25 2009-01-14 横河電機株式会社 洗浄装置
US6936181B2 (en) * 2001-10-11 2005-08-30 Kovio, Inc. Methods for patterning using liquid embossing
US20040029494A1 (en) 2002-08-09 2004-02-12 Souvik Banerjee Post-CMP cleaning of semiconductor wafer surfaces using a combination of aqueous and CO2 based cryogenic cleaning techniques
US20040209123A1 (en) * 2003-04-17 2004-10-21 Bajorek Christopher H. Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off
JP4799807B2 (ja) 2003-05-23 2011-10-26 アクアサイエンス株式会社 対象物処理装置及び対象物処理方法
JP2004356244A (ja) 2003-05-28 2004-12-16 Hitachi Industries Co Ltd 平坦化方法及び装置
JP4068544B2 (ja) * 2003-10-20 2008-03-26 株式会社東芝 ナノインプリント方法
US7378028B2 (en) * 2004-06-03 2008-05-27 Seagate Technology Llc Method for fabricating patterned magnetic recording media
JP4528677B2 (ja) * 2005-06-24 2010-08-18 株式会社東芝 パターンド媒体の製造方法及び製造装置

Also Published As

Publication number Publication date
JP4533809B2 (ja) 2010-09-01
CN100412697C (zh) 2008-08-20
US7314833B2 (en) 2008-01-01
US20070001331A1 (en) 2007-01-04
CN1892834A (zh) 2007-01-10
JP2007012118A (ja) 2007-01-18

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