SG123769A1 - A method for measuring information about a substrate, and a substrate for use in a lithographic apparatus - Google Patents
A method for measuring information about a substrate, and a substrate for use in a lithographic apparatusInfo
- Publication number
- SG123769A1 SG123769A1 SG200508373A SG200508373A SG123769A1 SG 123769 A1 SG123769 A1 SG 123769A1 SG 200508373 A SG200508373 A SG 200508373A SG 200508373 A SG200508373 A SG 200508373A SG 123769 A1 SG123769 A1 SG 123769A1
- Authority
- SG
- Singapore
- Prior art keywords
- substrate
- lithographic apparatus
- measuring information
- measuring
- information
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US63984704P | 2004-12-29 | 2004-12-29 | |
US11/135,630 US7355675B2 (en) | 2004-12-29 | 2005-05-24 | Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
SG123769A1 true SG123769A1 (en) | 2006-07-26 |
Family
ID=36090762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200508373A SG123769A1 (en) | 2004-12-29 | 2005-12-23 | A method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
Country Status (7)
Country | Link |
---|---|
US (1) | US7355675B2 (ja) |
EP (1) | EP1677158A3 (ja) |
JP (1) | JP4308202B2 (ja) |
KR (1) | KR100724050B1 (ja) |
CN (1) | CN1804726B (ja) |
SG (1) | SG123769A1 (ja) |
TW (1) | TWI323389B (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7432605B2 (en) * | 2006-09-21 | 2008-10-07 | Macronix International Co., Ltd. | Overlay mark, method for forming the same and application thereof |
US7875987B2 (en) | 2007-09-26 | 2011-01-25 | International Business Machines Corporation | Method and apparatus for measurement and control of photomask to substrate alignment |
US20090208865A1 (en) * | 2008-02-19 | 2009-08-20 | International Business Machines Corporation | Photolithography focus improvement by reduction of autofocus radiation transmission into substrate |
WO2010025793A1 (en) * | 2008-09-08 | 2010-03-11 | Asml Netherlands B.V. | A substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus |
US8084185B2 (en) * | 2009-01-08 | 2011-12-27 | International Business Machines Corporation | Substrate planarization with imprint materials and processes |
US8929630B2 (en) * | 2009-03-27 | 2015-01-06 | Life Technologies Corporation | Systems and methods for assessing images |
US8772376B2 (en) * | 2009-08-18 | 2014-07-08 | International Business Machines Corporation | Near-infrared absorbing film compositions |
CN102967996A (zh) * | 2012-11-02 | 2013-03-13 | 上海华力微电子有限公司 | 一种改善光刻机对准精度的方法 |
KR102058515B1 (ko) * | 2013-04-18 | 2019-12-24 | 삼성디스플레이 주식회사 | 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치 |
CN105080855B (zh) * | 2015-06-03 | 2017-08-25 | 合肥京东方光电科技有限公司 | 基板标记检测装置和基板标记检测方法 |
US10216096B2 (en) * | 2015-08-14 | 2019-02-26 | Kla-Tencor Corporation | Process-sensitive metrology systems and methods |
CN106647174B (zh) * | 2015-10-30 | 2018-08-14 | 上海微电子装备(集团)股份有限公司 | 一种调焦调平装置及调焦调平方法 |
NL2018564A (en) | 2016-03-30 | 2017-10-05 | Asml Netherlands Bv | Substrate edge detection |
CN109360333A (zh) * | 2018-10-24 | 2019-02-19 | 深圳市航天电机系统有限公司 | 基于自动售货机的驱动响应结构及工作方法 |
Family Cites Families (33)
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---|---|---|---|---|
NL186353C (nl) | 1979-06-12 | 1990-11-01 | Philips Nv | Inrichting voor het afbeelden van een maskerpatroon op een substraat voorzien van een opto-elektronisch detektiestelsel voor het bepalen van een afwijking tussen het beeldvlak van een projektielenzenstelsel en het substraatvlak. |
JPS59220604A (ja) | 1983-05-30 | 1984-12-12 | Hitachi Ltd | 微小間隙をおいて相対する2物体間の位置検出方法 |
JPS61248427A (ja) | 1985-04-25 | 1986-11-05 | Nec Corp | 多層配線の形成方法 |
NL8600639A (nl) | 1986-03-12 | 1987-10-01 | Asm Lithography Bv | Werkwijze voor het ten opzichte van elkaar uitrichten van een masker en een substraat en inrichting voor het uitvoeren van de werkwijze. |
JPH0236523A (ja) | 1988-07-27 | 1990-02-06 | Oki Electric Ind Co Ltd | ウエハアライメントマーク及びその形成方法 |
JPH02229419A (ja) | 1989-03-02 | 1990-09-12 | Fujitsu Ltd | 半導体装置の製造方法 |
NL9000503A (nl) | 1990-03-05 | 1991-10-01 | Asm Lithography Bv | Apparaat en werkwijze voor het afbeelden van een maskerpatroon op een substraat. |
JPH05198471A (ja) | 1992-01-22 | 1993-08-06 | Canon Inc | 基板の位置合わせ方法およびこれに用いる反射マーク付基板 |
US5601957A (en) * | 1994-06-16 | 1997-02-11 | Nikon Corporation | Micro devices manufacturing method comprising the use of a second pattern overlying an alignment mark to reduce flattening |
JP3239976B2 (ja) * | 1994-09-30 | 2001-12-17 | 株式会社東芝 | アライメントマーク、半導体装置の製造方法および半導体装置 |
JP3387075B2 (ja) * | 1994-12-12 | 2003-03-17 | 株式会社ニコン | 走査露光方法、露光装置、及び走査型露光装置 |
US5982764A (en) * | 1995-05-18 | 1999-11-09 | Aura Communications, Inc. | Time-multiplexed short-range magnetic communications |
US5960107A (en) * | 1995-12-28 | 1999-09-28 | Vlsi Technology, Inc. | Method for verifying an average topography height function of a photostepper |
DE69717975T2 (de) | 1996-12-24 | 2003-05-28 | Asml Netherlands Bv | In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät |
JP2947196B2 (ja) | 1997-01-23 | 1999-09-13 | 日本電気株式会社 | 半導体基板および半導体装置の製造方法 |
WO1998039689A1 (en) | 1997-03-07 | 1998-09-11 | Asm Lithography B.V. | Lithographic projection apparatus with off-axis alignment unit |
US6262796B1 (en) | 1997-03-10 | 2001-07-17 | Asm Lithography B.V. | Positioning device having two object holders |
US5966613A (en) | 1997-09-08 | 1999-10-12 | Lsi Corporation | Consistent alignment mark profiles on semiconductor wafers using metal organic chemical vapor deposition titanium nitride protective |
US5985764A (en) | 1997-12-22 | 1999-11-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Layer independent alignment system |
US6452284B1 (en) * | 2000-06-22 | 2002-09-17 | Motorola, Inc. | Semiconductor device substrate and a process for altering a semiconductor device |
TW497013B (en) | 2000-09-07 | 2002-08-01 | Asm Lithography Bv | Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
US6635564B1 (en) * | 2000-09-14 | 2003-10-21 | Infineon Technologies Ag | Semiconductor structure and method of fabrication including forming aluminum columns |
KR100487426B1 (ko) * | 2001-07-11 | 2005-05-04 | 엘지.필립스 엘시디 주식회사 | 폴리실리콘 결정화방법 그리고, 이를 이용한 폴리실리콘박막트랜지스터의 제조방법 및 액정표시소자의 제조방법 |
US20030096496A1 (en) * | 2001-11-20 | 2003-05-22 | I-Hsiung Huang | Method of forming dual damascene structure |
US6815838B2 (en) * | 2002-02-20 | 2004-11-09 | International Business Machines Corporation | Laser alignment target and method |
TWI265550B (en) | 2002-05-14 | 2006-11-01 | Toshiba Corp | Fabrication method, manufacturing method for semiconductor device, and fabrication device |
JP4201541B2 (ja) * | 2002-07-19 | 2008-12-24 | 豊田合成株式会社 | 半導体結晶の製造方法及びiii族窒化物系化合物半導体発光素子の製造方法 |
US20040075179A1 (en) | 2002-10-22 | 2004-04-22 | United Microelectronics Corp | Structural design of alignment mark |
US6774452B1 (en) * | 2002-12-17 | 2004-08-10 | Cypress Semiconductor Corporation | Semiconductor structure having alignment marks with shallow trench isolation |
DE10259322B4 (de) | 2002-12-18 | 2005-12-29 | Infineon Technologies Ag | Verfahren zum Bilden einer Justiermarke in einer lichtundurchlässigen Schicht auf einem Substrat |
SG121843A1 (en) * | 2002-12-19 | 2006-05-26 | Asml Netherlands Bv | Device manufacturing method, device manufactured thereby, computer program and lithographic apparatus |
KR100495920B1 (ko) * | 2003-06-25 | 2005-06-17 | 주식회사 하이닉스반도체 | 반도체 장치의 웨이퍼 정렬용 정렬 마크 |
WO2006009873A1 (en) * | 2004-06-21 | 2006-01-26 | Ferro Corporation | Methods of forming and detecting non-visible marks and articles marked in accordance with the methods |
-
2005
- 2005-05-24 US US11/135,630 patent/US7355675B2/en not_active Expired - Fee Related
- 2005-12-22 EP EP05258013A patent/EP1677158A3/en not_active Withdrawn
- 2005-12-23 SG SG200508373A patent/SG123769A1/en unknown
- 2005-12-23 TW TW094146398A patent/TWI323389B/zh not_active IP Right Cessation
- 2005-12-27 CN CN2005101191488A patent/CN1804726B/zh not_active Expired - Fee Related
- 2005-12-27 KR KR1020050130907A patent/KR100724050B1/ko not_active IP Right Cessation
- 2005-12-28 JP JP2005376941A patent/JP4308202B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW200632583A (en) | 2006-09-16 |
KR20060093010A (ko) | 2006-08-23 |
KR100724050B1 (ko) | 2007-06-04 |
JP4308202B2 (ja) | 2009-08-05 |
US20060138410A1 (en) | 2006-06-29 |
US7355675B2 (en) | 2008-04-08 |
JP2006191080A (ja) | 2006-07-20 |
EP1677158A3 (en) | 2006-07-26 |
CN1804726A (zh) | 2006-07-19 |
CN1804726B (zh) | 2011-04-13 |
EP1677158A2 (en) | 2006-07-05 |
TWI323389B (en) | 2010-04-11 |
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