SG121840A1 - A method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby - Google Patents

A method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby

Info

Publication number
SG121840A1
SG121840A1 SG200307226A SG200307226A SG121840A1 SG 121840 A1 SG121840 A1 SG 121840A1 SG 200307226 A SG200307226 A SG 200307226A SG 200307226 A SG200307226 A SG 200307226A SG 121840 A1 SG121840 A1 SG 121840A1
Authority
SG
Singapore
Prior art keywords
manufacturing
lithographic projection
computer program
determining parameters
computer system
Prior art date
Application number
SG200307226A
Other languages
English (en)
Inventor
Markus Franciscus Ant Eurlings
Armand Eugene Albert Koolen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG121840A1 publication Critical patent/SG121840A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70125—Use of illumination settings tailored to particular mask patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
SG200307226A 2002-12-09 2003-12-08 A method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby SG121840A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02258468 2002-12-09

Publications (1)

Publication Number Publication Date
SG121840A1 true SG121840A1 (en) 2006-05-26

Family

ID=32695572

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200307226A SG121840A1 (en) 2002-12-09 2003-12-08 A method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby

Country Status (7)

Country Link
US (1) US7026082B2 (ko)
JP (1) JP4056462B2 (ko)
KR (1) KR100606491B1 (ko)
CN (1) CN100487573C (ko)
DE (1) DE60324884D1 (ko)
SG (1) SG121840A1 (ko)
TW (1) TWI257524B (ko)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4528580B2 (ja) * 2004-08-24 2010-08-18 株式会社東芝 照明光源の設計方法、マスクパターン設計方法、フォトマスクの製造方法、半導体装置の製造方法、及びプログラム
US7246343B2 (en) * 2004-09-01 2007-07-17 Invarium, Inc. Method for correcting position-dependent distortions in patterning of integrated circuits
US7372540B2 (en) * 2004-10-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7908572B2 (en) * 2004-10-15 2011-03-15 Takumi Technology Corporation Creating and applying variable bias rules in rule-based optical proximity correction for reduced complexity
US7173688B2 (en) * 2004-12-28 2007-02-06 Asml Holding N.V. Method for calculating an intensity integral for use in lithography systems
JP2008530788A (ja) * 2005-02-12 2008-08-07 カール・ツアイス・エスエムテイ・アーゲー マイクロリソグラフィ投影露光装置
US7642019B2 (en) * 2005-04-15 2010-01-05 Samsung Electronics Co., Ltd. Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions therefore
KR100655428B1 (ko) 2005-10-24 2006-12-08 삼성전자주식회사 광근접효과보정 시스템 및 방법
US8576377B2 (en) * 2006-12-28 2013-11-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080158529A1 (en) * 2006-12-28 2008-07-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080180696A1 (en) * 2007-01-30 2008-07-31 Sony Corporation Process window for EUV lithography
US8191018B1 (en) * 2007-07-17 2012-05-29 Kovio, Inc. Methods and software for printing materials onto a substrate
TWI424516B (zh) * 2007-10-10 2014-01-21 Asml Netherlands Bv 放置基板之方法、傳送基板之方法、支撐系統及微影投影裝置
US8151223B2 (en) * 2008-07-14 2012-04-03 Mentor Graphics Corporation Source mask optimization for microcircuit design
JP5607308B2 (ja) * 2009-01-09 2014-10-15 キヤノン株式会社 原版データ生成プログラムおよび方法
CN101788760B (zh) * 2009-01-23 2012-07-11 中芯国际集成电路制造(上海)有限公司 光学邻近校正规则的优化方法
US8479125B2 (en) * 2009-03-31 2013-07-02 Christophe Pierrat Lithography modeling and applications
US8446565B2 (en) * 2010-01-11 2013-05-21 Macronix International Co., Ltd. Methods of optical proximity correction in manufacturing semiconductor devices
CN102385242A (zh) * 2010-09-01 2012-03-21 无锡华润上华半导体有限公司 掩膜版制作方法及系统
KR102009536B1 (ko) * 2011-09-13 2019-08-09 꼼미사리아 아 레네르지 아토미끄 에뜨 옥스 에너지스 앨터네이티브즈 확률론적 방법에 의해 노광될 패턴에 대하여 디콘볼루션을 사용하여 전자 근접 효과를 보정 하기 위한 방법
US8612904B1 (en) * 2012-11-21 2013-12-17 Global Foundries Inc. Use of polarization and composite illumination source for advanced optical lithography
CN107077077B (zh) 2014-09-22 2019-03-12 Asml荷兰有限公司 过程窗口识别符
JP6447163B2 (ja) * 2015-01-21 2019-01-09 株式会社ニューフレアテクノロジー エネルギービーム描画装置の描画データ作成方法
WO2016142169A1 (en) * 2015-03-06 2016-09-15 Asml Netherlands B.V. Focus-dose co-optimization based on overlapping process window
CN107179625B (zh) * 2017-06-29 2020-06-23 惠科股份有限公司 一种显示面板的间隔单元、光罩及显示面板的制造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5465220A (en) 1992-06-02 1995-11-07 Fujitsu Limited Optical exposure method
US6320648B1 (en) 1998-10-12 2001-11-20 Steven R. J. Brueck Method and apparatus for improving pattern fidelity in diffraction-limited imaging
TWI285295B (en) * 2001-02-23 2007-08-11 Asml Netherlands Bv Illumination optimization in lithography
US6519760B2 (en) * 2001-02-28 2003-02-11 Asml Masktools, B.V. Method and apparatus for minimizing optical proximity effects

Also Published As

Publication number Publication date
US7026082B2 (en) 2006-04-11
TW200424793A (en) 2004-11-16
JP4056462B2 (ja) 2008-03-05
DE60324884D1 (de) 2009-01-08
TWI257524B (en) 2006-07-01
US20040137343A1 (en) 2004-07-15
KR100606491B1 (ko) 2006-07-31
CN100487573C (zh) 2009-05-13
CN1506767A (zh) 2004-06-23
KR20040050859A (ko) 2004-06-17
JP2004191981A (ja) 2004-07-08

Similar Documents

Publication Publication Date Title
SG121840A1 (en) A method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby
AU2003236576A1 (en) Method, system, and program for determining a modification of a system resource configuration
SG106687A1 (en) Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program
AU2003211559A1 (en) Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method
SG106683A1 (en) Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method
SG111227A1 (en) Method, system, and program for processing a file request
AU2003272058A8 (en) A method, a language and a system for the definition and implementation of software solutions
SG121847A1 (en) Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
EP1538543A4 (en) LICENSE MANAGEMENT DEVICE, CORRESPONDING METHOD, AND COMPUTER PROGRAM
SG121843A1 (en) Device manufacturing method, device manufactured thereby, computer program and lithographic apparatus
AU2003246954A8 (en) Method, system, and program for providing a mirror copy of data
AU2003216355A1 (en) A method and system for monitoring and profiling an integrated circuit die temperature
GB2397631B (en) A method for determining a brake state
EP1508856A4 (en) PROCESSOR SYSTEM, TASK CONTROL PROCEDURE IN A COMPUTER SYSTEM, COMPUTER PROGRAM
AU2003301613A8 (en) Method and apparatus for a projection system
SG125108A1 (en) Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus
SG103389A1 (en) System and method for automated focus measuring of a lithography tool
SG107660A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG123589A1 (en) A lithographic projection mask, a device manufacturing method using a lithographic projection mask and a device manufactured thereby
SG110038A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
AU2003271263A1 (en) A method and a device for controlling a vehicle and a computer program for performing the method
SG111171A1 (en) Lithographic projection apparatus and device manufacturing method
SG115590A1 (en) Lithographic projection apparatus and device manufacturing method
SG115670A1 (en) Lithographic apparatus, device manufacturing method, and computer program
SG120903A1 (en) Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program