SG118268A1 - Laser produced plasma radiation system with foil trap - Google Patents

Laser produced plasma radiation system with foil trap

Info

Publication number
SG118268A1
SG118268A1 SG200403781A SG200403781A SG118268A1 SG 118268 A1 SG118268 A1 SG 118268A1 SG 200403781 A SG200403781 A SG 200403781A SG 200403781 A SG200403781 A SG 200403781A SG 118268 A1 SG118268 A1 SG 118268A1
Authority
SG
Singapore
Prior art keywords
radiation system
produced plasma
laser produced
plasma radiation
foil trap
Prior art date
Application number
SG200403781A
Other languages
English (en)
Inventor
Pieter Bakker Levinus
Yevgenyevich Banine Vadim
Ralph Schuurmans Kurt
Pieter Frank Jeroen
Victorovitch Sidelnikov Yurii
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG118268A1 publication Critical patent/SG118268A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device

Landscapes

  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Plasma Technology (AREA)
  • X-Ray Techniques (AREA)
SG200403781A 2003-06-27 2004-06-23 Laser produced plasma radiation system with foil trap SG118268A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077012 2003-06-27

Publications (1)

Publication Number Publication Date
SG118268A1 true SG118268A1 (en) 2006-01-27

Family

ID=34178524

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200403781A SG118268A1 (en) 2003-06-27 2004-06-23 Laser produced plasma radiation system with foil trap

Country Status (6)

Country Link
US (1) US7034308B2 (ja)
JP (3) JP2005020006A (ja)
KR (1) KR100670399B1 (ja)
CN (1) CN100504605C (ja)
SG (1) SG118268A1 (ja)
TW (1) TWI237733B (ja)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
SG118268A1 (en) * 2003-06-27 2006-01-27 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
SG123770A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
SG123767A1 (en) 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
JP4366358B2 (ja) 2004-12-29 2009-11-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、照明システム、フィルタ・システム、およびそのようなフィルタ・システムのサポートを冷却するための方法
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102005020521B4 (de) * 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas
US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
JP4429302B2 (ja) * 2005-09-23 2010-03-10 エーエスエムエル ネザーランズ ビー．ブイ． 電磁放射線源、リソグラフィ装置、デバイス製造方法、および該製造方法によって製造されたデバイス
US20070115443A1 (en) * 2005-11-23 2007-05-24 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7332731B2 (en) * 2005-12-06 2008-02-19 Asml Netherlands, B.V. Radiation system and lithographic apparatus
US7468521B2 (en) * 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
JP4850558B2 (ja) * 2006-03-31 2012-01-11 キヤノン株式会社 光源装置、及びそれを用いた露光装置、デバイス製造方法
US7442948B2 (en) * 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap
US7737418B2 (en) * 2006-12-27 2010-06-15 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
US7839482B2 (en) * 2007-05-21 2010-11-23 Asml Netherlands B.V. Assembly comprising a radiation source, a reflector and a contaminant barrier
NL1036768A1 (nl) * 2008-04-29 2009-10-30 Asml Netherlands Bv Radiation source.
DE102008031650B4 (de) 2008-07-04 2010-04-29 Xtreme Technologies Gmbh Anordnung zur Debrisunterdrückung in einer plasmabasierten Strahlungsquelle zur Erzeugung kurzwelliger Strahlung
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
CN103108480B (zh) * 2012-11-22 2015-09-23 中国科学院微电子研究所 一种euv光源污染物收集装置
JP6326126B2 (ja) 2013-03-27 2018-05-16 エーエスエムエル ネザーランズ ビー．ブイ． 放射コレクタ、放射源及びリソグラフィ装置
JP6107694B2 (ja) * 2014-02-06 2017-04-05 ウシオ電機株式会社 ホイルトラップ用櫛状中間リング
US9609731B2 (en) 2014-07-07 2017-03-28 Media Lario Srl Systems and methods for synchronous operation of debris-mitigation devices
NL2021345A (en) * 2018-04-12 2018-08-22 Asml Netherlands Bv Lithographic apparatus
KR102576703B1 (ko) 2018-05-17 2023-09-08 삼성전자주식회사 파편 차단 조립체를 구비한 광 발생 장치 및 포토리소그래피 장치와 이를 이용하는 집적회로 소자의 제조 방법

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH597866A5 (ja) * 1975-11-25 1978-04-14 Castella Pierre De
US4837794A (en) * 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
FR2653234A1 (fr) * 1989-10-13 1991-04-19 Philips Electronique Lab Dispositif du type miroir dans le domaine des rayons x-uv.
US4980563A (en) * 1990-01-09 1990-12-25 United States Department Of Energy VUV lithography
JP3448670B2 (ja) * 1993-09-02 2003-09-22 株式会社ニコン 露光装置及び素子製造方法
JP2552433B2 (ja) * 1994-06-30 1996-11-13 関西電力株式会社 レーザープラズマｘ線源のデブリス除去方法及び装置
JPH09237695A (ja) * 1996-02-29 1997-09-09 Nikon Corp Ｘ線発生装置
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6566668B2 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP3602717B2 (ja) * 1998-03-11 2004-12-15 エヌ・ティ・ティ・アドバンステクノロジ株式会社 多層膜ｘ線反射鏡
US6072852A (en) * 1998-06-09 2000-06-06 The Regents Of The University Of California High numerical aperture projection system for extreme ultraviolet projection lithography
TWI243287B (en) * 1999-03-12 2005-11-11 Asml Netherlands Bv Lithographic projection apparatus and device manufacturing method using the same
US6426506B1 (en) * 1999-05-27 2002-07-30 The Regents Of The University Of California Compact multi-bounce projection system for extreme ultraviolet projection lithography
JP4329177B2 (ja) * 1999-08-18 2009-09-09 株式会社ニコン Ｘ線発生装置及びこれを備えた投影露光装置及び露光方法
JP3454758B2 (ja) 1999-08-30 2003-10-06 正樹 山本 軟ｘ線利用装置のデブリ除去機構
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP3947374B2 (ja) * 2000-08-25 2007-07-18 エーエスエムエル ネザーランズ ビー．ブイ． 平板投影装置および素子製造方法
EP1182510B1 (en) 2000-08-25 2006-04-12 ASML Netherlands B.V. Lithographic projection apparatus
US20020171922A1 (en) * 2000-10-20 2002-11-21 Nikon Corporation Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same
IT1316249B1 (it) 2000-12-01 2003-04-03 Enea Ente Nuove Tec Procedimento di abbattimento del flusso di ioni e di piccoli detritiin sorgenti di raggi-x molli da plasma, tramite l'uso di kripton.
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
US20020090054A1 (en) * 2001-01-10 2002-07-11 Michael Sogard Apparatus and method for containing debris from laser plasma radiation sources
EP1223468B1 (en) 2001-01-10 2008-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
JP2003022950A (ja) * 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
JP3790814B2 (ja) 2001-10-25 2006-06-28 独立行政法人産業技術総合研究所 Ｘ線照射装置における飛散物除去方法及び装置
JP2003142296A (ja) * 2001-11-05 2003-05-16 Canon Inc Ｘ線発生装置
CN1495528B (zh) * 2002-08-15 2011-10-12 Asml荷兰有限公司 光刻投射装置及用于所述装置中的反射器组件
US6838684B2 (en) * 2002-08-23 2005-01-04 Asml Netherlands B.V. Lithographic projection apparatus and particle barrier for use therein
SG129259A1 (en) * 2002-10-03 2007-02-26 Asml Netherlands Bv Radiation source lithographic apparatus, and device manufacturing method
TWI241465B (en) * 2002-11-22 2005-10-11 Asml Netherlands Bv Lithographic projection apparatus with multiple suppression meshes
CN100476585C (zh) * 2002-12-23 2009-04-08 Asml荷兰有限公司 具有可扩展薄片的杂质屏蔽
TWI255394B (en) * 2002-12-23 2006-05-21 Asml Netherlands Bv Lithographic apparatus with debris suppression means and device manufacturing method
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
JP4340851B2 (ja) * 2003-04-09 2009-10-07 株式会社ニコン 光源ユニット、照明光学装置、露光装置および露光方法
JP4189658B2 (ja) * 2003-05-15 2008-12-03 ウシオ電機株式会社 極端紫外光発生装置
SG118268A1 (en) * 2003-06-27 2006-01-27 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
EP1526550A1 (en) * 2003-10-20 2005-04-27 ASML Netherlands B.V. Mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method
JP4222996B2 (ja) * 2003-11-11 2009-02-12 エーエスエムエル ネザーランズ ビー．ブイ． 汚染を抑制したリソグラフィ装置、デバイス製造方法、及びこれらによって製造されたデバイス

Also Published As

Publication number Publication date
CN100504605C (zh) 2009-06-24
KR20050001428A (ko) 2005-01-06
JP2008118157A (ja) 2008-05-22
JP4950085B2 (ja) 2012-06-13
KR100670399B1 (ko) 2007-01-16
TW200504453A (en) 2005-02-01
JP2005020006A (ja) 2005-01-20
TWI237733B (en) 2005-08-11
JP2008118158A (ja) 2008-05-22
US7034308B2 (en) 2006-04-25
JP4950086B2 (ja) 2012-06-13
US20050077483A1 (en) 2005-04-14
CN1577097A (zh) 2005-02-09

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