SG114756A1 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG114756A1 SG114756A1 SG200501102A SG200501102A SG114756A1 SG 114756 A1 SG114756 A1 SG 114756A1 SG 200501102 A SG200501102 A SG 200501102A SG 200501102 A SG200501102 A SG 200501102A SG 114756 A1 SG114756 A1 SG 114756A1
- Authority
- SG
- Singapore
- Prior art keywords
- device manufacturing
- lithographic apparatus
- lithographic
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03F—SEWERS; CESSPOOLS
- E03F1/00—Methods, systems, or installations for draining-off sewage or storm water
- E03F1/002—Methods, systems, or installations for draining-off sewage or storm water with disposal into the ground, e.g. via dry wells
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03F—SEWERS; CESSPOOLS
- E03F3/00—Sewer pipe-line systems
- E03F3/04—Pipes or fittings specially adapted to sewers
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03F—SEWERS; CESSPOOLS
- E03F5/00—Sewerage structures
- E03F5/14—Devices for separating liquid or solid substances from sewage, e.g. sand or sludge traps, rakes or grates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Hydrology & Water Resources (AREA)
- Public Health (AREA)
- Water Supply & Treatment (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/788,256 US7016014B2 (en) | 2004-02-27 | 2004-02-27 | Lithographic apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG114756A1 true SG114756A1 (en) | 2005-09-28 |
Family
ID=34750527
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200501102A SG114756A1 (en) | 2004-02-27 | 2005-02-24 | Lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US7016014B2 (zh) |
EP (1) | EP1569034A1 (zh) |
JP (1) | JP4499582B2 (zh) |
KR (1) | KR100598636B1 (zh) |
CN (1) | CN100498535C (zh) |
SG (1) | SG114756A1 (zh) |
TW (1) | TWI278003B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005074895A1 (en) * | 2004-02-04 | 2005-08-18 | Alembic Limited | Extended release coated microtablets of venlafaxine hydrochloride |
US7145640B2 (en) * | 2004-03-22 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and variable attenuator |
JP2006119601A (ja) * | 2004-09-24 | 2006-05-11 | Canon Inc | 光変調素子及びそれを利用した光学装置 |
JP5722136B2 (ja) * | 2011-06-30 | 2015-05-20 | 株式会社Screenホールディングス | パターン描画装置およびパターン描画方法 |
DE102011082065A1 (de) * | 2011-09-02 | 2012-09-27 | Carl Zeiss Smt Gmbh | Spiegel-Array |
WO2013108560A1 (ja) * | 2012-01-18 | 2013-07-25 | 株式会社ニコン | 空間光変調器の駆動方法、露光用パターンの生成方法、並びに露光方法及び装置 |
KR20220065875A (ko) | 2019-10-29 | 2022-05-20 | 에이에스엠엘 홀딩 엔.브이. | 가변 회절 격자 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4477056A (en) | 1983-02-28 | 1984-10-16 | Martin Marietta Corporation | High force-gain valve |
US5523193A (en) * | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
US6219015B1 (en) * | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
US5311360A (en) * | 1992-04-28 | 1994-05-10 | The Board Of Trustees Of The Leland Stanford, Junior University | Method and apparatus for modulating a light beam |
JP3224041B2 (ja) * | 1992-07-29 | 2001-10-29 | 株式会社ニコン | 露光方法及び装置 |
US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
JP3339149B2 (ja) * | 1993-12-08 | 2002-10-28 | 株式会社ニコン | 走査型露光装置ならびに露光方法 |
US5539567A (en) * | 1994-06-16 | 1996-07-23 | Texas Instruments Incorporated | Photolithographic technique and illuminator using real-time addressable phase shift light shift |
US5677703A (en) * | 1995-01-06 | 1997-10-14 | Texas Instruments Incorporated | Data loading circuit for digital micro-mirror device |
US5530482A (en) * | 1995-03-21 | 1996-06-25 | Texas Instruments Incorporated | Pixel data processing for spatial light modulator having staggered pixels |
US5841579A (en) * | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
EP0991959B1 (en) * | 1996-02-28 | 2004-06-23 | Kenneth C. Johnson | Microlens scanner for microlithography and wide-field confocal microscopy |
US6177980B1 (en) * | 1997-02-20 | 2001-01-23 | Kenneth C. Johnson | High-throughput, maskless lithography system |
US5982553A (en) * | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
SE9800665D0 (sv) * | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
US6271957B1 (en) * | 1998-05-29 | 2001-08-07 | Affymetrix, Inc. | Methods involving direct write optical lithography |
JP2001004932A (ja) * | 1999-06-21 | 2001-01-12 | Seiko Epson Corp | 光変調デバイス及び表示装置 |
JP3800287B2 (ja) * | 1999-08-05 | 2006-07-26 | セイコーエプソン株式会社 | 光変調デバイス及びその製造方法並びに表示装置 |
JP3800288B2 (ja) * | 1999-08-05 | 2006-07-26 | セイコーエプソン株式会社 | 光変調デバイス及び表示装置 |
KR100827874B1 (ko) * | 2000-05-22 | 2008-05-07 | 가부시키가이샤 니콘 | 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법 |
US6433917B1 (en) * | 2000-11-22 | 2002-08-13 | Ball Semiconductor, Inc. | Light modulation device and system |
US7177081B2 (en) | 2001-03-08 | 2007-02-13 | Silicon Light Machines Corporation | High contrast grating light valve type device |
JP3563384B2 (ja) * | 2001-11-08 | 2004-09-08 | 大日本スクリーン製造株式会社 | 画像記録装置 |
WO2003060597A2 (en) * | 2001-12-21 | 2003-07-24 | Polychromix Corporation | Method and apparatus providing reduced polarization-dependent loss |
JP2004004601A (ja) * | 2002-04-04 | 2004-01-08 | Sony Corp | 光スイッチング素子、光スイッチング素子アレイ、及び画像表示装置 |
US6707534B2 (en) * | 2002-05-10 | 2004-03-16 | Anvik Corporation | Maskless conformable lithography |
JP4338434B2 (ja) * | 2002-06-07 | 2009-10-07 | 富士フイルム株式会社 | 透過型2次元光変調素子及びそれを用いた露光装置 |
CN1332267C (zh) * | 2002-06-12 | 2007-08-15 | Asml荷兰有限公司 | 光刻装置和器件的制造方法 |
US6870554B2 (en) * | 2003-01-07 | 2005-03-22 | Anvik Corporation | Maskless lithography with multiplexed spatial light modulators |
CN1472036A (zh) | 2003-05-22 | 2004-02-04 | 上海交通大学 | 三轴孔装配机 |
US7061591B2 (en) * | 2003-05-30 | 2006-06-13 | Asml Holding N.V. | Maskless lithography systems and methods utilizing spatial light modulator arrays |
EP1482375B1 (en) | 2003-05-30 | 2014-09-17 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2004
- 2004-02-27 US US10/788,256 patent/US7016014B2/en not_active Expired - Lifetime
-
2005
- 2005-02-18 TW TW094104931A patent/TWI278003B/zh not_active IP Right Cessation
- 2005-02-24 SG SG200501102A patent/SG114756A1/en unknown
- 2005-02-24 EP EP05251078A patent/EP1569034A1/en not_active Withdrawn
- 2005-02-25 KR KR1020050015811A patent/KR100598636B1/ko not_active IP Right Cessation
- 2005-02-25 JP JP2005050847A patent/JP4499582B2/ja not_active Expired - Fee Related
- 2005-02-28 CN CNB2005100529798A patent/CN100498535C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP4499582B2 (ja) | 2010-07-07 |
EP1569034A1 (en) | 2005-08-31 |
KR100598636B1 (ko) | 2006-07-10 |
KR20060045332A (ko) | 2006-05-17 |
CN1661481A (zh) | 2005-08-31 |
TWI278003B (en) | 2007-04-01 |
TW200539238A (en) | 2005-12-01 |
CN100498535C (zh) | 2009-06-10 |
JP2005244239A (ja) | 2005-09-08 |
US20050190354A1 (en) | 2005-09-01 |
US7016014B2 (en) | 2006-03-21 |
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