SG113566A1 - Lithographic apparatus and device manufacturing method, as well as a device manufacturing thereby - Google Patents
Lithographic apparatus and device manufacturing method, as well as a device manufacturing therebyInfo
- Publication number
- SG113566A1 SG113566A1 SG200500186A SG200500186A SG113566A1 SG 113566 A1 SG113566 A1 SG 113566A1 SG 200500186 A SG200500186 A SG 200500186A SG 200500186 A SG200500186 A SG 200500186A SG 113566 A1 SG113566 A1 SG 113566A1
- Authority
- SG
- Singapore
- Prior art keywords
- device manufacturing
- well
- lithographic apparatus
- manufacturing
- lithographic
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03D—WATER-CLOSETS OR URINALS WITH FLUSHING DEVICES; FLUSHING VALVES THEREFOR
- E03D9/00—Sanitary or other accessories for lavatories ; Devices for cleaning or disinfecting the toilet room or the toilet bowl; Devices for eliminating smells
- E03D9/02—Devices adding a disinfecting, deodorising, or cleaning agent to the water while flushing
- E03D9/03—Devices adding a disinfecting, deodorising, or cleaning agent to the water while flushing consisting of a separate container with an outlet through which the agent is introduced into the flushing water, e.g. by suction ; Devices for agents in direct contact with flushing water
- E03D9/033—Devices placed inside or dispensing into the cistern
- E03D9/037—Active dispensers, i.e. comprising a moving dosing element
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Public Health (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Atmospheric Sciences (AREA)
- Water Supply & Treatment (AREA)
- Hydrology & Water Resources (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/758,270 US7098994B2 (en) | 2004-01-16 | 2004-01-16 | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
Publications (1)
Publication Number | Publication Date |
---|---|
SG113566A1 true SG113566A1 (en) | 2005-08-29 |
Family
ID=34620693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200500186A SG113566A1 (en) | 2004-01-16 | 2005-01-13 | Lithographic apparatus and device manufacturing method, as well as a device manufacturing thereby |
Country Status (7)
Country | Link |
---|---|
US (1) | US7098994B2 (de) |
EP (1) | EP1555575B1 (de) |
JP (1) | JP4639092B2 (de) |
KR (1) | KR100806279B1 (de) |
CN (1) | CN100538525C (de) |
SG (1) | SG113566A1 (de) |
TW (1) | TWI345139B (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7282701B2 (en) * | 2005-02-28 | 2007-10-16 | Asml Netherlands B.V. | Sensor for use in a lithographic apparatus |
US7462841B2 (en) * | 2005-10-19 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and use of a radiation collector |
US7470916B2 (en) | 2005-10-19 | 2008-12-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and radiation collector |
DE102005053415A1 (de) * | 2005-11-04 | 2007-05-10 | Carl Zeiss Laser Optics Gmbh | Optisches Bauelement mit verbessertem thermischen Verhalten |
US20070115443A1 (en) * | 2005-11-23 | 2007-05-24 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
US8064151B2 (en) * | 2007-08-14 | 2011-11-22 | Asml Netherlands B.V. | Lithographic apparatus and thermal optical manipulator control method |
US7960701B2 (en) * | 2007-12-20 | 2011-06-14 | Cymer, Inc. | EUV light source components and methods for producing, using and refurbishing same |
EP2161725B1 (de) * | 2008-09-04 | 2015-07-08 | ASML Netherlands B.V. | Strahlungsquelle und entsprechendes Verfahren |
US7641349B1 (en) | 2008-09-22 | 2010-01-05 | Cymer, Inc. | Systems and methods for collector mirror temperature control using direct contact heat transfer |
US8872142B2 (en) | 2010-03-18 | 2014-10-28 | Gigaphoton Inc. | Extreme ultraviolet light generation apparatus |
JP5705592B2 (ja) * | 2010-03-18 | 2015-04-22 | ギガフォトン株式会社 | 極端紫外光生成装置 |
JP5818528B2 (ja) * | 2011-06-17 | 2015-11-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
DE102010039930A1 (de) * | 2010-08-30 | 2012-03-01 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage |
DE102010041298A1 (de) * | 2010-09-24 | 2012-03-29 | Carl Zeiss Smt Gmbh | EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle |
US8731139B2 (en) * | 2011-05-04 | 2014-05-20 | Media Lario S.R.L. | Evaporative thermal management of grazing incidence collectors for EUV lithography |
KR20140036538A (ko) | 2012-09-17 | 2014-03-26 | 삼성전자주식회사 | 극자외선 생성 장치, 이를 포함하는 노광 장치 및 이러한 노광 장치를 사용해서 제조된 전자 디바이스 |
NL2012954A (en) * | 2013-06-28 | 2015-01-05 | Asml Netherlands Bv | Radiation source for an euv optical lithographic apparatus, and lithographic apparatus comprising such a power source. |
DE102013215197A1 (de) * | 2013-08-02 | 2014-06-12 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit temperierbaren optischen Elementen und Verfahren zum Betrieb einer derartigen Anlage |
DE102014216458A1 (de) | 2014-08-19 | 2016-02-25 | Carl Zeiss Smt Gmbh | Optisches Element mit einer Beschichtung zur Beeinflussung von Heizstrahlung und optische Anordnung |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3132086B2 (ja) * | 1991-09-07 | 2001-02-05 | キヤノン株式会社 | 光学素子の形状制御方法および露光装置 |
CA2077572C (en) | 1991-09-07 | 1998-08-18 | Masahito Niibe | Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductr devices |
JP3448670B2 (ja) * | 1993-09-02 | 2003-09-22 | 株式会社ニコン | 露光装置及び素子製造方法 |
US6452199B1 (en) | 1997-05-12 | 2002-09-17 | Cymer, Inc. | Plasma focus high energy photon source with blast shield |
DE10138313A1 (de) | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
JP3317957B2 (ja) * | 1999-03-15 | 2002-08-26 | サイマー インコーポレイテッド | ブラストシールドを備えるプラズマフォーカス高エネルギフォトン源 |
AU2002325359A1 (en) | 2001-08-10 | 2003-02-24 | Carl Zeiss Smt Ag | Collector with fastening devices for fastening mirror shells |
US6834969B2 (en) * | 2002-05-31 | 2004-12-28 | Schefenacker Vision Systems France S.A. | Heated mirror |
US20050099611A1 (en) * | 2002-06-20 | 2005-05-12 | Nikon Corporation | Minimizing thermal distortion effects on EUV mirror |
US20030235682A1 (en) * | 2002-06-21 | 2003-12-25 | Sogard Michael R. | Method and device for controlling thermal distortion in elements of a lithography system |
-
2004
- 2004-01-16 US US10/758,270 patent/US7098994B2/en not_active Expired - Lifetime
-
2005
- 2005-01-13 SG SG200500186A patent/SG113566A1/en unknown
- 2005-01-14 KR KR1020050003675A patent/KR100806279B1/ko not_active IP Right Cessation
- 2005-01-14 JP JP2005007226A patent/JP4639092B2/ja not_active Expired - Fee Related
- 2005-01-14 EP EP05075105.6A patent/EP1555575B1/de not_active Expired - Fee Related
- 2005-01-14 TW TW094101199A patent/TWI345139B/zh not_active IP Right Cessation
- 2005-01-15 CN CNB2005100565525A patent/CN100538525C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP4639092B2 (ja) | 2011-02-23 |
US20050157284A1 (en) | 2005-07-21 |
JP2005217398A (ja) | 2005-08-11 |
EP1555575B1 (de) | 2017-09-13 |
CN1648777A (zh) | 2005-08-03 |
KR20050075716A (ko) | 2005-07-21 |
EP1555575A1 (de) | 2005-07-20 |
TWI345139B (en) | 2011-07-11 |
US7098994B2 (en) | 2006-08-29 |
KR100806279B1 (ko) | 2008-02-22 |
CN100538525C (zh) | 2009-09-09 |
TW200535572A (en) | 2005-11-01 |
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