SG112962A1 - System and method for moving an object employing piezo actuators - Google Patents

System and method for moving an object employing piezo actuators

Info

Publication number
SG112962A1
SG112962A1 SG200407256A SG200407256A SG112962A1 SG 112962 A1 SG112962 A1 SG 112962A1 SG 200407256 A SG200407256 A SG 200407256A SG 200407256 A SG200407256 A SG 200407256A SG 112962 A1 SG112962 A1 SG 112962A1
Authority
SG
Singapore
Prior art keywords
moving
piezo actuators
object employing
employing piezo
actuators
Prior art date
Application number
SG200407256A
Other languages
English (en)
Inventor
Stefan Gertrud Marie Hendriks
Thomas Augustus Mattaar
Gerardus Jacobus Cor Leenheers
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG112962A1 publication Critical patent/SG112962A1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825Mounting of individual elements, e.g. mounts, holders or supports
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70758Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/02Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
    • H02N2/021Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors using intermittent driving, e.g. step motors, piezoleg motors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Micromachines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
SG200407256A 2003-12-15 2004-12-08 System and method for moving an object employing piezo actuators SG112962A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/735,605 US6977461B2 (en) 2003-12-15 2003-12-15 System and method for moving an object employing piezo actuators

Publications (1)

Publication Number Publication Date
SG112962A1 true SG112962A1 (en) 2005-07-28

Family

ID=34552776

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200407256A SG112962A1 (en) 2003-12-15 2004-12-08 System and method for moving an object employing piezo actuators

Country Status (7)

Country Link
US (2) US6977461B2 (zh)
EP (1) EP1548855A3 (zh)
JP (1) JP4249696B2 (zh)
KR (1) KR100706074B1 (zh)
CN (1) CN1721993B (zh)
SG (1) SG112962A1 (zh)
TW (1) TWI250676B (zh)

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US7439652B2 (en) * 2004-02-25 2008-10-21 Nanomotion Ltd. Multidirectional piezoelectric motor configuration
US7095159B2 (en) * 2004-06-29 2006-08-22 Avago Technologies Sensor Ip (Singapore) Pte. Ltd. Devices with mechanical drivers for displaceable elements
US7548010B2 (en) * 2004-09-21 2009-06-16 Gm Global Technology Operations, Inc. Active material based actuators for large displacements and rotations
US7756660B2 (en) * 2004-12-28 2010-07-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4500183B2 (ja) * 2005-02-25 2010-07-14 東芝機械株式会社 転写装置
KR101138397B1 (ko) * 2005-09-27 2012-04-26 삼성전자주식회사 압전 액츄에이터, 이의 구동 장치 및 방법
US7301257B2 (en) * 2005-10-14 2007-11-27 Academia Sinica Motion actuator
DE102006039821A1 (de) 2006-08-25 2008-03-13 Carl Zeiss Smt Ag Optisches System, insbesondere ein Projektionsobjektiv oder ein Beleuchtungssystem
KR20080093880A (ko) * 2007-04-17 2008-10-22 미쓰미덴기가부시기가이샤 구동 장치
KR20080093882A (ko) * 2007-04-17 2008-10-22 미쓰미덴기가부시기가이샤 구동 장치
KR20080093885A (ko) * 2007-04-18 2008-10-22 미쓰미덴기가부시기가이샤 구동 장치
KR20080094572A (ko) * 2007-04-19 2008-10-23 미쓰미덴기가부시기가이샤 구동 장치
US7956513B2 (en) * 2007-04-20 2011-06-07 Mitsumi Electric Co., Ltd. Method of driving a driving device
US7759634B2 (en) * 2007-04-24 2010-07-20 Mitsumi Electric Co., Ltd. Position detecting device capable of improving detection accuracy
ATE548679T1 (de) * 2008-05-08 2012-03-15 Asml Netherlands Bv Lithografische immersionsvorrichtung, trocknungsvorrichtung, immersionsmetrologievorrichtung und verfahren zur herstellung einer vorrichtung
NL2003141A1 (nl) * 2008-07-30 2010-02-02 Asml Holding Nv Actuator system using multiple piezoelectric actuators.
CN102365815B (zh) * 2009-03-31 2015-09-23 株式会社尼康 压电致动器以及透镜镜筒
DE102009017637A1 (de) * 2009-04-16 2010-10-28 Physik Instrumente (Pi) Gmbh & Co. Kg Betriebsverfahren und Ansteuereinrichtung eines Piezolinearantriebes
NL2004409A (en) * 2009-05-19 2010-11-22 Asml Netherlands Bv Imprint lithography apparatus.
JP5446551B2 (ja) * 2009-07-29 2014-03-19 株式会社ニコン 圧電アクチュエータ、レンズ鏡筒及びカメラ
JP5423160B2 (ja) * 2009-06-05 2014-02-19 株式会社ニコン 圧電アクチュエータ、レンズ鏡筒及びカメラ
WO2010140681A1 (ja) * 2009-06-05 2010-12-09 株式会社ニコン 圧電アクチュエータ、レンズ鏡筒及びカメラ
US8324785B2 (en) * 2009-11-10 2012-12-04 The Regents Of The University Of California Piezoelectric actuators
JP5760617B2 (ja) * 2011-04-07 2015-08-12 東京エレクトロン株式会社 ローディングユニット及び処理システム
WO2012163643A1 (de) 2011-05-30 2012-12-06 Carl Zeiss Smt Gmbh Bewegung eines optischen elements in einer mikrolithografischen projektionsbelichtungsanlage
CN103135357B (zh) * 2011-11-25 2015-04-15 上海微电子装备有限公司 工件台和掩模台的同步控制方法及其系统
KR102247501B1 (ko) * 2014-05-09 2021-05-03 삼성전자주식회사 압전 구동 장치 및 이를 이용한 움직임 측정 방법
KR102021593B1 (ko) * 2019-01-30 2019-09-16 엘아이지넥스원 주식회사 표적 추적 센서의 지향각을 제어하기 위한 지향각 구동 제어 장치 및 이를 포함하는 비행운동체
US20220326627A1 (en) * 2019-05-20 2022-10-13 Asml Netherlands B.V. Actuator assemblies comprising piezo actuators or electrostrictive actuators
US11538652B2 (en) 2019-11-15 2022-12-27 Fei Company Systems and methods of hysteresis compensation
US11244805B2 (en) 2019-11-15 2022-02-08 Fei Company Electron microscope stage
US11562877B2 (en) 2019-11-15 2023-01-24 Fei Company Systems and methods of clamp compensation
NL2033724B1 (en) * 2022-12-14 2024-06-20 Onnes Tech B V Positioner device.

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Also Published As

Publication number Publication date
TWI250676B (en) 2006-03-01
JP4249696B2 (ja) 2009-04-02
TW200532955A (en) 2005-10-01
US20050127786A1 (en) 2005-06-16
EP1548855A2 (en) 2005-06-29
EP1548855A3 (en) 2005-07-06
US7173363B2 (en) 2007-02-06
KR20050060015A (ko) 2005-06-21
JP2005185094A (ja) 2005-07-07
CN1721993B (zh) 2010-10-06
US20050151446A1 (en) 2005-07-14
US6977461B2 (en) 2005-12-20
CN1721993A (zh) 2006-01-18
KR100706074B1 (ko) 2007-04-11

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