SG112034A1 - Optical element, lithographic apparatus comprising such optical element and device manufacturing method - Google Patents

Optical element, lithographic apparatus comprising such optical element and device manufacturing method

Info

Publication number
SG112034A1
SG112034A1 SG200406477A SG200406477A SG112034A1 SG 112034 A1 SG112034 A1 SG 112034A1 SG 200406477 A SG200406477 A SG 200406477A SG 200406477 A SG200406477 A SG 200406477A SG 112034 A1 SG112034 A1 SG 112034A1
Authority
SG
Singapore
Prior art keywords
optical element
device manufacturing
lithographic apparatus
lithographic
optical
Prior art date
Application number
SG200406477A
Other languages
English (en)
Inventor
Levinus Pieter Bakker
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG112034A1 publication Critical patent/SG112034A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
SG200406477A 2003-11-06 2004-11-02 Optical element, lithographic apparatus comprising such optical element and device manufacturing method SG112034A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03078495 2003-11-06

Publications (1)

Publication Number Publication Date
SG112034A1 true SG112034A1 (en) 2005-06-29

Family

ID=34626393

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200406477A SG112034A1 (en) 2003-11-06 2004-11-02 Optical element, lithographic apparatus comprising such optical element and device manufacturing method

Country Status (7)

Country Link
US (2) US8318288B2 (de)
JP (1) JP4390683B2 (de)
KR (1) KR100620983B1 (de)
CN (1) CN100498531C (de)
DE (1) DE602004023580D1 (de)
SG (1) SG112034A1 (de)
TW (1) TWI265369B (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
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US7330239B2 (en) * 2005-04-08 2008-02-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device
US7329876B2 (en) * 2006-01-26 2008-02-12 Xtreme Technologies Gmbh Narrow-band transmission filter for EUV radiation
JP5066815B2 (ja) * 2006-03-03 2012-11-07 株式会社島津製作所 反射型回折格子
FR2899697B1 (fr) * 2006-04-07 2009-11-27 Commissariat Energie Atomique Masque de photolitographie en extreme ultra-violet, avec couche d'arret resonante
DE102006018928A1 (de) * 2006-04-24 2007-11-08 Carl Zeiss Smt Ag Projektionsbelichtungssystem und Verwendung desselben
JP2008152037A (ja) * 2006-12-18 2008-07-03 Nikon Corp 光学素子、露光装置、及びデバイス製造方法
US20080180696A1 (en) * 2007-01-30 2008-07-31 Sony Corporation Process window for EUV lithography
JP5086664B2 (ja) * 2007-03-02 2012-11-28 ギガフォトン株式会社 極端紫外光源装置
NL1036469A1 (nl) * 2008-02-27 2009-08-31 Asml Netherlands Bv Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby.
NL1036891A1 (nl) * 2008-05-02 2009-11-03 Asml Netherlands Bv Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor.
US8227778B2 (en) 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5061069B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光を用いる半導体露光装置
JP5061063B2 (ja) 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
US9097982B2 (en) * 2008-05-30 2015-08-04 Asml Netherlands B.V. Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter
WO2010018046A1 (en) * 2008-08-15 2010-02-18 Asml Netherlands B.V. Mirror, lithographic apparatus and device manufacturing method
EP2681625A1 (de) 2011-03-04 2014-01-08 ASML Netherlands BV Lithografische vorrichtung, filter für spektrale reinheit und geräteherstellungsverfahren
DE102011015141A1 (de) * 2011-03-16 2012-09-20 Carl Zeiss Laser Optics Gmbh Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement
US9573842B2 (en) * 2011-05-27 2017-02-21 Corning Incorporated Transparent glass substrate having antiglare surface
WO2013113537A2 (en) * 2012-01-30 2013-08-08 Asml Netherlands B.V. Optical element, lithographic apparatus incorporating such an element, method of manufacturing an optical element
DE102012202057B4 (de) * 2012-02-10 2021-07-08 Carl Zeiss Smt Gmbh Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement
US9733404B2 (en) * 2012-09-06 2017-08-15 Vaisala Oyj Layered structure for an infrared emitter, infrared emitter device and detector
US10401723B2 (en) 2013-06-03 2019-09-03 Asml Netherlands B.V. Patterning device
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
SG11201704226PA (en) * 2014-11-26 2017-06-29 Supriya Jaiswal Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications
NL2015639A (en) 2014-11-28 2016-09-20 Asml Netherlands Bv Encoder, position measurement system and lithographic apparatus.
DE102016212361A1 (de) * 2016-07-06 2018-01-11 Carl Zeiss Smt Gmbh Optisches Gitter und optische Anordnung damit
DE102016224113A1 (de) * 2016-12-05 2018-06-07 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für die euv - mikrolithographie und verfahren zur herstellung desselben sowie beleuchtungssystem mit einem entsprechenden filter
NL2025510A (en) * 2019-05-24 2020-11-30 Asml Holding Nv Lithographic apparatus, substrate table, and method
KR20210053603A (ko) * 2019-11-04 2021-05-12 삼성전기주식회사 카메라 모듈 및 휴대 단말기
DE102022207052A1 (de) * 2022-07-11 2024-01-11 Carl Zeiss Smt Gmbh Spiegel für eine Projektionsbelichtungsanlage
CN116774331B (zh) * 2023-08-24 2023-11-10 中国科学院长春光学精密机械与物理研究所 光谱选择性非对称热辐射器件及其制备方法

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JPS564107A (en) 1979-06-22 1981-01-17 Canon Inc Light splitter
JPH01213599A (ja) 1988-02-23 1989-08-28 Nippon Telegr & Teleph Corp <Ntt> 反射型回折格子
JPH05181093A (ja) 1991-12-27 1993-07-23 Kuraray Co Ltd 光学的ローパスフィルタおよび撮像装置
JP4149021B2 (ja) 1998-01-14 2008-09-10 オリンパス株式会社 光学系
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6469827B1 (en) 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
EP0989443A3 (de) 1998-09-22 2004-03-31 Fuji Photo Film Co., Ltd. Antireflektionsschicht sowie verfahren zu ihrer herstellung
US6498685B1 (en) * 1999-01-11 2002-12-24 Kenneth C. Johnson Maskless, microlens EUV lithography system
TWI240151B (en) 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2002122702A (ja) 2000-10-17 2002-04-26 Matsushita Electric Ind Co Ltd 光学フィルム、及び表示素子
US6614505B2 (en) 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP4320970B2 (ja) * 2001-04-11 2009-08-26 株式会社ニコン 多層膜反射鏡の製造方法
DE10139188A1 (de) * 2001-08-16 2003-03-06 Schott Glas Glaskeramik für röntgenoptische Komponenten
JP4159840B2 (ja) 2001-10-01 2008-10-01 松下電器産業株式会社 投写型表示装置、リアプロジェクタ及びマルチビジョンシステム
DE60309238T2 (de) * 2002-03-08 2007-06-06 Asml Netherlands B.V. Lithographische Maske, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
SG129254A1 (en) 2002-08-27 2007-02-26 Asml Netherlands Bv Lithographic projection apparatus and reflector assembly for use in said apparatus
EP1496521A1 (de) 2003-07-09 2005-01-12 ASML Netherlands B.V. Spiegel und Lithographiegerät mit Spiegel
EP1515188A1 (de) 2003-09-10 2005-03-16 ASML Netherlands B.V. Verfahren zum Schutz eines optischen Elements, und optisches Element

Also Published As

Publication number Publication date
KR20050043684A (ko) 2005-05-11
TW200527121A (en) 2005-08-16
CN100498531C (zh) 2009-06-10
TWI265369B (en) 2006-11-01
US20130115419A1 (en) 2013-05-09
US8318288B2 (en) 2012-11-27
JP4390683B2 (ja) 2009-12-24
JP2005142569A (ja) 2005-06-02
KR100620983B1 (ko) 2006-09-13
CN1614515A (zh) 2005-05-11
US20050122589A1 (en) 2005-06-09
DE602004023580D1 (de) 2009-11-26

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