SG11202110835XA - Thermal break for high-frequency antennae - Google Patents
Thermal break for high-frequency antennaeInfo
- Publication number
- SG11202110835XA SG11202110835XA SG11202110835XA SG11202110835XA SG11202110835XA SG 11202110835X A SG11202110835X A SG 11202110835XA SG 11202110835X A SG11202110835X A SG 11202110835XA SG 11202110835X A SG11202110835X A SG 11202110835XA SG 11202110835X A SG11202110835X A SG 11202110835XA
- Authority
- SG
- Singapore
- Prior art keywords
- thermal break
- frequency antennae
- antennae
- frequency
- break
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H37/00—Thermally-actuated switches
- H01H37/74—Switches in which only the opening movement or only the closing movement of a contact is effected by heating or cooling
- H01H37/76—Contact member actuated by melting of fusible material, actuated due to burning of combustible material or due to explosion of explosive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32201—Generating means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/02—Arrangements for de-icing; Arrangements for drying-out ; Arrangements for cooling; Arrangements for preventing corrosion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20409—Outer radiating structures on heat dissipating housings, e.g. fins integrated with the housing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Thermal Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Combustion & Propulsion (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Stroboscope Apparatuses (AREA)
- Debugging And Monitoring (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962837922P | 2019-04-24 | 2019-04-24 | |
US16/828,602 US11488796B2 (en) | 2019-04-24 | 2020-03-24 | Thermal break for high-frequency antennae |
PCT/US2020/026223 WO2020219249A1 (en) | 2019-04-24 | 2020-04-01 | Thermal break for high-frequency antennae |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202110835XA true SG11202110835XA (en) | 2021-11-29 |
Family
ID=72916570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202110835XA SG11202110835XA (en) | 2019-04-24 | 2020-04-01 | Thermal break for high-frequency antennae |
Country Status (8)
Country | Link |
---|---|
US (1) | US11488796B2 (ja) |
EP (1) | EP3959740A4 (ja) |
JP (1) | JP7228716B2 (ja) |
KR (1) | KR20210144940A (ja) |
CN (1) | CN113711331B (ja) |
SG (1) | SG11202110835XA (ja) |
TW (1) | TWI803744B (ja) |
WO (1) | WO2020219249A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11488796B2 (en) * | 2019-04-24 | 2022-11-01 | Applied Materials, Inc. | Thermal break for high-frequency antennae |
Family Cites Families (52)
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US4555588A (en) | 1983-10-26 | 1985-11-26 | Rte Corporation | Heat transfer device for electrical connector in insulating housing of high voltage splice or terminator |
US6514376B1 (en) * | 1991-06-27 | 2003-02-04 | Applied Materials Inc. | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
US5874014A (en) * | 1995-06-07 | 1999-02-23 | Berkeley Scholars, Inc. | Durable plasma treatment apparatus and method |
US5877471A (en) * | 1997-06-11 | 1999-03-02 | The Regents Of The University Of California | Plasma torch having a cooled shield assembly |
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WO2003039214A1 (en) * | 2001-10-26 | 2003-05-08 | Michigan State University | Improved microwave stripline applicators |
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WO2005013661A2 (en) * | 2003-02-19 | 2005-02-10 | Nisvara, Inc. | System and apparatus for heat removal |
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WO2008013112A1 (fr) * | 2006-07-28 | 2008-01-31 | Tokyo Electron Limited | Source de plasma à micro-ondes et appareil de traitement plasma |
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US7737036B2 (en) * | 2007-08-09 | 2010-06-15 | Applied Materials, Inc. | Integrated circuit fabrication process with minimal post-laser annealing dopant deactivation |
FR2921388B1 (fr) * | 2007-09-20 | 2010-11-26 | Air Liquide | Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications |
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US11488796B2 (en) * | 2019-04-24 | 2022-11-01 | Applied Materials, Inc. | Thermal break for high-frequency antennae |
US11564292B2 (en) * | 2019-09-27 | 2023-01-24 | Applied Materials, Inc. | Monolithic modular microwave source with integrated temperature control |
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-
2020
- 2020-03-24 US US16/828,602 patent/US11488796B2/en active Active
- 2020-04-01 SG SG11202110835XA patent/SG11202110835XA/en unknown
- 2020-04-01 WO PCT/US2020/026223 patent/WO2020219249A1/en unknown
- 2020-04-01 CN CN202080029818.XA patent/CN113711331B/zh active Active
- 2020-04-01 JP JP2021562091A patent/JP7228716B2/ja active Active
- 2020-04-01 EP EP20795744.0A patent/EP3959740A4/en active Pending
- 2020-04-01 KR KR1020217038044A patent/KR20210144940A/ko not_active Application Discontinuation
- 2020-04-21 TW TW109113265A patent/TWI803744B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW202105453A (zh) | 2021-02-01 |
TWI803744B (zh) | 2023-06-01 |
EP3959740A4 (en) | 2022-12-21 |
CN113711331A (zh) | 2021-11-26 |
WO2020219249A1 (en) | 2020-10-29 |
JP7228716B2 (ja) | 2023-02-24 |
KR20210144940A (ko) | 2021-11-30 |
CN113711331B (zh) | 2024-03-12 |
US11488796B2 (en) | 2022-11-01 |
JP2022529984A (ja) | 2022-06-27 |
EP3959740A1 (en) | 2022-03-02 |
US20200343065A1 (en) | 2020-10-29 |
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