FR2921388B1 - Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications - Google Patents
Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applicationsInfo
- Publication number
- FR2921388B1 FR2921388B1 FR0757720A FR0757720A FR2921388B1 FR 2921388 B1 FR2921388 B1 FR 2921388B1 FR 0757720 A FR0757720 A FR 0757720A FR 0757720 A FR0757720 A FR 0757720A FR 2921388 B1 FR2921388 B1 FR 2921388B1
- Authority
- FR
- France
- Prior art keywords
- applications
- atmospheric pressure
- pressure plasma
- deposition device
- plasma assisted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0757720A FR2921388B1 (fr) | 2007-09-20 | 2007-09-20 | Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications |
CN2008801078006A CN101802259B (zh) | 2007-09-20 | 2008-09-16 | 用于大气压力下的甚高频等离子体辅助cvd的设备和方法及其应用 |
PCT/FR2008/051660 WO2009047442A1 (fr) | 2007-09-20 | 2008-09-16 | Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications |
JP2010525400A JP5453271B2 (ja) | 2007-09-20 | 2008-09-16 | 大気圧下における超高周波プラズマ補助cvdのための装置および方法、並びにその応用 |
EP08837638A EP2195472A1 (fr) | 2007-09-20 | 2008-09-16 | Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications |
US12/679,239 US20110045205A1 (en) | 2007-09-20 | 2008-09-16 | Device and Process for Very High-Frequency Plasma-Assisted CVD under Atmospheric Pressure, and Applications Thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0757720A FR2921388B1 (fr) | 2007-09-20 | 2007-09-20 | Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2921388A1 FR2921388A1 (fr) | 2009-03-27 |
FR2921388B1 true FR2921388B1 (fr) | 2010-11-26 |
Family
ID=39410467
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0757720A Expired - Fee Related FR2921388B1 (fr) | 2007-09-20 | 2007-09-20 | Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications |
Country Status (6)
Country | Link |
---|---|
US (1) | US20110045205A1 (fr) |
EP (1) | EP2195472A1 (fr) |
JP (1) | JP5453271B2 (fr) |
CN (1) | CN101802259B (fr) |
FR (1) | FR2921388B1 (fr) |
WO (1) | WO2009047442A1 (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2929134B1 (fr) | 2008-03-28 | 2010-12-31 | Air Liquide | Procede de fabrication d'un garnissage ondule-croise |
CN102387653B (zh) | 2010-09-02 | 2015-08-05 | 松下电器产业株式会社 | 等离子体处理装置及等离子体处理方法 |
CN103094038B (zh) | 2011-10-27 | 2017-01-11 | 松下知识产权经营株式会社 | 等离子体处理装置以及等离子体处理方法 |
JP5617817B2 (ja) | 2011-10-27 | 2014-11-05 | パナソニック株式会社 | 誘導結合型プラズマ処理装置及び誘導結合型プラズマ処理方法 |
US10115565B2 (en) | 2012-03-02 | 2018-10-30 | Panasonic Intellectual Property Management Co., Ltd. | Plasma processing apparatus and plasma processing method |
US10840065B2 (en) * | 2016-12-05 | 2020-11-17 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Active gas generation apparatus including a metal housing, first and second auxiliary members, and a housing contact |
KR20200070318A (ko) * | 2017-10-12 | 2020-06-17 | 젤리스트 테크놀로지스, 인코퍼레이티드 | 박막 제조를 위한 공급원 화학물질의 통합된 합성, 전달 및 처리 방법 및 시스템 |
KR101922507B1 (ko) * | 2017-11-29 | 2018-11-28 | 주식회사 서린메디케어 | 프락셔널 플라즈마를 이용한 피부 치료장치 |
FR3091875B1 (fr) * | 2019-01-17 | 2021-09-24 | Innovative Systems Et Tech Isytech | Procédé et dispositif de traitement pour le dépôt d’un revêtement à effet barrière |
US11488796B2 (en) * | 2019-04-24 | 2022-11-01 | Applied Materials, Inc. | Thermal break for high-frequency antennae |
CN114774880A (zh) * | 2022-04-29 | 2022-07-22 | 深圳优普莱等离子体技术有限公司 | 一种基片台倒置的化学气相沉积系统及设备 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0676666B2 (ja) * | 1987-02-10 | 1994-09-28 | 株式会社半導体エネルギ−研究所 | 炭素膜作製方法 |
US4893584A (en) * | 1988-03-29 | 1990-01-16 | Energy Conversion Devices, Inc. | Large area microwave plasma apparatus |
US5114770A (en) * | 1989-06-28 | 1992-05-19 | Canon Kabushiki Kaisha | Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method |
US5023056A (en) * | 1989-12-27 | 1991-06-11 | The United States Of America As Represented By The Secretary Of The Navy | Plasma generator utilizing dielectric member for carrying microwave energy |
JPH04362094A (ja) * | 1991-06-07 | 1992-12-15 | Fujitsu Ltd | ダイヤモンドの気相合成方法 |
US5908565A (en) * | 1995-02-03 | 1999-06-01 | Sharp Kabushiki Kaisha | Line plasma vapor phase deposition apparatus and method |
DE19943953A1 (de) * | 1999-09-14 | 2001-04-12 | Bosch Gmbh Robert | Vorrichtung und Verfahren zur Erzeugung eines lokalen Plasmas durch Mikrostrukturelektrodenentladungen mit Mikrowellen |
JP3399887B2 (ja) * | 1999-09-22 | 2003-04-21 | パール工業株式会社 | プラズマ処理装置 |
JP2001207269A (ja) * | 2000-01-25 | 2001-07-31 | Sharp Corp | プラズマ処理装置 |
BR0114352A (pt) * | 2000-10-26 | 2004-02-17 | Dow Corning Ireland Ltd | Conjunto de plasma à pressão atmosférica |
JP3745700B2 (ja) * | 2002-03-29 | 2006-02-15 | 三井造船株式会社 | マイクロ波プラズマ生成用アンテナ |
CN100588305C (zh) * | 2002-05-08 | 2010-02-03 | Btu国际公司 | 一种形成等离子体的方法 |
JP3962280B2 (ja) * | 2002-05-21 | 2007-08-22 | 積水化学工業株式会社 | 放電プラズマ処理装置 |
AU2003303538A1 (en) * | 2002-12-30 | 2004-07-29 | Northeastern University | Low power plasma generator |
JP2005116901A (ja) * | 2003-10-09 | 2005-04-28 | Sekisui Chem Co Ltd | プラズマ成膜装置 |
EP1849593A4 (fr) * | 2005-02-17 | 2011-01-05 | Konica Minolta Holdings Inc | Film barriere aux gaz, procede de production du film barriere aux gaz, base en resine avec le film barriere aux gaz pour element electroluminescent organique et element electroluminescent organique |
TW200640301A (en) * | 2005-05-12 | 2006-11-16 | Shimadzu Corp | Surface wave plasma processing apparatus |
JP4539985B2 (ja) * | 2005-11-02 | 2010-09-08 | 国立大学法人大阪大学 | エピタキシャルSi膜の製造方法およびプラズマ処理装置 |
JP2007190844A (ja) * | 2006-01-20 | 2007-08-02 | Konica Minolta Holdings Inc | ガスバリア性樹脂基材および有機エレクトロルミネッセンスデバイス |
US20070170996A1 (en) * | 2006-01-20 | 2007-07-26 | Dutton David T | Plasma generating devices having alternative ground geometry and methods for using the same |
-
2007
- 2007-09-20 FR FR0757720A patent/FR2921388B1/fr not_active Expired - Fee Related
-
2008
- 2008-09-16 JP JP2010525400A patent/JP5453271B2/ja not_active Expired - Fee Related
- 2008-09-16 US US12/679,239 patent/US20110045205A1/en not_active Abandoned
- 2008-09-16 WO PCT/FR2008/051660 patent/WO2009047442A1/fr active Application Filing
- 2008-09-16 EP EP08837638A patent/EP2195472A1/fr not_active Withdrawn
- 2008-09-16 CN CN2008801078006A patent/CN101802259B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101802259A (zh) | 2010-08-11 |
CN101802259B (zh) | 2013-02-13 |
WO2009047442A1 (fr) | 2009-04-16 |
US20110045205A1 (en) | 2011-02-24 |
JP5453271B2 (ja) | 2014-03-26 |
EP2195472A1 (fr) | 2010-06-16 |
FR2921388A1 (fr) | 2009-03-27 |
JP2010539336A (ja) | 2010-12-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 9 |
|
ST | Notification of lapse |
Effective date: 20170531 |