SG11202010427SA - Device and method for attaching protective tape on semiconductor wafer - Google Patents
Device and method for attaching protective tape on semiconductor waferInfo
- Publication number
- SG11202010427SA SG11202010427SA SG11202010427SA SG11202010427SA SG11202010427SA SG 11202010427S A SG11202010427S A SG 11202010427SA SG 11202010427S A SG11202010427S A SG 11202010427SA SG 11202010427S A SG11202010427S A SG 11202010427SA SG 11202010427S A SG11202010427S A SG 11202010427SA
- Authority
- SG
- Singapore
- Prior art keywords
- semiconductor wafer
- protective tape
- attaching protective
- attaching
- tape
- Prior art date
Links
- 230000001681 protective effect Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/06—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
- B32B37/1284—Application of adhesive
- B32B37/1292—Application of adhesive selectively, e.g. in stripes, in patterns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
- B29C65/48—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding
- B29C65/50—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding using adhesive tape, e.g. thermoplastic tape; using threads or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2018/016533 WO2019207632A1 (en) | 2018-04-24 | 2018-04-24 | Device and method for attaching protective tape on semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202010427SA true SG11202010427SA (en) | 2020-11-27 |
Family
ID=68294423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202010427SA SG11202010427SA (en) | 2018-04-24 | 2018-04-24 | Device and method for attaching protective tape on semiconductor wafer |
Country Status (8)
Country | Link |
---|---|
US (1) | US11935768B2 (en) |
JP (1) | JP7287630B2 (en) |
KR (1) | KR102555601B1 (en) |
CN (1) | CN112020768A (en) |
DE (1) | DE112018007513T5 (en) |
SG (1) | SG11202010427SA (en) |
TW (1) | TWI820117B (en) |
WO (1) | WO2019207632A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102400988B1 (en) * | 2022-03-10 | 2022-05-23 | (주)파웰 코퍼레이션 | Autoclave Apparatus for electrostatic chuck bonding |
CN116021403A (en) * | 2022-10-13 | 2023-04-28 | 北京特思迪半导体设备有限公司 | Flexible air bag structure for wafer batch polishing and accurate control method of down force |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3890765A (en) | 1973-09-07 | 1975-06-24 | Phillips Petroleum Co | Carton forming machine |
JPS5828532U (en) | 1981-08-14 | 1983-02-24 | 株式会社日立製作所 | Status and fault display method |
JPH1012578A (en) * | 1996-06-26 | 1998-01-16 | Mitsubishi Electric Corp | Method and apparatus for mounting wafer on support base |
JP3627090B2 (en) * | 1997-09-17 | 2005-03-09 | 株式会社名機製作所 | Lamination molding method and lamination molding apparatus |
JP3607143B2 (en) | 1999-11-19 | 2005-01-05 | 株式会社タカトリ | Method and apparatus for attaching protective tape to semiconductor wafer |
US6520844B2 (en) * | 2000-08-04 | 2003-02-18 | Sharp Kabushiki Kaisha | Method of thinning semiconductor wafer capable of preventing its front from being contaminated and back grinding device for semiconductor wafers |
KR20030033084A (en) * | 2000-09-27 | 2003-04-26 | 스트라스바흐, 인코포레이티드 | Tool for applying resilient tape to chuck used for grinding or polishing wafers |
JP2002222779A (en) | 2001-01-29 | 2002-08-09 | Nec Yamagata Ltd | Tape sticking device and method therefor |
JP3957506B2 (en) * | 2001-12-26 | 2007-08-15 | Necエレクトロニクス株式会社 | Substrate surface protection sheet affixing device and affixing method |
JP3545758B2 (en) | 2003-06-17 | 2004-07-21 | リンテック株式会社 | Method and apparatus for cutting semiconductor wafer protection film |
JP4559122B2 (en) * | 2004-05-25 | 2010-10-06 | 有限会社都波岐精工 | Tape bonding apparatus and tape bonding method |
KR100725289B1 (en) * | 2005-03-17 | 2007-06-07 | 엘에스전선 주식회사 | Apparatus and method for manufacturing adhesive tape used for semiconductor manufacturing |
JP4612453B2 (en) | 2005-03-30 | 2011-01-12 | 株式会社タカトリ | Method and apparatus for applying tape to wafer |
JP2007036153A (en) * | 2005-07-29 | 2007-02-08 | Disco Abrasive Syst Ltd | Sticking method and apparatus of protective tape for wafer |
JP4841355B2 (en) * | 2006-08-08 | 2011-12-21 | 日東電工株式会社 | Method for holding semiconductor wafer |
JP5112682B2 (en) * | 2006-12-18 | 2013-01-09 | リンテック株式会社 | Sheet sticking device and sticking method |
JP4934620B2 (en) * | 2008-03-25 | 2012-05-16 | 古河電気工業株式会社 | Wafer processing tape |
JP2009246004A (en) * | 2008-03-28 | 2009-10-22 | Tokyo Seimitsu Co Ltd | Dicing tape sticking apparatus |
JP4723614B2 (en) * | 2008-06-06 | 2011-07-13 | リンテック株式会社 | Sheet sticking device and sticking method |
JP5216472B2 (en) * | 2008-08-12 | 2013-06-19 | 日東電工株式会社 | Method and apparatus for attaching protective tape to semiconductor wafer |
JP5317267B2 (en) | 2008-11-14 | 2013-10-16 | 株式会社タカトリ | Wafer mounting device |
JP5273791B2 (en) * | 2008-12-02 | 2013-08-28 | 株式会社タカトリ | Equipment for applying adhesive tape to substrates |
JP5417131B2 (en) | 2009-11-20 | 2014-02-12 | 日東電工株式会社 | Adhesive tape attaching apparatus and adhesive tape attaching method |
JP5126260B2 (en) * | 2010-03-16 | 2013-01-23 | Necエンジニアリング株式会社 | Tape sticking device and tape sticking method |
JP2014204033A (en) * | 2013-04-08 | 2014-10-27 | 日東電工株式会社 | Semiconductor device manufacturing method |
JP2015162634A (en) | 2014-02-28 | 2015-09-07 | 株式会社タカトリ | Device of pasting protective tape to wafer and method of manufacturing wafer |
JP5828532B1 (en) | 2014-12-02 | 2015-12-09 | 大宮工業株式会社 | Pasting device |
JP2017041469A (en) | 2015-08-17 | 2017-02-23 | 日東電工株式会社 | Protective tape sticking method |
KR102499977B1 (en) | 2016-07-13 | 2023-02-15 | 삼성전자주식회사 | Adhesive tape sticking apparatus and method of manufacturing a semiconducotr package using the same |
-
2018
- 2018-04-24 DE DE112018007513.3T patent/DE112018007513T5/en active Pending
- 2018-04-24 KR KR1020207032073A patent/KR102555601B1/en active IP Right Grant
- 2018-04-24 JP JP2020515332A patent/JP7287630B2/en active Active
- 2018-04-24 WO PCT/JP2018/016533 patent/WO2019207632A1/en active Application Filing
- 2018-04-24 US US17/049,381 patent/US11935768B2/en active Active
- 2018-04-24 SG SG11202010427SA patent/SG11202010427SA/en unknown
- 2018-04-24 CN CN201880092682.XA patent/CN112020768A/en active Pending
-
2019
- 2019-04-17 TW TW108113405A patent/TWI820117B/en active
Also Published As
Publication number | Publication date |
---|---|
DE112018007513T5 (en) | 2021-03-11 |
US20210249285A1 (en) | 2021-08-12 |
CN112020768A (en) | 2020-12-01 |
US11935768B2 (en) | 2024-03-19 |
WO2019207632A1 (en) | 2019-10-31 |
TW201946208A (en) | 2019-12-01 |
KR102555601B1 (en) | 2023-07-18 |
KR20210003139A (en) | 2021-01-11 |
TWI820117B (en) | 2023-11-01 |
JPWO2019207632A1 (en) | 2021-04-22 |
JP7287630B2 (en) | 2023-06-06 |
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