SG11201903903XA - Use of silyl bridged alkyl compounds for dense osg films - Google Patents
Use of silyl bridged alkyl compounds for dense osg filmsInfo
- Publication number
- SG11201903903XA SG11201903903XA SG11201903903XA SG11201903903XA SG11201903903XA SG 11201903903X A SG11201903903X A SG 11201903903XA SG 11201903903X A SG11201903903X A SG 11201903903XA SG 11201903903X A SG11201903903X A SG 11201903903XA SG 11201903903X A SG11201903903X A SG 11201903903XA
- Authority
- SG
- Singapore
- Prior art keywords
- international
- pct
- films
- alkyl compounds
- robert
- Prior art date
Links
- 125000000217 alkyl group Chemical group 0.000 title 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 title 1
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 239000003989 dielectric material Substances 0.000 abstract 2
- 241000545217 Buteo nitidus Species 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical class [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 230000008520 organization Effects 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
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- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
Abstract
International Publication Date (19) World Intellectual Property Organization International Bureau (10) International Publication Number WO 2018/085117 Al omit °nolo omm IIIIII O IIOHDIDum° oimIE 120 100 7' 3 80 o_ 60 0 40 20 (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) 11 May 2018 (11.05.2018) WIPO I PCT (51) International Patent Classification: LEY, William, Robert; 1351 S. Claiborne Avenue, Gilbert, C23C 16/40 (2006.01) C23C 16/50 (2006.01) AZ 85296 (US). SINATORE, Dino; 3322 S. Ruch Street, C23C 16/34 (2006.01) C23C 16/56 (2006.01) Whitehall, PA 18052 (US). THEODOROU, Kathleen, Es- C23C 16/32 (2006.01) C23C 16/448 (2006.01) ther; 4108 Rexford Drive, Bethlehem, PA 18020 (US). C23C 16/30 (2006.01) H01L 21/02 (21) International Application Number: (2006.01) ADAMCZYK, Andrew, J.; 19550 N. Grayhawk Drive, Unit 1018, Scottsdale, AZ 85255 (US). PCT/US2017/058577 (22) International Filing Date: 26 October 2017 (26.10.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/416,302 02 November 2016 (02.11.2016) US 15/789,790 20 October 2017 (20.10.2017) US (71) Applicant: VERSUM MATERIALS US, LLC [US/US]; 8555 S. River Parkway, Tempe, AZ 85284 (US). (72) Inventors: VRTIS, Raymond, Nicholas; 7820 E. Serene Street, #900, Carefree, AZ 85377 (US). RIDGEWAY, Robert, Gordon; 2255 W. Germann Road, #1055, Chan- dler, AZ 85286 (US). ACHTYL, Jennifer Lynn, Anne; 394 W. Weatherby Place, Chandler, AZ 85286 (US). ENT- (74) Agent: ROSSI, Joseph, D. et al.; Stradley Ronon Stevens & Young, LLP, 30 Valley Stream Parkway, Great Valley Corporate Center, Malvern, PA 19355 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, — (54) Title: USE OF SILYL BRIDGED ALKYL COMPOUNDS FOR DENSE OSG FILMS -4-- -CH 2- -CH(CH3)- -C(CH3)2- -CH2CH2- -ar- -C H =CH - -X- -CEC- -CH(CH3)CH2- -0- -CH3 CH3- 0 0.2 0.4 0.6 0.8 Fraction of oxygen replacement FIG. 1. Predicted Bulk Modulus for various doped amorphous Si0 systems 2 (57) : Low dielectric materials and films comprising same have been identified for improved performance when used as N interlevel dielectrics in integrated circuits as well as methods for making same. O [Continued on next page] WO 2018/085117 Al MIDEDIMOMOIDEIREIDIONIMBROHMERVOIS UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))
Applications Claiming Priority (3)
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US201662416302P | 2016-11-02 | 2016-11-02 | |
US15/789,790 US10249489B2 (en) | 2016-11-02 | 2017-10-20 | Use of silyl bridged alkyl compounds for dense OSG films |
PCT/US2017/058577 WO2018085117A1 (en) | 2016-11-02 | 2017-10-26 | Use of silyl bridged alkyl compounds for dense osg films |
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EP (2) | EP3535438B1 (en) |
JP (1) | JP6959334B2 (en) |
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CN (1) | CN110073030A (en) |
SG (1) | SG11201903903XA (en) |
TW (1) | TWI705971B (en) |
WO (1) | WO2018085117A1 (en) |
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KR102378021B1 (en) | 2016-05-06 | 2022-03-23 | 에이에스엠 아이피 홀딩 비.브이. | Formation of SiOC thin films |
US20180033614A1 (en) * | 2016-07-27 | 2018-02-01 | Versum Materials Us, Llc | Compositions and Methods Using Same for Carbon Doped Silicon Containing Films |
CN110546302B (en) | 2017-05-05 | 2022-05-27 | Asm Ip 控股有限公司 | Plasma enhanced deposition method for controlled formation of oxygen-containing films |
US20190096820A1 (en) * | 2017-09-28 | 2019-03-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Hardened interlayer dielectric layer |
US20190382886A1 (en) * | 2018-06-15 | 2019-12-19 | Versum Materials Us, Llc | Siloxane Compositions and Methods for Using the Compositions to Deposit Silicon Containing Films |
US11043373B2 (en) * | 2018-07-31 | 2021-06-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interconnect system with improved low-k dielectrics |
EP3844318A4 (en) * | 2018-10-03 | 2022-06-01 | Versum Materials US, LLC | Methods for making silicon and nitrogen containing films |
TW202111147A (en) * | 2019-08-12 | 2021-03-16 | 美商應用材料股份有限公司 | Low-k dielectric films |
KR20210064658A (en) | 2019-11-26 | 2021-06-03 | 에스케이트리켐 주식회사 | Precursor for silicon-containing film deposition, deposition method of silicon-containing film and semiconductor device of the same |
CN112689886B (en) * | 2020-06-16 | 2022-11-18 | 福建晶安光电有限公司 | Substrate processing method and semiconductor device manufacturing method |
US20220388033A1 (en) * | 2021-05-26 | 2022-12-08 | Versum Materials Us, Llc | Precursors for depositing films with high elastic modulus |
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TWI705971B (en) | 2020-10-01 |
US20180122632A1 (en) | 2018-05-03 |
WO2018085117A1 (en) | 2018-05-11 |
EP4307343A2 (en) | 2024-01-17 |
KR102337603B1 (en) | 2021-12-10 |
TW201823257A (en) | 2018-07-01 |
JP6959334B2 (en) | 2021-11-02 |
US10249489B2 (en) | 2019-04-02 |
EP3535438A4 (en) | 2020-03-11 |
EP3535438A1 (en) | 2019-09-11 |
JP2020513680A (en) | 2020-05-14 |
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