SG11201809683PA - Method for recovering au from iodine-based etching waste and recycling etching solution - Google Patents

Method for recovering au from iodine-based etching waste and recycling etching solution

Info

Publication number
SG11201809683PA
SG11201809683PA SG11201809683PA SG11201809683PA SG11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA
Authority
SG
Singapore
Prior art keywords
iodine
etching solution
recovering
recycling
based etching
Prior art date
Application number
SG11201809683PA
Other languages
English (en)
Inventor
Kengo Sato
Original Assignee
Matsuda Sangyo Company Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsuda Sangyo Company Ltd filed Critical Matsuda Sangyo Company Ltd
Publication of SG11201809683PA publication Critical patent/SG11201809683PA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/30—Acidic compositions for etching other metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/20—Electrolytic production, recovery or refining of metals by electrolysis of solutions of noble metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • ing And Chemical Polishing (AREA)
SG11201809683PA 2017-02-15 2018-01-19 Method for recovering au from iodine-based etching waste and recycling etching solution SG11201809683PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017025928A JP6167254B1 (ja) 2017-02-15 2017-02-15 ヨウ素系エッチング廃液からのＡｕ回収とエッチング溶液を再生する方法
PCT/JP2018/001580 WO2018150811A1 (ja) 2017-02-15 2018-01-19 ヨウ素系エッチング廃液からのＡｕ回収とエッチング溶液を再生する方法

Publications (1)

Publication Number Publication Date
SG11201809683PA true SG11201809683PA (en) 2018-11-29

Family

ID=59351307

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201809683PA SG11201809683PA (en) 2017-02-15 2018-01-19 Method for recovering au from iodine-based etching waste and recycling etching solution

Country Status (7)

Country Link
JP (1) JP6167254B1 (zh)
CN (1) CN109312482B (zh)
MY (1) MY188325A (zh)
PH (1) PH12018502401A1 (zh)
SG (1) SG11201809683PA (zh)
TW (1) TWI664320B (zh)
WO (1) WO2018150811A1 (zh)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60177192A (ja) * 1984-02-23 1985-09-11 Shinko Electric Ind Co Ltd 金および銀が共存する金めつき剥離廃液からの金および銀の分離回収方法
JPH01184281A (ja) * 1988-01-14 1989-07-21 Tanaka Kikinzoku Kogyo Kk ヨウ素による化学エッチング方法
JP2003105570A (ja) * 2001-09-28 2003-04-09 Kawasaki Kasei Chem Ltd 貴金属の回収方法ならび回収装置
WO2014192581A1 (ja) * 2013-05-31 2014-12-04 アサヒプリテック株式会社 Ａｕ含有ヨウ素系エッチング液の処理方法、および処理装置

Also Published As

Publication number Publication date
JP6167254B1 (ja) 2017-07-19
TWI664320B (zh) 2019-07-01
TW201837237A (zh) 2018-10-16
PH12018502401B1 (en) 2019-09-23
JP2018131655A (ja) 2018-08-23
CN109312482B (zh) 2021-01-12
CN109312482A (zh) 2019-02-05
PH12018502401A1 (en) 2019-09-23
MY188325A (en) 2021-11-30
WO2018150811A1 (ja) 2018-08-23

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