SG11201807653XA - Method of creating a fragmentation pattern on a warhead - Google Patents

Method of creating a fragmentation pattern on a warhead

Info

Publication number
SG11201807653XA
SG11201807653XA SG11201807653XA SG11201807653XA SG11201807653XA SG 11201807653X A SG11201807653X A SG 11201807653XA SG 11201807653X A SG11201807653X A SG 11201807653XA SG 11201807653X A SG11201807653X A SG 11201807653XA SG 11201807653X A SG11201807653X A SG 11201807653XA
Authority
SG
Singapore
Prior art keywords
international
warhead
fragmentation pattern
new jersey
road
Prior art date
Application number
SG11201807653XA
Inventor
Paul C Manz
Phillip J Magnotti
Ductri H Nguyen
Original Assignee
Us Gov Sec Army
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Us Gov Sec Army filed Critical Us Gov Sec Army
Publication of SG11201807653XA publication Critical patent/SG11201807653XA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
    • C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
    • C23C24/106—Coating with metal alloys or metal elements only
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F42—AMMUNITION; BLASTING
    • F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
    • F42B12/00—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material
    • F42B12/02—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect
    • F42B12/20—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type
    • F42B12/22—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction
    • F42B12/24—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction with grooves, recesses or other wall weakenings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F42—AMMUNITION; BLASTING
    • F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
    • F42B12/00—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material
    • F42B12/02—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect
    • F42B12/20—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type
    • F42B12/22—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction
    • F42B12/32—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction the hull or case comprising a plurality of discrete bodies, e.g. steel balls, embedded therein or disposed around the explosive charge
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F42—AMMUNITION; BLASTING
    • F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
    • F42B33/00—Manufacture of ammunition; Dismantling of ammunition; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/20—Direct sintering or melting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y40/00—Auxiliary operations or equipment, e.g. for material handling

Abstract

WO 17 / 168 146 Al (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (10) International Publication Number (43) International Publication Date WO 2017/168146 Al 5 October 2017 (05.10.2017) WIPO I PCT (51) International Patent Classification: F42B 12/24 (2006.01) F42B 33/00 (2006.01) F42B 12/32 (2006.01) (21) International Application Number: PCT/GB2017/050878 (22) International Filing Date: 29 March 2017 (29.03.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/314,506 29 March 2016 (29.03.2016) US 15/281,250 30 September 2016 (30.09.2016) US (71) Applicant: U.S. GOVERNMENT AS REPRESENTED BY THE SECRETARY OF THE ARMY [US/US]; U.S. Army RDECOM-ARDEC, RDAR-GCL/Bldg.3, Picatinny Arsenal, Dover, New Jersey 07806-5000 (US). (71) Applicant (for ZA only): LUCAS, Brian [GB/GB]; 135 Westhall Road, Warlingham Surrey CR6 9HJ (GB). (72) Inventors: MANZ, Paul C.; 200 Allamuchy Road, An- dover, New Jersey 07821 (US). MAGNOTTI, Phillip J.; 852 Tice Place, Westfield, New Jersey 07090 (US). NGUYEN, Ductri H.; 50 Fieldcrest Road, Parsippany, New Jersey 07054 (US). (74) Agent: LUCAS & CO; 135 Westhall Road, Warlingham, Surrey, CR6 9HJ (GB). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Declarations under Rule 4.17: — of inventorship (Rule 4.17(iv)) Published: with international search report (Art. 21(3)) before the expiration of the time limit for amending the claims and to be republished in the event of receipt of amendments (Rule 48.2(h)) (54) Title: METHOD OF CREATING A FRAGMENTATION PATTERN ON A WARHEAD (57) : A method of creating a fragmentation pattern on a warhead comprising ablating material from the interior surface of the warhead according to a pre-defined fragmentation pattern. The pre-defined fragmentation pattern may be effected electronically or with a mask. The ablation may be effected by applying an etchant to the warhead interior surface material. 111111111111110111011111111111010111110 III 011111111H 010111111111111111111110111111
SG11201807653XA 2016-03-29 2017-03-29 Method of creating a fragmentation pattern on a warhead SG11201807653XA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662314506P 2016-03-29 2016-03-29
US15/281,250 US9946159B2 (en) 2016-03-29 2016-09-30 Lithographic fragmentation technology
PCT/GB2017/050878 WO2017168146A1 (en) 2016-03-29 2017-03-29 Method of creating a fragmentation pattern on a warhead

Publications (1)

Publication Number Publication Date
SG11201807653XA true SG11201807653XA (en) 2018-10-30

Family

ID=58537034

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10202009532RA SG10202009532RA (en) 2016-03-29 2017-03-29 Method of creating a fragmentation pattern on a warhead
SG11201807653XA SG11201807653XA (en) 2016-03-29 2017-03-29 Method of creating a fragmentation pattern on a warhead

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10202009532RA SG10202009532RA (en) 2016-03-29 2017-03-29 Method of creating a fragmentation pattern on a warhead

Country Status (11)

Country Link
US (2) US9946159B2 (en)
EP (3) EP3719440B1 (en)
KR (3) KR102644756B1 (en)
AU (2) AU2017243193B2 (en)
CA (1) CA3018478A1 (en)
GB (1) GB2563770A (en)
IL (2) IL261907A (en)
PL (2) PL3719440T3 (en)
SG (2) SG10202009532RA (en)
WO (1) WO2017168146A1 (en)
ZA (2) ZA201807027B (en)

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AU2014322901B2 (en) * 2013-09-17 2017-08-24 Bae Systems Plc Method and apparatus for characterising fragmentation of an explosive device
JP6766177B2 (en) * 2016-01-15 2020-10-07 サーブ・ボフォース・ダイナミクス・スウィツァランド・リミテッド warhead
CN109540965A (en) * 2018-11-15 2019-03-29 中国工程物理研究院化工材料研究所 Explosive fragmentation driving capability evaluating apparatus and method
SE544060C2 (en) 2019-03-19 2021-11-30 Bae Systems Bofors Ab A combat member and a method of making a combat member
KR20210084756A (en) * 2019-12-27 2021-07-08 한국재료연구원 Metal mold comprising porosites and preparation method thereof
GB202003965D0 (en) * 2020-03-19 2020-05-06 Secr Defence Casing for a fragmentation weapon, fragmentation weapon, and method of manufacture
DE102020113411A1 (en) * 2020-05-18 2021-11-18 Rheinmetall Waffe Munition Gmbh Device of a defense technology effector

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Also Published As

Publication number Publication date
IL279269B (en) 2021-12-01
WO2017168146A1 (en) 2017-10-05
KR20230083339A (en) 2023-06-09
KR20220017524A (en) 2022-02-11
EP3719440A1 (en) 2020-10-07
EP3436765A1 (en) 2019-02-06
AU2017243193B2 (en) 2023-03-16
CA3018478A1 (en) 2017-10-05
US20170299964A1 (en) 2017-10-19
GB2563770A (en) 2018-12-26
EP4235088A2 (en) 2023-08-30
EP4235088A3 (en) 2023-10-25
KR20190024871A (en) 2019-03-08
SG10202009532RA (en) 2020-11-27
AU2023202013A1 (en) 2023-05-04
GB201814538D0 (en) 2018-10-24
IL279269A (en) 2021-01-31
US9946159B2 (en) 2018-04-17
PL3436765T3 (en) 2020-11-16
US10416564B1 (en) 2019-09-17
AU2017243193A1 (en) 2018-10-04
ZA201807027B (en) 2020-12-23
IL261907A (en) 2018-10-31
EP3436765B1 (en) 2020-06-03
KR102644756B1 (en) 2024-03-06
ZA202003696B (en) 2022-04-28
KR102358492B1 (en) 2022-02-03
EP3719440B1 (en) 2023-06-07
KR102539320B1 (en) 2023-06-01
EP3719440C0 (en) 2023-06-07
PL3719440T3 (en) 2024-03-04

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