IL279269B - Method of creating a fragmentation pattern on a warhead - Google Patents
Method of creating a fragmentation pattern on a warheadInfo
- Publication number
- IL279269B IL279269B IL279269A IL27926920A IL279269B IL 279269 B IL279269 B IL 279269B IL 279269 A IL279269 A IL 279269A IL 27926920 A IL27926920 A IL 27926920A IL 279269 B IL279269 B IL 279269B
- Authority
- IL
- Israel
- Prior art keywords
- warhead
- creating
- fragmentation pattern
- fragmentation
- pattern
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B12/00—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material
- F42B12/02—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect
- F42B12/20—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type
- F42B12/22—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction
- F42B12/24—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction with grooves, recesses or other wall weakenings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
- C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
- C23C24/106—Coating with metal alloys or metal elements only
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B12/00—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material
- F42B12/02—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect
- F42B12/20—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type
- F42B12/22—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction
- F42B12/32—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect of high-explosive type with fragmentation-hull construction the hull or case comprising a plurality of discrete bodies, e.g. steel balls, embedded therein or disposed around the explosive charge
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B33/00—Manufacture of ammunition; Dismantling of ammunition; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y40/00—Auxiliary operations or equipment, e.g. for material handling
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Materials For Photolithography (AREA)
- Powder Metallurgy (AREA)
- Radar Systems Or Details Thereof (AREA)
- Dot-Matrix Printers And Others (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662314506P | 2016-03-29 | 2016-03-29 | |
US15/281,250 US9946159B2 (en) | 2016-03-29 | 2016-09-30 | Lithographic fragmentation technology |
PCT/GB2017/050878 WO2017168146A1 (en) | 2016-03-29 | 2017-03-29 | Method of creating a fragmentation pattern on a warhead |
Publications (2)
Publication Number | Publication Date |
---|---|
IL279269A IL279269A (en) | 2021-01-31 |
IL279269B true IL279269B (en) | 2021-12-01 |
Family
ID=58537034
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL261907A IL261907A (en) | 2016-03-29 | 2018-09-20 | Method of creating a fragmentation pattern on a warhead |
IL279269A IL279269B (en) | 2016-03-29 | 2020-12-07 | Method of creating a fragmentation pattern on a warhead |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL261907A IL261907A (en) | 2016-03-29 | 2018-09-20 | Method of creating a fragmentation pattern on a warhead |
Country Status (11)
Country | Link |
---|---|
US (2) | US9946159B2 (en) |
EP (3) | EP3436765B1 (en) |
KR (3) | KR102539320B1 (en) |
AU (2) | AU2017243193B2 (en) |
CA (1) | CA3018478A1 (en) |
GB (1) | GB2563770A (en) |
IL (2) | IL261907A (en) |
PL (2) | PL3719440T3 (en) |
SG (2) | SG10202009532RA (en) |
WO (1) | WO2017168146A1 (en) |
ZA (2) | ZA201807027B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3047230B1 (en) * | 2013-09-17 | 2017-08-30 | BAE Systems PLC | Method and apparatus for characterising fragmentation of an explosive device |
JP6766177B2 (en) * | 2016-01-15 | 2020-10-07 | サーブ・ボフォース・ダイナミクス・スウィツァランド・リミテッド | warhead |
CN109540965A (en) * | 2018-11-15 | 2019-03-29 | 中国工程物理研究院化工材料研究所 | Explosive fragmentation driving capability evaluating apparatus and method |
SE544060C2 (en) * | 2019-03-19 | 2021-11-30 | Bae Systems Bofors Ab | A combat member and a method of making a combat member |
KR20210084756A (en) * | 2019-12-27 | 2021-07-08 | 한국재료연구원 | Metal mold comprising porosites and preparation method thereof |
GB202003965D0 (en) * | 2020-03-19 | 2020-05-06 | Secr Defence | Casing for a fragmentation weapon, fragmentation weapon, and method of manufacture |
DE102020113411A1 (en) * | 2020-05-18 | 2021-11-18 | Rheinmetall Waffe Munition Gmbh | Device of a defense technology effector |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1303727A (en) * | 1919-05-13 | Process fob making shrapnel-shells | ||
US3000309A (en) * | 1943-01-30 | 1961-09-19 | Zapf Louis | Fragmentation projectile |
US2746848A (en) * | 1955-01-19 | 1956-05-22 | Photo Engravers Res Inc | Etching |
US4745864A (en) | 1970-12-21 | 1988-05-24 | Ltv Aerospace & Defense Company | Explosive fragmentation structure |
US3994752A (en) * | 1972-03-02 | 1976-11-30 | The United States Of America As Represented By The Secretary Of The Navy | Annealing treatment for controlling warhead fragmentation size distribution |
US5040464A (en) * | 1977-05-31 | 1991-08-20 | The United States Of America As Represented By The Secretary Of The Navy | Controlled fragmentation with fragment mix |
DE3725091A1 (en) | 1987-07-29 | 1989-02-16 | Diehl Gmbh & Co | FIRE EFFECT PROJECTILE, METHOD FOR PUTTING THE FIRE INTO THE PROJECTILE AND DEVICE FOR EXERCISING THE PROCESS |
US5070786A (en) | 1990-09-26 | 1991-12-10 | Honeywell Inc. | Standoff sensor antennae for munitions having explosively formed penetrators |
US5166471A (en) * | 1991-05-08 | 1992-11-24 | Industrial Materials Technology, Inc. | Warhead incorporating high-density particles |
FR2718843A1 (en) * | 1994-04-14 | 1995-10-20 | Sassier Pierre Henri | Manufacturing procedure for outer shell of fragmentation weapon |
US6391502B1 (en) | 1998-09-23 | 2002-05-21 | Pemstar, Inc. | Photolithographic process for producing etched patterns on the surface of fine tubes, wires or other three dimensional structures |
US6274294B1 (en) | 1999-02-03 | 2001-08-14 | Electroformed Stents, Inc. | Cylindrical photolithography exposure process and apparatus |
DE10207209A1 (en) | 2002-02-21 | 2003-09-11 | Rheinmetall W & M Gmbh | Process for producing a large-caliber explosive projectile and an explosive projectile produced by this process |
US7179079B2 (en) | 2002-07-08 | 2007-02-20 | Molecular Imprints, Inc. | Conforming template for patterning liquids disposed on substrates |
US7190387B2 (en) | 2003-09-11 | 2007-03-13 | Bright View Technologies, Inc. | Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam |
US7093542B2 (en) * | 2004-04-22 | 2006-08-22 | Lockheed Martin Corporation | Warhead with integral, direct-manufactured features |
FR2899502B1 (en) | 2006-04-06 | 2009-04-10 | Macdermid Printing Solutions E | EMBOSSING DEVICE, SUCH AS A CYLINDER OR SLEEVE |
WO2008097241A2 (en) | 2006-05-30 | 2008-08-14 | Lockheed Martin Corporation | Selectable effect warhead |
US7743707B1 (en) | 2007-01-09 | 2010-06-29 | Lockheed Martin Corporation | Fragmentation warhead with selectable radius of effects |
US8161884B1 (en) | 2007-10-22 | 2012-04-24 | The United States Of America As Represented By The Secretary Of The Army | System and method for explosively stamping a selective fragmentation pattern |
US7886667B1 (en) | 2008-10-15 | 2011-02-15 | The United States Of America As Represented By The Secretary Of The Army | More safe insensitive munition for producing a controlled fragmentation pattern |
US8272330B1 (en) * | 2010-02-22 | 2012-09-25 | The United States Of America As Represented By The Secretary Of The Army | Selectable size fragmentation warhead |
FR2961590B1 (en) * | 2010-06-16 | 2012-06-08 | Nexter Munitions | OBUS COMPRISING A FRAGMENTABLE ENVELOPE. |
US8973503B2 (en) * | 2012-07-17 | 2015-03-10 | Alliant Techsystem Inc. | Fragmentation bodies, warheads including fragmentation bodies, and related ordnance |
WO2014098836A1 (en) * | 2012-12-19 | 2014-06-26 | Halliburton Energy Services, Inc. | Charge case fragmentation control for gun survival |
-
2016
- 2016-09-30 US US15/281,250 patent/US9946159B2/en active Active
-
2017
- 2017-03-29 KR KR1020227002759A patent/KR102539320B1/en active IP Right Grant
- 2017-03-29 GB GB1814538.3A patent/GB2563770A/en not_active Withdrawn
- 2017-03-29 SG SG10202009532RA patent/SG10202009532RA/en unknown
- 2017-03-29 SG SG11201807653XA patent/SG11201807653XA/en unknown
- 2017-03-29 EP EP17716975.2A patent/EP3436765B1/en active Active
- 2017-03-29 KR KR1020237018048A patent/KR102644756B1/en active IP Right Grant
- 2017-03-29 EP EP20175822.4A patent/EP3719440B1/en active Active
- 2017-03-29 AU AU2017243193A patent/AU2017243193B2/en active Active
- 2017-03-29 PL PL20175822.4T patent/PL3719440T3/en unknown
- 2017-03-29 EP EP23177531.3A patent/EP4235088A3/en active Pending
- 2017-03-29 PL PL17716975T patent/PL3436765T3/en unknown
- 2017-03-29 KR KR1020187031132A patent/KR102358492B1/en active IP Right Grant
- 2017-03-29 CA CA3018478A patent/CA3018478A1/en active Pending
- 2017-03-29 WO PCT/GB2017/050878 patent/WO2017168146A1/en active Application Filing
-
2018
- 2018-03-13 US US15/919,501 patent/US10416564B1/en active Active
- 2018-09-20 IL IL261907A patent/IL261907A/en active IP Right Grant
- 2018-10-22 ZA ZA2018/07027A patent/ZA201807027B/en unknown
-
2020
- 2020-06-19 ZA ZA2020/03696A patent/ZA202003696B/en unknown
- 2020-12-07 IL IL279269A patent/IL279269B/en unknown
-
2023
- 2023-03-31 AU AU2023202013A patent/AU2023202013A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20230083339A (en) | 2023-06-09 |
IL261907A (en) | 2018-10-31 |
SG11201807653XA (en) | 2018-10-30 |
ZA201807027B (en) | 2020-12-23 |
US20170299964A1 (en) | 2017-10-19 |
KR102539320B1 (en) | 2023-06-01 |
PL3719440T3 (en) | 2024-03-04 |
AU2017243193A1 (en) | 2018-10-04 |
KR20220017524A (en) | 2022-02-11 |
IL279269A (en) | 2021-01-31 |
KR102358492B1 (en) | 2022-02-03 |
KR102644756B1 (en) | 2024-03-06 |
EP3719440C0 (en) | 2023-06-07 |
EP3719440B1 (en) | 2023-06-07 |
EP3436765B1 (en) | 2020-06-03 |
US10416564B1 (en) | 2019-09-17 |
EP4235088A3 (en) | 2023-10-25 |
AU2023202013A1 (en) | 2023-05-04 |
PL3436765T3 (en) | 2020-11-16 |
CA3018478A1 (en) | 2017-10-05 |
GB2563770A (en) | 2018-12-26 |
US9946159B2 (en) | 2018-04-17 |
AU2017243193B2 (en) | 2023-03-16 |
EP3436765A1 (en) | 2019-02-06 |
WO2017168146A1 (en) | 2017-10-05 |
EP4235088A2 (en) | 2023-08-30 |
KR20190024871A (en) | 2019-03-08 |
GB201814538D0 (en) | 2018-10-24 |
EP3719440A1 (en) | 2020-10-07 |
ZA202003696B (en) | 2022-04-28 |
SG10202009532RA (en) | 2020-11-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL279269A (en) | Method of creating a fragmentation pattern on a warhead | |
IL260413B1 (en) | Method of treating influenza a | |
GB2567595B (en) | Memory-guide simulated pattern recognition method | |
IL259604B (en) | Improved fragmentation projectile and method for its manufacturing | |
ZA201900928B (en) | Method and arrangement for modifying a separable projectile | |
GB201710188D0 (en) | A coating removal method | |
SG11201704385SA (en) | Warhead for generating a blast on an extended region of a target surface | |
GB201702541D0 (en) | A method of forming a component | |
GB2541208B (en) | A method of inhibiting a blast from an explosive | |
DK3658847T3 (en) | Projectile cartridge and method for producing a projectile cartridge | |
GB201710130D0 (en) | A Method of seperation | |
GB2571653B (en) | Method of design of a turbine | |
IL254658B (en) | Method of explaining a score | |
GB2559745B (en) | A forming method | |
GB201621489D0 (en) | A method of slowing down a moving projectile | |
PL3577413T3 (en) | Cumulative thermobaric warhead | |
GB201707546D0 (en) | A method | |
GB201707323D0 (en) | A method | |
GB201715086D0 (en) | Method of forming a coating | |
GB201614690D0 (en) | A method for generating a graphical character | |
GB201520273D0 (en) | Method of modifying a surface |