SG11201806627SA - Curable resin composition and fan-out wafer level package - Google Patents

Curable resin composition and fan-out wafer level package

Info

Publication number
SG11201806627SA
SG11201806627SA SG11201806627SA SG11201806627SA SG11201806627SA SG 11201806627S A SG11201806627S A SG 11201806627SA SG 11201806627S A SG11201806627S A SG 11201806627SA SG 11201806627S A SG11201806627S A SG 11201806627SA SG 11201806627S A SG11201806627S A SG 11201806627SA
Authority
SG
Singapore
Prior art keywords
resin composition
curable resin
fan
wafer level
level package
Prior art date
Application number
SG11201806627SA
Other languages
English (en)
Inventor
Chihiro Funakoshi
Kazuya Sato
Nobuhito Ito
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of SG11201806627SA publication Critical patent/SG11201806627SA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/24Crosslinking, e.g. vulcanising, of macromolecules
    • C08J3/243Two or more independent types of crosslinking for one or more polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/24Crosslinking, e.g. vulcanising, of macromolecules
    • C08J3/244Stepwise homogeneous crosslinking of one polymer with one crosslinking system, e.g. partial curing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/96Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/1026Compound semiconductors
    • H01L2924/1032III-V
    • H01L2924/10329Gallium arsenide [GaAs]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/37Effects of the manufacturing process
    • H01L2924/37001Yield

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SG11201806627SA 2016-02-17 2017-02-09 Curable resin composition and fan-out wafer level package SG11201806627SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016028046A JP5989929B1 (ja) 2016-02-17 2016-02-17 硬化性樹脂組成物
PCT/JP2017/004777 WO2017141818A1 (fr) 2016-02-17 2017-02-09 Composition de résine durcissable et groupe au niveau d'une plaquette en éventail

Publications (1)

Publication Number Publication Date
SG11201806627SA true SG11201806627SA (en) 2018-09-27

Family

ID=56871754

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201806627SA SG11201806627SA (en) 2016-02-17 2017-02-09 Curable resin composition and fan-out wafer level package

Country Status (8)

Country Link
EP (1) EP3419051A4 (fr)
JP (1) JP5989929B1 (fr)
KR (1) KR102103660B1 (fr)
CN (1) CN108701657B (fr)
MY (1) MY189981A (fr)
SG (1) SG11201806627SA (fr)
TW (1) TWI724105B (fr)
WO (1) WO2017141818A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6224188B1 (ja) * 2016-08-08 2017-11-01 太陽インキ製造株式会社 半導体封止材
WO2018181686A1 (fr) * 2017-03-29 2018-10-04 太陽インキ製造株式会社 Matériau de correction de gauchissement et procédé de fabrication de boîtier de niveau de tranche de type sortance
JP6423119B2 (ja) * 2017-03-29 2018-11-14 太陽インキ製造株式会社 反り矯正材およびファンアウト型ウェハレベルパッケージの製造方法
JP6998250B2 (ja) * 2018-03-27 2022-01-18 日本カーバイド工業株式会社 赤外線レーザ照射用樹脂組成物及び赤外線レーザ照射用樹脂フィルム
JP7137395B2 (ja) * 2018-08-07 2022-09-14 東京応化工業株式会社 積層体の製造方法、積層体、及び電子装置の製造方法
US11421316B2 (en) * 2018-10-26 2022-08-23 Applied Materials, Inc. Methods and apparatus for controlling warpage in wafer level packaging processes

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1250663C (zh) * 2001-06-25 2006-04-12 泰勒弗氏股份有限公司 具有增强粘度的各向异性导电粘合剂及使用它的粘接方法和集成电路封装件
TWI297722B (en) * 2002-03-29 2008-06-11 Telephus Inc Anisotropic conductive adhesives having enhanced viscosity and bonding methods and integrated circuit packages
JP2004099635A (ja) * 2002-09-04 2004-04-02 Taiyo Ink Mfg Ltd 光硬化性・熱硬化性樹脂組成物とその成形物、及びそれらの硬化物
JP2004253643A (ja) * 2003-02-20 2004-09-09 Lintec Corp 半導体チップの製造方法
JP2009223014A (ja) * 2008-03-17 2009-10-01 Hanna System:Kk 焦点調整装置
US20100167471A1 (en) * 2008-12-30 2010-07-01 Stmicroelectronics Asia Pacific Pte. Ltd. Reducing warpage for fan-out wafer level packaging
US9054111B2 (en) * 2009-04-07 2015-06-09 Freescale Semiconductor, Inc. Electronic device and method of packaging an electronic device
JP2010263119A (ja) * 2009-05-08 2010-11-18 Panasonic Corp 不揮発性半導体記憶装置及びその製造方法
JP2012178422A (ja) 2011-02-25 2012-09-13 Fujikura Ltd 半導体装置の製造方法及び半導体装置の製造装置並びに基板保持治具
JP6019550B2 (ja) 2011-08-09 2016-11-02 富士通株式会社 電子装置の製造方法
JP2013168615A (ja) * 2012-02-17 2013-08-29 Toppan Printing Co Ltd 半導体パッケージ基板及びその製造方法

Also Published As

Publication number Publication date
WO2017141818A1 (fr) 2017-08-24
EP3419051A4 (fr) 2019-05-29
CN108701657B (zh) 2022-05-13
JP2017147331A (ja) 2017-08-24
CN108701657A (zh) 2018-10-23
JP5989929B1 (ja) 2016-09-07
TWI724105B (zh) 2021-04-11
KR20180104306A (ko) 2018-09-20
MY189981A (en) 2022-03-22
TW201800493A (zh) 2018-01-01
EP3419051A1 (fr) 2018-12-26
KR102103660B1 (ko) 2020-04-22

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