SG11201706389UA - Sputtering target for forming magnetic thin film - Google Patents
Sputtering target for forming magnetic thin filmInfo
- Publication number
- SG11201706389UA SG11201706389UA SG11201706389UA SG11201706389UA SG11201706389UA SG 11201706389U A SG11201706389U A SG 11201706389UA SG 11201706389U A SG11201706389U A SG 11201706389UA SG 11201706389U A SG11201706389U A SG 11201706389UA SG 11201706389U A SG11201706389U A SG 11201706389UA
- Authority
- SG
- Singapore
- Prior art keywords
- thin film
- sputtering target
- magnetic thin
- forming magnetic
- forming
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/12—Metallic powder containing non-metallic particles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015031027 | 2015-02-19 | ||
PCT/JP2016/054300 WO2016133047A1 (en) | 2015-02-19 | 2016-02-15 | Sputtering target for forming magnetic thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201706389UA true SG11201706389UA (en) | 2017-09-28 |
Family
ID=56688870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201706389UA SG11201706389UA (en) | 2015-02-19 | 2016-02-15 | Sputtering target for forming magnetic thin film |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6445126B2 (en) |
CN (1) | CN108026631B (en) |
MY (1) | MY184033A (en) |
SG (1) | SG11201706389UA (en) |
WO (1) | WO2016133047A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MY192454A (en) * | 2016-11-01 | 2022-08-21 | Tanaka Precious Metal Ind | Sputtering target for magnetic recording media |
JP7072664B2 (en) * | 2018-09-25 | 2022-05-20 | Jx金属株式会社 | Sputtering target and manufacturing method of sputtering target |
CN110171972B (en) * | 2019-01-04 | 2021-10-22 | 南京汇聚新材料科技有限公司 | Low-temperature sintered ceramic material |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11158607A (en) * | 1997-11-28 | 1999-06-15 | Sumitomo Metal Mining Co Ltd | Zno sintered compact and its production |
US20060286414A1 (en) * | 2005-06-15 | 2006-12-21 | Heraeus, Inc. | Enhanced oxide-containing sputter target alloy compositions |
JP2012117147A (en) * | 2010-11-12 | 2012-06-21 | Jx Nippon Mining & Metals Corp | Sputtering target with remained cobalt oxide |
WO2014178310A1 (en) * | 2013-04-30 | 2014-11-06 | Jx日鉱日石金属株式会社 | Sintered body, and sputtering target for magnetic recording film formation use which comprises said sintered body |
-
2016
- 2016-02-15 MY MYPI2017702985A patent/MY184033A/en unknown
- 2016-02-15 JP JP2017500665A patent/JP6445126B2/en active Active
- 2016-02-15 WO PCT/JP2016/054300 patent/WO2016133047A1/en active Application Filing
- 2016-02-15 SG SG11201706389UA patent/SG11201706389UA/en unknown
- 2016-02-15 CN CN201680006176.5A patent/CN108026631B/en active Active
Also Published As
Publication number | Publication date |
---|---|
JPWO2016133047A1 (en) | 2017-11-09 |
CN108026631B (en) | 2020-02-28 |
JP6445126B2 (en) | 2018-12-26 |
MY184033A (en) | 2021-03-17 |
CN108026631A (en) | 2018-05-11 |
WO2016133047A1 (en) | 2016-08-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG11201800871SA (en) | Ferromagnetic material sputtering target | |
SG10202003396PA (en) | Biasable flux optimizer/collimator for pvd sputter chamber | |
SG11201701836YA (en) | Sputtering target for forming magnetic recording film and method for producing same | |
EP3342898A4 (en) | High purity copper sputtering target material | |
EP3376244A4 (en) | Magnetic sensor | |
EP3048184A4 (en) | Sputtering target of sintered sb-te-based alloy | |
IL246811A0 (en) | Sputtering target | |
EP3351655A4 (en) | Sputtering target material | |
SG11201704465WA (en) | Magnetic material sputtering target and method for producing same | |
IL270046B1 (en) | Superalloy sputtering target | |
EP3165632A4 (en) | Target material for sputtering and method for manufacturing same | |
SG11201700667VA (en) | Sputtering target | |
SG11201701838XA (en) | Sputtering target for magnetic recording film formation and production method therefor | |
EP3352182A4 (en) | Magnetic element | |
EP3050999A4 (en) | Sputtering target and sputtering target manufacturing method | |
SG11201710836UA (en) | Sputtering target material | |
EP3369842A4 (en) | Sputtering target and method for producing sputtering target | |
SG11201709089YA (en) | Magnetron sputtering apparatus | |
EP3187619A4 (en) | Cu-Ga SPUTTERING TARGET AND PRODUCTION METHOD FOR Cu-Ga SPUTTERING TARGET | |
EP3072990A4 (en) | Hard coating film and target for forming hard coating film | |
SG11201501365WA (en) | Sputtering target | |
SG11201706389UA (en) | Sputtering target for forming magnetic thin film | |
SG10201500333SA (en) | Sputtering Target for Magnetic Recording Medium | |
PL3172354T3 (en) | Silver-alloy based sputtering target | |
EP3351654A4 (en) | Sputtering target material |