SG11201607804TA - Supporting system for a heating element - Google Patents
Supporting system for a heating elementInfo
- Publication number
- SG11201607804TA SG11201607804TA SG11201607804TA SG11201607804TA SG11201607804TA SG 11201607804T A SG11201607804T A SG 11201607804TA SG 11201607804T A SG11201607804T A SG 11201607804TA SG 11201607804T A SG11201607804T A SG 11201607804TA SG 11201607804T A SG11201607804T A SG 11201607804TA
- Authority
- SG
- Singapore
- Prior art keywords
- heating element
- supporting system
- supporting
- heating
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M13/00—Other supports for positioning apparatus or articles; Means for steadying hand-held apparatus or articles
- F16M13/02—Other supports for positioning apparatus or articles; Means for steadying hand-held apparatus or articles for supporting on, or attaching to, an object, e.g. tree, gate, window-frame, cycle
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/06—Control, e.g. of temperature, of power
- H05B6/08—Control, e.g. of temperature, of power using compensating or balancing arrangements
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- Resistance Heating (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/247,427 US9719629B2 (en) | 2014-04-08 | 2014-04-08 | Supporting system for a heating element and heating system |
| PCT/EP2015/000144 WO2015154835A1 (en) | 2014-04-08 | 2015-01-27 | Supporting system for a heating element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201607804TA true SG11201607804TA (en) | 2016-10-28 |
Family
ID=52473857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201607804TA SG11201607804TA (en) | 2014-04-08 | 2015-01-27 | Supporting system for a heating element |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9719629B2 (enExample) |
| EP (1) | EP3130003B1 (enExample) |
| JP (1) | JP6423893B2 (enExample) |
| KR (1) | KR102276520B1 (enExample) |
| CN (1) | CN106165080B (enExample) |
| SG (1) | SG11201607804TA (enExample) |
| TW (1) | TWI623965B (enExample) |
| WO (1) | WO2015154835A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101749116B1 (ko) * | 2015-05-08 | 2017-06-20 | 엘지전자 주식회사 | 조리기기 |
| JP1581406S (enExample) * | 2016-10-14 | 2017-07-18 | ||
| USD921431S1 (en) * | 2019-04-01 | 2021-06-08 | Veeco Instruments, Inc. | Multi-filament heater assembly |
| JP1684469S (ja) * | 2020-09-24 | 2021-05-10 | 基板処理装置用天井ヒータ | |
| CN116356292B (zh) * | 2021-12-27 | 2025-07-08 | 南昌中微半导体设备有限公司 | 一种加热器组件及气相沉积设备 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11354260A (ja) * | 1998-06-11 | 1999-12-24 | Shin Etsu Chem Co Ltd | 複層セラミックスヒータ |
| JP4398064B2 (ja) * | 2000-05-12 | 2010-01-13 | 日本発條株式会社 | 加熱装置 |
| US6506252B2 (en) * | 2001-02-07 | 2003-01-14 | Emcore Corporation | Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
| WO2006060134A2 (en) * | 2004-11-15 | 2006-06-08 | Cree, Inc. | Restricted radiated heating assembly for high temperature processing |
| US7573004B1 (en) * | 2006-02-21 | 2009-08-11 | Structured Materials Inc. | Filament support arrangement for substrate heating apparatus |
| ATE463986T1 (de) * | 2007-12-18 | 2010-04-15 | Nestec Sa | Gerät zur herstellung eines getränks mit einem verstellbarem verschlussmechanismus |
| DE102009023472B4 (de) * | 2009-06-02 | 2014-10-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Beschichtungsanlage und Beschichtungsverfahren |
| KR101681897B1 (ko) * | 2009-08-07 | 2016-12-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 이중 온도 히터 |
| JP5480723B2 (ja) * | 2010-06-02 | 2014-04-23 | 助川電気工業株式会社 | 熱電子放出用フィラメントサポート |
| TWI565367B (zh) * | 2010-06-25 | 2017-01-01 | 山特維克熱傳動公司 | 用於加熱元件線圈之支撐結構 |
| US9594724B2 (en) * | 2012-08-09 | 2017-03-14 | International Business Machines Corporation | Vector register file |
-
2014
- 2014-04-08 US US14/247,427 patent/US9719629B2/en active Active
-
2015
- 2015-01-21 TW TW104101883A patent/TWI623965B/zh active
- 2015-01-27 CN CN201580018462.9A patent/CN106165080B/zh active Active
- 2015-01-27 JP JP2016560655A patent/JP6423893B2/ja active Active
- 2015-01-27 KR KR1020167026884A patent/KR102276520B1/ko active Active
- 2015-01-27 SG SG11201607804TA patent/SG11201607804TA/en unknown
- 2015-01-27 EP EP15704707.7A patent/EP3130003B1/en active Active
- 2015-01-27 WO PCT/EP2015/000144 patent/WO2015154835A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US9719629B2 (en) | 2017-08-01 |
| KR102276520B1 (ko) | 2021-07-13 |
| JP6423893B2 (ja) | 2018-11-14 |
| EP3130003B1 (en) | 2018-05-02 |
| JP2017516297A (ja) | 2017-06-15 |
| KR20160141722A (ko) | 2016-12-09 |
| CN106165080B (zh) | 2019-04-23 |
| US20150289319A1 (en) | 2015-10-08 |
| TW201539530A (zh) | 2015-10-16 |
| EP3130003A1 (en) | 2017-02-15 |
| WO2015154835A1 (en) | 2015-10-15 |
| CN106165080A (zh) | 2016-11-23 |
| TWI623965B (zh) | 2018-05-11 |
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