SG11201606279YA - Method for manufacturing pad conditioner and pad conditioner - Google Patents

Method for manufacturing pad conditioner and pad conditioner

Info

Publication number
SG11201606279YA
SG11201606279YA SG11201606279YA SG11201606279YA SG11201606279YA SG 11201606279Y A SG11201606279Y A SG 11201606279YA SG 11201606279Y A SG11201606279Y A SG 11201606279YA SG 11201606279Y A SG11201606279Y A SG 11201606279YA SG 11201606279Y A SG11201606279Y A SG 11201606279YA
Authority
SG
Singapore
Prior art keywords
pad conditioner
manufacturing
conditioner
pad
manufacturing pad
Prior art date
Application number
SG11201606279YA
Other languages
English (en)
Inventor
Wan-Jae Kwon
Young-Pil Kwon
Tai-Kyung Kim
Jung-Hyun Yang
Sang-Ho Lee
Original Assignee
Saesol Diamond Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saesol Diamond Ind Co Ltd filed Critical Saesol Diamond Ind Co Ltd
Publication of SG11201606279YA publication Critical patent/SG11201606279YA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
SG11201606279YA 2014-03-25 2014-11-11 Method for manufacturing pad conditioner and pad conditioner SG11201606279YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140034834A KR101558449B1 (ko) 2014-03-25 2014-03-25 패드 컨디셔너 제조방법 및 패드 컨디셔너
PCT/KR2014/010798 WO2015147401A1 (ko) 2014-03-25 2014-11-11 패드 컨디셔너 제조방법 및 패드 컨디셔너

Publications (1)

Publication Number Publication Date
SG11201606279YA true SG11201606279YA (en) 2016-09-29

Family

ID=54195877

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201606279YA SG11201606279YA (en) 2014-03-25 2014-11-11 Method for manufacturing pad conditioner and pad conditioner

Country Status (5)

Country Link
KR (1) KR101558449B1 (ko)
CN (1) CN105940484B (ko)
MY (1) MY187700A (ko)
SG (1) SG11201606279YA (ko)
WO (1) WO2015147401A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107336148A (zh) * 2017-08-01 2017-11-10 华侨大学 一种快速制备磨粒图案分布磨盘的方法
CN107336150A (zh) * 2017-08-01 2017-11-10 华侨大学 一种沉积制备磨粒图案分布磨盘的方法
KR102013386B1 (ko) * 2018-01-29 2019-08-22 새솔다이아몬드공업 주식회사 역도금 패드 컨디셔너 제조방법 및 패드 컨디셔너
CN112189062A (zh) 2018-05-22 2021-01-05 帝国离子株式会社 耐磨损性涂膜、耐磨损性构件及耐磨损性涂膜的制造方法以及滑动机构

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100508300B1 (ko) * 2003-05-06 2005-08-17 (주)디디다이아 세라믹 물질을 사용하여 화학기계적 연마 패드 콘디셔너를제조하는 방법 및 그에 의해 제조된 화학기계적 연마 패드콘디셔너
JP2007260886A (ja) * 2006-03-30 2007-10-11 Mitsubishi Materials Corp Cmpコンディショナおよびその製造方法
KR20090078647A (ko) * 2008-01-15 2009-07-20 이화다이아몬드공업 주식회사 Cmp 패드용 컨디셔너
KR20110124988A (ko) * 2010-05-12 2011-11-18 신한다이아몬드공업 주식회사 Cmp 패드 컨디셔너 및 그 제조방법
KR101178849B1 (ko) * 2010-07-30 2012-08-31 신한다이아몬드공업 주식회사 Cmp 패드 컨디셔너 및 그 제조방법
JP6014835B2 (ja) * 2011-12-14 2016-10-26 帝国イオン株式会社 Cmpパッドコンディショナおよび当該cmpパッドコンディショナの製造方法

Also Published As

Publication number Publication date
CN105940484B (zh) 2018-10-16
WO2015147401A1 (ko) 2015-10-01
KR101558449B1 (ko) 2015-10-07
CN105940484A (zh) 2016-09-14
MY187700A (en) 2021-10-12
KR20150111202A (ko) 2015-10-05

Similar Documents

Publication Publication Date Title
HK1245613A1 (zh) 多重擊發的固定裝置及其使用和製造方法
SG10201502022QA (en) Polishing device and polishing method
TWI560939B (en) Mobile device and manufacturing method thereof
GB2524060B (en) Controller and method
HRP20181703T1 (hr) Odjevni predmet i postupak proizvodnje
SG11201609296XA (en) Polishing pad and method for manufacturing the same
HK1221204A1 (zh) 包裝體及其製造方法
GB201420886D0 (en) Manufacturing method and manufacturing apparatus
SG11201702215RA (en) Polishing composition, method for manufacturing same, and polishing method
PT2980420T (pt) Montagem de painel com inserto e método
GB201501258D0 (en) Controller and method
SG11201608128UA (en) Polishing composition and polishing method
GB201416223D0 (en) Manufacturing method
EP3235404A4 (en) Seat pad and method for manufacturing seat pad
HK1208301A2 (en) Mask and manufacturing method thereof
SG10201502903WA (en) Integrated Demand Control Method And Integrated Demand Control Device
SG11201703396YA (en) Polishing device and polishing method
SG11201610209PA (en) Multi-tube manufacturing device and method for manufacturing multi-tube using same
ZA201702630B (en) Catheter and manufacturing method therefor
HK1254829B (zh) 元件製造方法
TWI562884B (en) Manufacturing method and manufacturing system
IL246870B (en) Method for preparing 1-alkyl-3-difluoromethyl-5-fluoro-1h-pyrazole-4-carbaldehydes and 1-alkyl-3-difluoromethyl-5-fluoro-1h-pyrazole-4-carboxylates
SG11201606279YA (en) Method for manufacturing pad conditioner and pad conditioner
PL3265709T3 (pl) Kanał i sposób jego wytwarzania
HK1220676A1 (zh) 配置件和方法