SG11201603475RA - Low contact imprint lithography template chuck system for improved overlay correction - Google Patents

Low contact imprint lithography template chuck system for improved overlay correction

Info

Publication number
SG11201603475RA
SG11201603475RA SG11201603475RA SG11201603475RA SG11201603475RA SG 11201603475R A SG11201603475R A SG 11201603475RA SG 11201603475R A SG11201603475R A SG 11201603475RA SG 11201603475R A SG11201603475R A SG 11201603475RA SG 11201603475R A SG11201603475R A SG 11201603475RA
Authority
SG
Singapore
Prior art keywords
low contact
imprint lithography
lithography template
chuck system
overlay correction
Prior art date
Application number
SG11201603475RA
Other languages
English (en)
Inventor
Mario Johannes Meissl
Anshuman Cherala
Byung-Jin Choi
Seth J Bamesberger
Original Assignee
Canon Nanotechnologies Inc
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Nanotechnologies Inc, Toshiba Corp filed Critical Canon Nanotechnologies Inc
Publication of SG11201603475RA publication Critical patent/SG11201603475RA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
SG11201603475RA 2013-11-08 2014-11-07 Low contact imprint lithography template chuck system for improved overlay correction SG11201603475RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361901549P 2013-11-08 2013-11-08
PCT/US2014/064611 WO2015070054A1 (en) 2013-11-08 2014-11-07 Low contact imprint lithography template chuck system for improved overlay correction

Publications (1)

Publication Number Publication Date
SG11201603475RA true SG11201603475RA (en) 2016-05-30

Family

ID=51947511

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201603475RA SG11201603475RA (en) 2013-11-08 2014-11-07 Low contact imprint lithography template chuck system for improved overlay correction

Country Status (8)

Country Link
US (1) US9778578B2 (zh)
EP (1) EP3066524A1 (zh)
JP (1) JP6526653B2 (zh)
KR (1) KR102294035B1 (zh)
CN (1) CN105934711B (zh)
SG (1) SG11201603475RA (zh)
TW (1) TWI665513B (zh)
WO (1) WO2015070054A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6333031B2 (ja) * 2014-04-09 2018-05-30 キヤノン株式会社 インプリント装置および物品の製造方法
US10578984B2 (en) 2016-12-20 2020-03-03 Canon Kabushiki Kaisha Adaptive chucking system
JP7134725B2 (ja) * 2018-06-11 2022-09-12 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置、および物品の製造方法
NL2023022B1 (en) * 2019-04-29 2020-11-05 Suss Microtec Lithography Gmbh Replication device and method for reproducing a structure on a substrate
US11776840B2 (en) 2019-10-29 2023-10-03 Canon Kabushiki Kaisha Superstrate chuck, method of use, and method of manufacturing an article
WO2023285139A1 (en) * 2021-07-13 2023-01-19 Asml Netherlands B.V. Lithography system, substrate sag compensator, and method

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US20080213418A1 (en) * 2000-07-18 2008-09-04 Hua Tan Align-transfer-imprint system for imprint lithogrphy
TWI230844B (en) * 2002-06-07 2005-04-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
KR101056505B1 (ko) * 2002-11-13 2011-08-11 몰레큘러 임프린츠 인코퍼레이티드 기판의 형상을 조절하기 위한 척킹 시스템 및 방법
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7198276B2 (en) * 2003-10-24 2007-04-03 International Business Machines Corporation Adaptive electrostatic pin chuck
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7504268B2 (en) * 2004-05-28 2009-03-17 Board Of Regents, The University Of Texas System Adaptive shape substrate support method
EP1769102A2 (en) 2004-05-28 2007-04-04 Board of Regents, The University Of Texas System Substrate support system and method
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US7768624B2 (en) 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
US9164375B2 (en) 2009-06-19 2015-10-20 Canon Nanotechnologies, Inc. Dual zone template chuck
US8913230B2 (en) * 2009-07-02 2014-12-16 Canon Nanotechnologies, Inc. Chucking system with recessed support feature
US9864279B2 (en) * 2010-08-05 2018-01-09 Asml Netherlands B.V. Imprint lithography
JP5930622B2 (ja) * 2010-10-08 2016-06-08 キヤノン株式会社 インプリント装置、及び、物品の製造方法
US9746787B2 (en) * 2011-02-22 2017-08-29 Nikon Corporation Holding apparatus, exposure apparatus and manufacturing method of device

Also Published As

Publication number Publication date
JP6526653B2 (ja) 2019-06-05
US9778578B2 (en) 2017-10-03
KR102294035B1 (ko) 2021-08-27
JP2016539499A (ja) 2016-12-15
TW201527871A (zh) 2015-07-16
EP3066524A1 (en) 2016-09-14
TWI665513B (zh) 2019-07-11
KR20160084417A (ko) 2016-07-13
CN105934711A (zh) 2016-09-07
US20150131072A1 (en) 2015-05-14
WO2015070054A1 (en) 2015-05-14
CN105934711B (zh) 2019-10-25

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