SG11201601261SA - Etching method - Google Patents

Etching method

Info

Publication number
SG11201601261SA
SG11201601261SA SG11201601261SA SG11201601261SA SG11201601261SA SG 11201601261S A SG11201601261S A SG 11201601261SA SG 11201601261S A SG11201601261S A SG 11201601261SA SG 11201601261S A SG11201601261S A SG 11201601261SA SG 11201601261S A SG11201601261S A SG 11201601261SA
Authority
SG
Singapore
Prior art keywords
etching method
etching
Prior art date
Application number
SG11201601261SA
Other languages
English (en)
Inventor
Toshikatsu Tobana
Fumiko Yamashita
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of SG11201601261SA publication Critical patent/SG11201601261SA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31144—Etching the insulating layers by chemical or physical means using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • H01L21/31138—Etching organic layers by chemical means by dry-etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
SG11201601261SA 2013-09-19 2014-09-02 Etching method SG11201601261SA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013194285 2013-09-19
JP2014020628A JP2015084396A (ja) 2013-09-19 2014-02-05 エッチング方法
PCT/JP2014/073042 WO2015041043A1 (ja) 2013-09-19 2014-09-02 エッチング方法

Publications (1)

Publication Number Publication Date
SG11201601261SA true SG11201601261SA (en) 2016-04-28

Family

ID=52688697

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601261SA SG11201601261SA (en) 2013-09-19 2014-09-02 Etching method

Country Status (8)

Country Link
US (1) US20160203998A1 (zh)
EP (1) EP3048638A4 (zh)
JP (1) JP2015084396A (zh)
KR (1) KR20160055788A (zh)
CN (1) CN105474368A (zh)
SG (1) SG11201601261SA (zh)
TW (1) TW201522205A (zh)
WO (1) WO2015041043A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6643875B2 (ja) * 2015-11-26 2020-02-12 東京エレクトロン株式会社 エッチング方法
US9978563B2 (en) * 2016-01-27 2018-05-22 Tokyo Electron Limited Plasma treatment method to meet line edge roughness and other integration objectives
JP6763750B2 (ja) * 2016-11-07 2020-09-30 東京エレクトロン株式会社 被処理体を処理する方法
JP7022651B2 (ja) * 2018-05-28 2022-02-18 東京エレクトロン株式会社 膜をエッチングする方法及びプラズマ処理装置
TWI812762B (zh) * 2018-07-30 2023-08-21 日商東京威力科創股份有限公司 處理被處理體之方法、處理裝置及處理系統
JP7220603B2 (ja) * 2019-03-20 2023-02-10 東京エレクトロン株式会社 膜をエッチングする方法及びプラズマ処理装置
JP2022536631A (ja) * 2019-06-04 2022-08-18 ラム リサーチ コーポレーション パターニングにおける反応性イオンエッチングのための重合保護層

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3940546B2 (ja) * 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
JP3883470B2 (ja) * 2002-05-14 2007-02-21 沖電気工業株式会社 半導体装置の製造方法
JP3946724B2 (ja) * 2004-01-29 2007-07-18 シャープ株式会社 半導体装置の製造方法
US7347953B2 (en) 2006-02-02 2008-03-25 International Business Machines Corporation Methods for forming improved self-assembled patterns of block copolymers
US8877073B2 (en) * 2008-10-27 2014-11-04 Canon Nanotechnologies, Inc. Imprint lithography template
US8114306B2 (en) 2009-05-22 2012-02-14 International Business Machines Corporation Method of forming sub-lithographic features using directed self-assembly of polymers
WO2011036778A1 (ja) * 2009-09-25 2011-03-31 株式会社 東芝 パターン形成方法
US9666414B2 (en) * 2011-10-27 2017-05-30 Applied Materials, Inc. Process chamber for etching low k and other dielectric films
EP2608247A1 (en) * 2011-12-21 2013-06-26 Imec EUV photoresist encapsulation
JP5894445B2 (ja) * 2012-01-23 2016-03-30 東京エレクトロン株式会社 エッチング方法及びエッチング装置
JP5802233B2 (ja) * 2013-03-27 2015-10-28 株式会社東芝 パターン形成方法

Also Published As

Publication number Publication date
CN105474368A (zh) 2016-04-06
JP2015084396A (ja) 2015-04-30
EP3048638A1 (en) 2016-07-27
US20160203998A1 (en) 2016-07-14
WO2015041043A1 (ja) 2015-03-26
EP3048638A4 (en) 2017-05-03
KR20160055788A (ko) 2016-05-18
TW201522205A (zh) 2015-06-16

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