SG11201506961YA - System and method for protection of vacuum seals in plasma processing systems - Google Patents
System and method for protection of vacuum seals in plasma processing systemsInfo
- Publication number
- SG11201506961YA SG11201506961YA SG11201506961YA SG11201506961YA SG11201506961YA SG 11201506961Y A SG11201506961Y A SG 11201506961YA SG 11201506961Y A SG11201506961Y A SG 11201506961YA SG 11201506961Y A SG11201506961Y A SG 11201506961YA SG 11201506961Y A SG11201506961Y A SG 11201506961YA
- Authority
- SG
- Singapore
- Prior art keywords
- protection
- plasma processing
- processing systems
- vacuum seals
- seals
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/16—Vessels
- H01J2237/166—Sealing means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361821326P | 2013-05-09 | 2013-05-09 | |
| PCT/US2014/037415 WO2014182981A1 (en) | 2013-05-09 | 2014-05-09 | System and method for protection of vacuum seals in plasma processing systems |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201506961YA true SG11201506961YA (en) | 2015-11-27 |
Family
ID=51867760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201506961YA SG11201506961YA (en) | 2013-05-09 | 2014-05-09 | System and method for protection of vacuum seals in plasma processing systems |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10049858B2 (en) |
| JP (1) | JP6440689B2 (en) |
| KR (1) | KR101829716B1 (en) |
| CN (1) | CN105190837B (en) |
| SG (1) | SG11201506961YA (en) |
| TW (1) | TWI628689B (en) |
| WO (1) | WO2014182981A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102293092B1 (en) * | 2013-11-12 | 2021-08-23 | 도쿄엘렉트론가부시키가이샤 | Plasma processing apparatus |
| CN104733273B (en) * | 2013-12-18 | 2017-06-06 | 北京北方微电子基地设备工艺研究中心有限责任公司 | A kind of reaction chamber and plasma processing device |
| KR20160128762A (en) * | 2015-04-29 | 2016-11-08 | 주식회사 테라세미콘 | Sealing member |
| JP6524531B2 (en) * | 2015-12-17 | 2019-06-05 | パナソニックＩｐマネジメント株式会社 | Plasma processing apparatus and plasma processing method |
| JP6683575B2 (en) * | 2016-09-01 | 2020-04-22 | 東京エレクトロン株式会社 | Plasma processing device |
| US11189464B2 (en) * | 2019-07-17 | 2021-11-30 | Beijing E-town Semiconductor Technology Co., Ltd. | Variable mode plasma chamber utilizing tunable plasma potential |
| KR102116475B1 (en) * | 2020-02-24 | 2020-05-28 | 피에스케이 주식회사 | Sealing reinforcement member and apparatus for treating substrate |
| KR20230106869A (en) * | 2022-01-07 | 2023-07-14 | 피에스케이 주식회사 | Substrate processing apparatus |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2067762A5 (en) * | 1969-11-15 | 1971-08-20 | Queroy Ets | |
| US3741022A (en) * | 1970-11-23 | 1973-06-26 | J Olson | Probing device for microcircuits |
| BR5701149U (en) * | 1977-09-16 | 1978-03-07 | P Negrao | ATTENUATOR |
| JPS5837682A (en) | 1981-08-29 | 1983-03-04 | 株式会社島津製作所 | Contour plotter |
| JPS5837682U (en) * | 1981-09-07 | 1983-03-11 | ソニー株式会社 | stereo plug adapter |
| JP3007432B2 (en) * | 1991-02-19 | 2000-02-07 | 東京エレクトロン株式会社 | Heat treatment equipment |
| US6308654B1 (en) * | 1996-10-18 | 2001-10-30 | Applied Materials, Inc. | Inductively coupled parallel-plate plasma reactor with a conical dome |
| US5964468A (en) * | 1997-01-14 | 1999-10-12 | Garlock Inc | Anti-buckling spiral wound gasket |
| US6163007A (en) | 1999-03-19 | 2000-12-19 | Applied Materials, Inc. | Microwave plasma generating apparatus with improved heat protection of sealing O-rings |
| US6772827B2 (en) * | 2000-01-20 | 2004-08-10 | Applied Materials, Inc. | Suspended gas distribution manifold for plasma chamber |
| JP2001217097A (en) | 2000-02-02 | 2001-08-10 | Toshiba Corp | High-frequency plasma device |
| JP3698960B2 (en) * | 2000-06-09 | 2005-09-21 | 三菱電機株式会社 | Insulation structure of optical submarine repeater cable introduction device |
| JP2002164685A (en) | 2000-11-29 | 2002-06-07 | Matsushita Electric Ind Co Ltd | Vacuum processing system and electromagnetic shield unit and inclination coil spring |
| WO2004021392A1 (en) * | 2002-08-30 | 2004-03-11 | Axcelis Technologies, Inc. | Gas tube end cap for a microwave plasma generator |
| JP4268798B2 (en) * | 2002-12-02 | 2009-05-27 | アプライド マテリアルズ インコーポレイテッド | Seal member and plasma processing apparatus |
| JP4563760B2 (en) * | 2004-09-24 | 2010-10-13 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
| US20060236931A1 (en) * | 2005-04-25 | 2006-10-26 | Varian Semiconductor Equipment Associates, Inc. | Tilted Plasma Doping |
| US20070012251A1 (en) * | 2005-07-07 | 2007-01-18 | Martin Zucker | Seal arrangement with corrosion barrier and method |
| JP2010023894A (en) | 2008-07-23 | 2010-02-04 | N Tech:Kk | Bag opening device and method for container inner bag |
| US8236706B2 (en) | 2008-12-12 | 2012-08-07 | Mattson Technology, Inc. | Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures |
| JP2010238944A (en) * | 2009-03-31 | 2010-10-21 | Panasonic Corp | Plasma processing device |
| JP5582819B2 (en) * | 2010-02-24 | 2014-09-03 | 東京エレクトロン株式会社 | Processing equipment |
| WO2011125704A1 (en) * | 2010-03-31 | 2011-10-13 | 東京エレクトロン株式会社 | Plasma processing device and plasma processing method |
-
2014
- 2014-05-08 TW TW103116358A patent/TWI628689B/en active
- 2014-05-09 WO PCT/US2014/037415 patent/WO2014182981A1/en active Application Filing
- 2014-05-09 CN CN201480025553.0A patent/CN105190837B/en active Active
- 2014-05-09 JP JP2016513098A patent/JP6440689B2/en not_active Expired - Fee Related
- 2014-05-09 SG SG11201506961YA patent/SG11201506961YA/en unknown
- 2014-05-09 KR KR1020157029909A patent/KR101829716B1/en active IP Right Grant
- 2014-05-09 US US14/771,525 patent/US10049858B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105190837B (en) | 2018-03-06 |
| US20160013025A1 (en) | 2016-01-14 |
| TWI628689B (en) | 2018-07-01 |
| JP2016524787A (en) | 2016-08-18 |
| CN105190837A (en) | 2015-12-23 |
| WO2014182981A1 (en) | 2014-11-13 |
| TW201513163A (en) | 2015-04-01 |
| KR101829716B1 (en) | 2018-02-19 |
| KR20150131367A (en) | 2015-11-24 |
| US10049858B2 (en) | 2018-08-14 |
| JP6440689B2 (en) | 2018-12-19 |
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