SG11201503261TA - Position measurement system, grating for a position measurement system and method - Google Patents

Position measurement system, grating for a position measurement system and method

Info

Publication number
SG11201503261TA
SG11201503261TA SG11201503261TA SG11201503261TA SG11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA
Authority
SG
Singapore
Prior art keywords
measurement system
position measurement
grating
measurement
Prior art date
Application number
SG11201503261TA
Other languages
English (en)
Inventor
Willem Herman Gertruda Anna Koenen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG11201503261TA publication Critical patent/SG11201503261TA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
    • G01D5/34776—Absolute encoders with analogue or digital scales
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D2205/00—Indexing scheme relating to details of means for transferring or converting the output of a sensing member
    • G01D2205/90—Two-dimensional encoders, i.e. having one or two codes extending in two directions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optical Transform (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG11201503261TA 2012-11-19 2013-11-08 Position measurement system, grating for a position measurement system and method SG11201503261TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261728071P 2012-11-19 2012-11-19
PCT/EP2013/073392 WO2014076009A2 (en) 2012-11-19 2013-11-08 Position measurement system, grating for a position measurement system and method

Publications (1)

Publication Number Publication Date
SG11201503261TA true SG11201503261TA (en) 2015-05-28

Family

ID=49554262

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201503261TA SG11201503261TA (en) 2012-11-19 2013-11-08 Position measurement system, grating for a position measurement system and method

Country Status (9)

Country Link
US (1) US9651877B2 (zh)
EP (1) EP2920649B1 (zh)
JP (1) JP6080970B2 (zh)
KR (1) KR20150087360A (zh)
CN (1) CN104797983B (zh)
NL (1) NL2011766A (zh)
SG (1) SG11201503261TA (zh)
TW (1) TWI519906B (zh)
WO (1) WO2014076009A2 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111948912A (zh) 2015-02-23 2020-11-17 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
WO2016136690A1 (ja) 2015-02-23 2016-09-01 株式会社ニコン 計測装置、リソグラフィシステム及び露光装置、並びに管理方法、重ね合わせ計測方法及びデバイス製造方法
KR102552792B1 (ko) 2015-02-23 2023-07-06 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법
CN105371881B (zh) * 2015-11-22 2017-07-28 长春禹衡光学有限公司 一种一体化安装的分体式编码器
US10243668B2 (en) 2016-04-27 2019-03-26 Industrial Technology Research Institute Positioning measurement device and the method thereof
EP3586189B1 (en) * 2017-02-23 2024-01-10 Nikon Corporation Measurement of a change in a geometrical characteristic and/or position of a workpiece
CN107993722B (zh) * 2017-12-05 2021-12-07 天津大学 一种针对点阵光源下光子在媒质中分布的快速提取方法
US10768361B1 (en) * 2018-08-03 2020-09-08 Facebook Technologies, Llc System for monitoring grating formation

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5204524A (en) 1991-03-22 1993-04-20 Mitutoyo Corporation Two-dimensional optical encoder with three gratings in each dimension
JP2818800B2 (ja) 1994-02-23 1998-10-30 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング 位置に依存する信号を発生する装置
JPH08191043A (ja) 1995-01-11 1996-07-23 Nikon Corp アライメント方法及び該方法で使用される露光装置
US6031951A (en) * 1998-04-24 2000-02-29 Rose Research, L.L.C. Transmission-mode optical coupling mechanism and method of manufacturing the same
US6922287B2 (en) * 2001-10-12 2005-07-26 Unaxis Balzers Aktiengesellschaft Light coupling element
US6781694B2 (en) * 2002-07-16 2004-08-24 Mitutoyo Corporation Two-dimensional scale structures and method usable in an absolute position transducer
US7348574B2 (en) * 2005-09-02 2008-03-25 Asml Netherlands, B.V. Position measurement system and lithographic apparatus
US7483120B2 (en) 2006-05-09 2009-01-27 Asml Netherlands B.V. Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
WO2008072502A1 (ja) 2006-12-08 2008-06-19 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
DE102007023300A1 (de) 2007-05-16 2008-11-20 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung und Anordnung derselben
CN100587608C (zh) * 2007-07-24 2010-02-03 上海微电子装备有限公司 一种用于光刻设备的对准系统
CN101149564B (zh) * 2007-09-04 2010-05-19 上海微电子装备有限公司 一种对准标记和对其成像的光学系统以及成像方法
NL1036080A1 (nl) * 2007-11-01 2009-05-07 Asml Netherlands Bv Position measurement system and Lithographic Apparatus.
CN101251724B (zh) * 2008-03-31 2010-09-15 上海微电子装备有限公司 一种用于光刻装置的对准系统、对准方法和光刻装置
JP2009281946A (ja) 2008-05-23 2009-12-03 Nikon Corp 位置計測装置及び位置計測方法、パターン形成装置及びパターン形成方法、露光装置及び露光方法、並びにデバイス製造方法
CN101329514B (zh) * 2008-07-29 2011-06-29 上海微电子装备有限公司 一种用于光刻设备的对准系统及对准方法
CN101551593A (zh) * 2009-04-24 2009-10-07 上海微电子装备有限公司 用于光刻装置的对准系统、光刻装置及其对准方法
JP2011054694A (ja) 2009-08-31 2011-03-17 Canon Inc 計測装置、露光装置およびデバイス製造方法
JP2011127981A (ja) 2009-12-16 2011-06-30 Canon Inc 変位測定装置、ステージ装置、露光装置、スケール製造方法、及びデバイス製造方法
WO2012022584A1 (en) 2010-08-18 2012-02-23 Asml Netherlands B.V. Substrate for use in metrology, metrology method and device manufacturing method
JP6118030B2 (ja) 2011-04-05 2017-04-19 キヤノン株式会社 測定装置、露光装置及びデバイスの製造方法
JP5755009B2 (ja) 2011-04-14 2015-07-29 キヤノン株式会社 エンコーダ
WO2013073538A1 (ja) 2011-11-17 2013-05-23 株式会社ニコン エンコーダ装置、移動量計測方法、光学装置、並びに露光方法及び装置

Also Published As

Publication number Publication date
NL2011766A (en) 2014-05-21
US9651877B2 (en) 2017-05-16
TW201428430A (zh) 2014-07-16
WO2014076009A2 (en) 2014-05-22
EP2920649A2 (en) 2015-09-23
JP2016505812A (ja) 2016-02-25
KR20150087360A (ko) 2015-07-29
TWI519906B (zh) 2016-02-01
JP6080970B2 (ja) 2017-02-15
EP2920649B1 (en) 2023-03-29
CN104797983B (zh) 2017-03-08
CN104797983A (zh) 2015-07-22
WO2014076009A3 (en) 2014-07-17
US20150316856A1 (en) 2015-11-05

Similar Documents

Publication Publication Date Title
IL239310A0 (en) Method and system for measuring vertical wind component
HK1207274A1 (zh) 營養保健品調配系統及其方法
GB2518060B (en) Position monitoring system and method
GB2505324B (en) A monitoring system
HK1206432A1 (zh) 確定阻塞件位置的組合體和方法
EP2904415A4 (en) METHOD AND SYSTEM FOR POSITION ESTIMATION
GB2521959B (en) Measurement system
EP2817735A4 (en) SYSTEM AND METHOD FOR CONTEXT DETERMINATION
IL237045B (en) System and method for reduced additive spectral clustering
EP2850441A4 (en) EVALUATION METHOD FOR PHOTOVOLTAIC ELEMENT, MEASURING SYSTEM CONFIGURATION AND METHOD FOR USING A MEASUREMENT SYSTEM CONFIGURATION
EP2720015A4 (en) MEASURING DEVICE, MEASURING SYSTEM, MEASURING POSITIONING APPARATUS, AND MEASURING POSITIONALIZATION PROGRAM
PL2693127T3 (pl) System posiadający urządzenie pomiarowe
EP2852132A4 (en) MEASURING DEVICE, MEASURING SYSTEM AND MEASURING PROCEDURE
SG11201503261TA (en) Position measurement system, grating for a position measurement system and method
RS58850B1 (sr) Postupak i sistem za nadgledanje životne okoline
EP2807381A4 (en) BINDING ELEMENT AND ASSOCIATED BINDING METHOD
SG2013075700A (en) Methods and systems for monitoring a petroleumreservoir
EP2882596A4 (en) METHOD AND SYSTEMS FOR DETERMINING A PRESSURE POSITION
GB2507612B (en) Probe for a cryogenic system
GB201121660D0 (en) Measurement method using a sensor, sensor system and sensor
EP2693941A4 (en) DEVICE, SYSTEM AND METHOD FOR MEASURING ALCOHOLEMIA
EP2800924A4 (en) SYSTEM AND METHOD FOR RELUBRICHING A MACHINE ELEMENT
EP2778629A4 (en) METHOD AND DEVICE FOR DETECTING CODE CHANGE
SG2012082020A (en) A system and method for tracking
EP2851884A4 (en) MEASURING SYSTEM