SG11201501811PA - A CHAMBER CLEANING METHOD USING F<sb>2</sb> AND A PROCESS FOR MANUFACTURE OF F<sb>2</sb> FOR THIS METHOD - Google Patents
A CHAMBER CLEANING METHOD USING F<sb>2</sb> AND A PROCESS FOR MANUFACTURE OF F<sb>2</sb> FOR THIS METHODInfo
- Publication number
- SG11201501811PA SG11201501811PA SG11201501811PA SG11201501811PA SG11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA
- Authority
- SG
- Singapore
- Prior art keywords
- manufacture
- chamber cleaning
- cleaning method
- chamber
- cleaning
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Secondary Cells (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12183649 | 2012-09-10 | ||
PCT/EP2013/068437 WO2014037485A1 (en) | 2012-09-10 | 2013-09-06 | A chamber cleaning method using f2 and a process for manufacture of f2 for this method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201501811PA true SG11201501811PA (en) | 2015-04-29 |
Family
ID=46851839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201501811PA SG11201501811PA (en) | 2012-09-10 | 2013-09-06 | A CHAMBER CLEANING METHOD USING F<sb>2</sb> AND A PROCESS FOR MANUFACTURE OF F<sb>2</sb> FOR THIS METHOD |
Country Status (7)
Country | Link |
---|---|
US (2) | US9757775B2 (zh) |
JP (1) | JP2015534722A (zh) |
KR (1) | KR20150053782A (zh) |
CN (1) | CN104769153A (zh) |
SG (1) | SG11201501811PA (zh) |
TW (1) | TW201430175A (zh) |
WO (1) | WO2014037485A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130023126A1 (en) * | 2010-04-08 | 2013-01-24 | Solvay Sa | Method for the manufacture of electronic devices with purified fluorine |
EP3095893A1 (en) | 2015-05-22 | 2016-11-23 | Solvay SA | A process for etching and chamber cleaning and a gas therefor |
CN109326505B (zh) * | 2018-08-27 | 2021-12-03 | 上海中欣晶圆半导体科技有限公司 | 一种提高硅片最终清洗金属程度的方法及装置 |
RU2691350C1 (ru) * | 2018-09-19 | 2019-06-11 | Общество с ограниченной ответственностью "ПКФ Альянс" | Способ очистки поверхностей деталей машин и газовыхлопных трактов от нагара |
EP3905309A4 (en) * | 2018-12-25 | 2022-03-16 | Showa Denko K.K. | DEPOSIT REMOVAL METHOD AND FILM FORMATION METHOD |
WO2024054652A2 (en) * | 2022-09-09 | 2024-03-14 | Phoenix Tailings, Inc. | Systems and methods for recovery of substances from molten salt electrolysis |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2746448B2 (ja) * | 1990-02-07 | 1998-05-06 | セントラル硝子株式会社 | 混合ガス組成物 |
DE4135917C2 (de) | 1991-10-31 | 1998-07-16 | Solvay Fluor & Derivate | Verfahren zur Abtrennung von organischen Kohlenstoffverbindungen aus Fluorwasserstoff |
DE4135918A1 (de) | 1991-10-31 | 1993-05-06 | Solvay Fluor Und Derivate Gmbh, 3000 Hannover, De | Herstellung von hochreinem fluorwasserstoff |
US5414054A (en) * | 1994-06-01 | 1995-05-09 | Miles Inc. | Copolycarbonate having improved low-temperature impact strength |
GB9418598D0 (en) * | 1994-09-14 | 1994-11-02 | British Nuclear Fuels Plc | Fluorine cell |
GB9904925D0 (en) | 1999-03-04 | 1999-04-28 | Surface Tech Sys Ltd | Gas delivery system |
JP2003190762A (ja) * | 2001-12-27 | 2003-07-08 | L'air Liquide Sa Pour L'etude & L'exploitation Des Procedes Georges Claude | フッ化水素を含むフッ素ガスの生成装置 |
US20040074516A1 (en) * | 2002-10-18 | 2004-04-22 | Hogle Richard A. | Sub-atmospheric supply of fluorine to semiconductor process chamber |
JP4584549B2 (ja) * | 2003-05-28 | 2010-11-24 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | フッ素ガス生成装置 |
KR100997964B1 (ko) * | 2003-06-16 | 2010-12-02 | 삼성전자주식회사 | 박막 트랜지스터 표시판의 제조 방법 |
JP4541739B2 (ja) * | 2004-03-26 | 2010-09-08 | 株式会社日立国際電気 | 半導体装置の製造方法、クリーニング方法及び半導体装置の製造装置 |
JP3828915B2 (ja) * | 2004-03-29 | 2006-10-04 | 東京エレクトロン株式会社 | 薄膜形成装置の洗浄方法、薄膜形成装置及びプログラム |
JP4686157B2 (ja) * | 2004-09-29 | 2011-05-18 | 株式会社東芝 | 成膜装置のクリーニング方法 |
JP4494158B2 (ja) * | 2004-10-13 | 2010-06-30 | 東洋炭素株式会社 | ガス発生装置及びガス発生装置の配管温度調節方法 |
US7494943B2 (en) * | 2005-10-20 | 2009-02-24 | Tokyo Electron Limited | Method for using film formation apparatus |
US20110088718A1 (en) * | 2009-10-16 | 2011-04-21 | Matheson Tri-Gas, Inc. | Chamber cleaning methods using fluorine containing cleaning compounds |
KR20130079363A (ko) | 2010-03-26 | 2013-07-10 | 솔베이(소시에떼아노님) | 불소 공급 방법 |
EP2601134A1 (en) * | 2010-08-05 | 2013-06-12 | Solvay Sa | Method for the purification of fluorine |
TWI586842B (zh) * | 2010-09-15 | 2017-06-11 | 首威公司 | 氟之製造工廠及使用彼之方法 |
-
2013
- 2013-09-06 US US14/426,510 patent/US9757775B2/en not_active Expired - Fee Related
- 2013-09-06 KR KR1020157008624A patent/KR20150053782A/ko not_active Application Discontinuation
- 2013-09-06 SG SG11201501811PA patent/SG11201501811PA/en unknown
- 2013-09-06 JP JP2015530407A patent/JP2015534722A/ja active Pending
- 2013-09-06 CN CN201380058826.7A patent/CN104769153A/zh active Pending
- 2013-09-06 WO PCT/EP2013/068437 patent/WO2014037485A1/en active Application Filing
- 2013-09-09 TW TW102132429A patent/TW201430175A/zh unknown
-
2017
- 2017-08-14 US US15/675,910 patent/US20180078976A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20180078976A1 (en) | 2018-03-22 |
JP2015534722A (ja) | 2015-12-03 |
WO2014037485A1 (en) | 2014-03-13 |
CN104769153A (zh) | 2015-07-08 |
TW201430175A (zh) | 2014-08-01 |
KR20150053782A (ko) | 2015-05-18 |
US9757775B2 (en) | 2017-09-12 |
US20150209838A1 (en) | 2015-07-30 |
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