SG11201501811PA - A CHAMBER CLEANING METHOD USING F<sb>2</sb> AND A PROCESS FOR MANUFACTURE OF F<sb>2</sb> FOR THIS METHOD - Google Patents

A CHAMBER CLEANING METHOD USING F<sb>2</sb> AND A PROCESS FOR MANUFACTURE OF F<sb>2</sb> FOR THIS METHOD

Info

Publication number
SG11201501811PA
SG11201501811PA SG11201501811PA SG11201501811PA SG11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA SG 11201501811P A SG11201501811P A SG 11201501811PA
Authority
SG
Singapore
Prior art keywords
manufacture
chamber cleaning
cleaning method
chamber
cleaning
Prior art date
Application number
SG11201501811PA
Inventor
Oliviero Diana
Original Assignee
Solvay
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solvay filed Critical Solvay
Publication of SG11201501811PA publication Critical patent/SG11201501811PA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/10—Process efficiency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Secondary Cells (AREA)
SG11201501811PA 2012-09-10 2013-09-06 A CHAMBER CLEANING METHOD USING F<sb>2</sb> AND A PROCESS FOR MANUFACTURE OF F<sb>2</sb> FOR THIS METHOD SG11201501811PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12183649 2012-09-10
PCT/EP2013/068437 WO2014037485A1 (en) 2012-09-10 2013-09-06 A chamber cleaning method using f2 and a process for manufacture of f2 for this method

Publications (1)

Publication Number Publication Date
SG11201501811PA true SG11201501811PA (en) 2015-04-29

Family

ID=46851839

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201501811PA SG11201501811PA (en) 2012-09-10 2013-09-06 A CHAMBER CLEANING METHOD USING F<sb>2</sb> AND A PROCESS FOR MANUFACTURE OF F<sb>2</sb> FOR THIS METHOD

Country Status (7)

Country Link
US (2) US9757775B2 (en)
JP (1) JP2015534722A (en)
KR (1) KR20150053782A (en)
CN (1) CN104769153A (en)
SG (1) SG11201501811PA (en)
TW (1) TW201430175A (en)
WO (1) WO2014037485A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI541887B (en) * 2010-04-08 2016-07-11 首威公司 Method for the manufacture of electronic devices with purified fluorine
EP3095893A1 (en) 2015-05-22 2016-11-23 Solvay SA A process for etching and chamber cleaning and a gas therefor
CN109326505B (en) * 2018-08-27 2021-12-03 上海中欣晶圆半导体科技有限公司 Method and device for improving final metal cleaning degree of silicon wafer
RU2691350C1 (en) * 2018-09-19 2019-06-11 Общество с ограниченной ответственностью "ПКФ Альянс" Method for cleaning surfaces of machine parts and gas ducts from scale
JP7367703B2 (en) * 2018-12-25 2023-10-24 株式会社レゾナック Deposit removal method and film formation method
WO2024054652A2 (en) * 2022-09-09 2024-03-14 Phoenix Tailings, Inc. Systems and methods for recovery of substances from molten salt electrolysis

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2746448B2 (en) * 1990-02-07 1998-05-06 セントラル硝子株式会社 Mixed gas composition
DE4135917C2 (en) 1991-10-31 1998-07-16 Solvay Fluor & Derivate Process for the separation of organic carbon compounds from hydrogen fluoride
DE4135918A1 (en) 1991-10-31 1993-05-06 Solvay Fluor Und Derivate Gmbh, 3000 Hannover, De MANUFACTURE OF HIGHLY PURE FLUORED HYDROGEN
US5414054A (en) * 1994-06-01 1995-05-09 Miles Inc. Copolycarbonate having improved low-temperature impact strength
GB9418598D0 (en) * 1994-09-14 1994-11-02 British Nuclear Fuels Plc Fluorine cell
GB9904925D0 (en) * 1999-03-04 1999-04-28 Surface Tech Sys Ltd Gas delivery system
JP2003190762A (en) * 2001-12-27 2003-07-08 L'air Liquide Sa Pour L'etude & L'exploitation Des Procedes Georges Claude Apparatus for forming fluorine gas containing hydrogen fluoride
US20040074516A1 (en) * 2002-10-18 2004-04-22 Hogle Richard A. Sub-atmospheric supply of fluorine to semiconductor process chamber
JP4584549B2 (en) * 2003-05-28 2010-11-24 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード Fluorine gas generator
KR100997964B1 (en) * 2003-06-16 2010-12-02 삼성전자주식회사 Manufacturing method of thin film transistor array panel
JP4541739B2 (en) * 2004-03-26 2010-09-08 株式会社日立国際電気 Semiconductor device manufacturing method, cleaning method, and semiconductor device manufacturing apparatus
JP3828915B2 (en) * 2004-03-29 2006-10-04 東京エレクトロン株式会社 Thin film forming apparatus cleaning method, thin film forming apparatus, and program
JP4686157B2 (en) * 2004-09-29 2011-05-18 株式会社東芝 Cleaning method for film forming apparatus
JP4494158B2 (en) * 2004-10-13 2010-06-30 東洋炭素株式会社 Gas generator and method for adjusting piping temperature of gas generator
US7494943B2 (en) * 2005-10-20 2009-02-24 Tokyo Electron Limited Method for using film formation apparatus
US20110088718A1 (en) * 2009-10-16 2011-04-21 Matheson Tri-Gas, Inc. Chamber cleaning methods using fluorine containing cleaning compounds
SG184131A1 (en) 2010-03-26 2012-10-30 Solvay Method for the supply of fluorine
JP5931867B2 (en) * 2010-08-05 2016-06-08 ソルヴェイ（ソシエテ アノニム） Fluorine purification method
TWI586842B (en) 2010-09-15 2017-06-11 首威公司 Plant for fluorine production and a process using it

Also Published As

Publication number Publication date
WO2014037485A1 (en) 2014-03-13
TW201430175A (en) 2014-08-01
US20180078976A1 (en) 2018-03-22
KR20150053782A (en) 2015-05-18
JP2015534722A (en) 2015-12-03
CN104769153A (en) 2015-07-08
US9757775B2 (en) 2017-09-12
US20150209838A1 (en) 2015-07-30

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