SG11201406456XA - Outer periphery polishing apparatus for disk-shaped workpiece - Google Patents
Outer periphery polishing apparatus for disk-shaped workpieceInfo
- Publication number
- SG11201406456XA SG11201406456XA SG11201406456XA SG11201406456XA SG11201406456XA SG 11201406456X A SG11201406456X A SG 11201406456XA SG 11201406456X A SG11201406456X A SG 11201406456XA SG 11201406456X A SG11201406456X A SG 11201406456XA SG 11201406456X A SG11201406456X A SG 11201406456XA
- Authority
- SG
- Singapore
- Prior art keywords
- disk
- outer periphery
- polishing apparatus
- shaped workpiece
- periphery polishing
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0069—Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012105785 | 2012-05-07 | ||
PCT/JP2013/053485 WO2013168444A1 (en) | 2012-05-07 | 2013-02-14 | Circumferential polishing device for disc-shaped workpieces |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201406456XA true SG11201406456XA (en) | 2015-02-27 |
Family
ID=49550506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201406456XA SG11201406456XA (en) | 2012-05-07 | 2013-02-14 | Outer periphery polishing apparatus for disk-shaped workpiece |
Country Status (8)
Country | Link |
---|---|
US (1) | US9358655B2 (en) |
JP (1) | JP6012719B2 (en) |
KR (1) | KR101985219B1 (en) |
CN (1) | CN104284755B (en) |
DE (1) | DE112013002353B4 (en) |
SG (1) | SG11201406456XA (en) |
TW (1) | TWI569921B (en) |
WO (1) | WO2013168444A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106584252B (en) * | 2016-12-30 | 2018-10-12 | 重庆市璧山区中骏机械有限公司 | A kind of motorbike frame pipe bevel grinding apparatus |
CN106903566A (en) * | 2017-04-17 | 2017-06-30 | 四川科星药业有限公司 | A kind of silicon steel post plane correction, burr remover |
KR101809956B1 (en) * | 2017-05-29 | 2017-12-18 | (주)대코 | The Grinding Compression Springs Continuously in which 2 Grinding Stones are installed parallely and oppositely each other, and can be exchanged easily |
WO2020054811A1 (en) * | 2018-09-14 | 2020-03-19 | 株式会社Sumco | Wafer mirror surface chamfering method, wafer manufacturing method, and wafer |
CN111915977B (en) * | 2020-09-04 | 2024-05-17 | 浙江工业大学 | Experimental platform for novel hydrodynamic polishing research |
CN112108984A (en) * | 2020-09-18 | 2020-12-22 | 江西欧丽达实业有限公司 | Acrylic polishing device with adjustable processing angle |
CN114633187B (en) * | 2022-05-19 | 2022-09-06 | 扬州禧德制造技术有限公司 | Automatic production line of grinding machine for grinding hard materials |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1521116A (en) * | 1921-04-07 | 1924-12-30 | George P Miller | Machine for beveling the edges of optical lenses |
KR910001987Y1 (en) * | 1988-08-12 | 1991-03-30 | 박경 | Edge-grinder for plate glass |
US5040342A (en) * | 1988-10-11 | 1991-08-20 | Ppg Industries, Inc. | Method and apparatus for processing glass sheets |
KR920001715Y1 (en) * | 1989-07-12 | 1992-03-13 | 박경 | Revolution speed automatic regulation equipment for swivel table of glass deformation grinder |
KR950011673B1 (en) * | 1991-04-24 | 1995-10-07 | 박경 | Chamfering width main taining and glass plate shape sensing apparatus for use in a glass plate chamfering machine |
KR950012890B1 (en) * | 1992-01-21 | 1995-10-23 | 박경 | Plate glass grinding device |
KR970010915B1 (en) * | 1993-04-14 | 1997-07-02 | 박 경 | Glass grinding machine |
DE4325518A1 (en) | 1993-07-29 | 1995-02-02 | Wacker Chemitronic | Method for smoothing the edge of semiconductor wafers |
TW374043B (en) * | 1996-07-29 | 1999-11-11 | Mitsubishi Materials Corp | Method and apparatus for polishing chamfers of semiconductor wafers |
JPH11221744A (en) * | 1998-02-09 | 1999-08-17 | Mitsubishi Materials Corp | Chamfer polishing device for semiconductor wafer |
JPH11245151A (en) * | 1998-02-27 | 1999-09-14 | Speedfam Co Ltd | Work periphery polishing device |
CN1138612C (en) * | 1998-06-25 | 2004-02-18 | 尤诺瓦英国有限公司 | Waffer edge polishing method and apparatus |
JP3445237B2 (en) * | 2000-10-27 | 2003-09-08 | システム精工株式会社 | Polishing method and polishing apparatus for outer periphery of work |
JP3510584B2 (en) * | 2000-11-07 | 2004-03-29 | スピードファム株式会社 | Peripheral polishing device for disk-shaped workpiece |
JP4416958B2 (en) | 2001-04-06 | 2010-02-17 | スピードファム株式会社 | Semiconductor wafer peripheral polishing apparatus and polishing method |
JP2002329687A (en) * | 2001-05-02 | 2002-11-15 | Speedfam Co Ltd | Apparatus and method of polishing periphery of device wafer |
JP2003145398A (en) * | 2001-11-15 | 2003-05-20 | Systemseiko Co Ltd | Disc workpiece grinding method and device |
JP2004154880A (en) | 2002-11-05 | 2004-06-03 | Hitachi Zosen Corp | Disk-like work periphery polishing device |
JP2003145399A (en) * | 2002-11-15 | 2003-05-20 | Nitmac Er Co Ltd | Mirror chamfering method for chamfered portion of disc semiconductor wafer |
JP2005026274A (en) * | 2003-06-30 | 2005-01-27 | Speedfam Co Ltd | Method of polishing edge of semiconductor wafer |
US6955587B2 (en) | 2004-01-30 | 2005-10-18 | Rohm And Haas Electronic Materials Cmp Holdings, Inc | Grooved polishing pad and method |
JP4815801B2 (en) | 2004-12-28 | 2011-11-16 | 信越半導体株式会社 | Silicon wafer polishing method and manufacturing method, disk-shaped workpiece polishing apparatus, and silicon wafer |
JP2009532210A (en) * | 2006-03-30 | 2009-09-10 | アプライド マテリアルズ インコーポレイテッド | Method and apparatus for polishing an edge of a substrate |
JP2008264941A (en) * | 2007-04-20 | 2008-11-06 | Yuhi Denshi Kk | Device and method for polishing disc-shaped workpiece |
JP2008284684A (en) * | 2007-05-21 | 2008-11-27 | Applied Materials Inc | Method and apparatus for polishing edge of substrate using polishing arm |
JP5254575B2 (en) * | 2007-07-11 | 2013-08-07 | 株式会社東芝 | Polishing apparatus and polishing method |
JP5046775B2 (en) * | 2007-07-30 | 2012-10-10 | 株式会社シライテック | Polishing equipment |
JP5033066B2 (en) | 2008-06-13 | 2012-09-26 | 株式会社Bbs金明 | Polishing apparatus and polishing method for workpiece outer periphery |
JP5352331B2 (en) | 2009-04-15 | 2013-11-27 | ダイトエレクトロン株式会社 | Wafer chamfering method |
JP2011194561A (en) * | 2010-02-26 | 2011-10-06 | Nakamura Tome Precision Ind Co Ltd | Chamfering device for disk-like workpiece |
CN202088048U (en) | 2011-05-23 | 2011-12-28 | 锦州市锦利电器有限公司 | Automatic multistation angle-lapping machine |
-
2013
- 2013-02-14 KR KR1020147031364A patent/KR101985219B1/en active IP Right Grant
- 2013-02-14 WO PCT/JP2013/053485 patent/WO2013168444A1/en active Application Filing
- 2013-02-14 JP JP2014514394A patent/JP6012719B2/en active Active
- 2013-02-14 CN CN201380023886.5A patent/CN104284755B/en active Active
- 2013-02-14 SG SG11201406456XA patent/SG11201406456XA/en unknown
- 2013-02-14 DE DE112013002353.9T patent/DE112013002353B4/en active Active
- 2013-02-14 US US14/398,882 patent/US9358655B2/en active Active
- 2013-05-02 TW TW102115708A patent/TWI569921B/en active
Also Published As
Publication number | Publication date |
---|---|
TW201345655A (en) | 2013-11-16 |
DE112013002353T5 (en) | 2015-02-19 |
KR101985219B1 (en) | 2019-06-03 |
CN104284755A (en) | 2015-01-14 |
JP6012719B2 (en) | 2016-10-25 |
US20150283664A1 (en) | 2015-10-08 |
CN104284755B (en) | 2016-09-21 |
JPWO2013168444A1 (en) | 2016-01-07 |
DE112013002353B4 (en) | 2023-11-23 |
TWI569921B (en) | 2017-02-11 |
US9358655B2 (en) | 2016-06-07 |
KR20150006844A (en) | 2015-01-19 |
WO2013168444A1 (en) | 2013-11-14 |
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