SG11201406439XA - Method for producing hard disk substrate - Google Patents

Method for producing hard disk substrate

Info

Publication number
SG11201406439XA
SG11201406439XA SG11201406439XA SG11201406439XA SG11201406439XA SG 11201406439X A SG11201406439X A SG 11201406439XA SG 11201406439X A SG11201406439X A SG 11201406439XA SG 11201406439X A SG11201406439X A SG 11201406439XA SG 11201406439X A SG11201406439X A SG 11201406439XA
Authority
SG
Singapore
Prior art keywords
hard disk
disk substrate
producing hard
producing
substrate
Prior art date
Application number
SG11201406439XA
Other languages
English (en)
Inventor
Gen Ishida
Nobuaki Mukai
Takahiro Yoshida
Original Assignee
Toyo Kohan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Kohan Co Ltd filed Critical Toyo Kohan Co Ltd
Publication of SG11201406439XA publication Critical patent/SG11201406439XA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73913—Composites or coated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1651—Two or more layers only obtained by electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/858—Producing a magnetic layer by electro-plating or electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1837—Multistep pretreatment
    • C23C18/1844—Multistep pretreatment with use of organic or inorganic compounds other than metals, first

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SG11201406439XA 2012-04-10 2013-04-02 Method for producing hard disk substrate SG11201406439XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012089682A JP5890235B2 (ja) 2012-04-10 2012-04-10 ハードディスク用基板の製造方法
PCT/JP2013/060093 WO2013153992A1 (ja) 2012-04-10 2013-04-02 ハードディスク用基板の製造方法

Publications (1)

Publication Number Publication Date
SG11201406439XA true SG11201406439XA (en) 2014-11-27

Family

ID=49327560

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201406439XA SG11201406439XA (en) 2012-04-10 2013-04-02 Method for producing hard disk substrate

Country Status (6)

Country Link
US (1) US9297078B2 (zh)
JP (1) JP5890235B2 (zh)
CN (1) CN104350542A (zh)
SG (1) SG11201406439XA (zh)
TW (1) TW201411612A (zh)
WO (1) WO2013153992A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150099143A1 (en) * 2013-04-05 2015-04-09 Toyo Kohan Co., Ltd. Method for production of hard disk substrate and hard disk substrate

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62128020A (ja) * 1985-11-28 1987-06-10 Toshikatsu Watabe 非晶質カ−ボン被膜を有する記憶媒体用デイスク
ES2027496A6 (es) 1989-10-12 1992-06-01 Enthone Metodo para precipitar una capa metalica no electrica lisa sobre un substrato de aluminio.
US5141778A (en) 1989-10-12 1992-08-25 Enthone, Incorporated Method of preparing aluminum memory disks having a smooth metal plated finish
US20060289311A1 (en) * 2002-09-10 2006-12-28 Brink Damon D Method for making a base plate for suspension assembly in hard disk drive
JP4408210B2 (ja) * 2002-10-31 2010-02-03 昭和電工株式会社 垂直磁気記録媒体の製造方法
CN1277250C (zh) * 2004-05-13 2006-09-27 周照耀 化学腐蚀降低信息记录薄膜材料介质噪声的方法及其应用
JP2011134419A (ja) * 2009-12-25 2011-07-07 Fuji Electric Device Technology Co Ltd 磁気記録媒体用ディスク基板及びその製造方法
WO2012030566A2 (en) * 2010-09-03 2012-03-08 Omg Electronic Chemicals, Llc Electroless nickel alloy plating bath and process for depositing thereof
SG189274A1 (en) 2010-10-07 2013-05-31 Toyo Kohan Co Ltd Method for production of hard disk substrate and hard disk substrate

Also Published As

Publication number Publication date
WO2013153992A1 (ja) 2013-10-17
US20150125598A1 (en) 2015-05-07
TW201411612A (zh) 2014-03-16
US9297078B2 (en) 2016-03-29
JP2013218764A (ja) 2013-10-24
CN104350542A (zh) 2015-02-11
JP5890235B2 (ja) 2016-03-22

Similar Documents

Publication Publication Date Title
IL263389B (en) A method for the production of modified 5-fluoro-1h-pyrazolopyridines
ZA201401133B (en) Method for producing ternesite
SG11201500924PA (en) Polishing composition and method for producing substrate
IL236173A0 (en) A method of recording data
EP2692834A4 (en) METHOD FOR PRODUCING HYDROCARBONS
EP2662396A4 (en) PROCESS FOR PREPARING POLYCARBONATES
EP2837619A4 (en) PROCESS FOR THE PRODUCTION OF BETA-ALCOXYPROPIONAMIDE
EP2916630A4 (en) SUBSTRATE AND METHOD FOR THE PRODUCTION OF THE SUBSTRATE
EP2824130A4 (en) PROCESS FOR PRODUCING POLYDIALKYLSILANE
IL231834A (en) A method of producing macrocrose
EP2847331A4 (en) PROCESS FOR THE PREPARATION OF TERPENES
GB201404539D0 (en) Method for producing graphene
ZA201500438B (en) Method for producing microcarriers
SG11201501456XA (en) Method for manufacturing magnetic-disk glass substrate
EP2842930A4 (en) PROCESS FOR PRODUCING HYDROXYPHENYLCYCLOHEXANOL COMPOUND
IL231877A0 (en) A method for the production of dithiene tetracarboximides
SG11201501567QA (en) Method for producing 7-octenal
EP2891650A4 (en) PROCESS FOR PRODUCING BIARYLE COMPOUND
EP2868646A4 (en) PROCESS FOR PRODUCING ALDEHYDE
EP2691357A4 (en) PROCESS FOR PRODUCING 1-HEXENE
EP2885697A4 (en) METHOD OF DATA INDEXATION
SG11201406439XA (en) Method for producing hard disk substrate
IL234526A (en) METHOD FOR PRODUCING DIETHINE TETRACARBOXIMIDES
IL231878A0 (en) A method for the production of dithiene tetracarboximides
SG11201505083VA (en) Method for producing glass substrate for magnetic disk and method for producing magnetic disk