SG11201406031YA - Polishing pad and method for producing polishing pad - Google Patents

Polishing pad and method for producing polishing pad

Info

Publication number
SG11201406031YA
SG11201406031YA SG11201406031YA SG11201406031YA SG11201406031YA SG 11201406031Y A SG11201406031Y A SG 11201406031YA SG 11201406031Y A SG11201406031Y A SG 11201406031YA SG 11201406031Y A SG11201406031Y A SG 11201406031YA SG 11201406031Y A SG11201406031Y A SG 11201406031YA
Authority
SG
Singapore
Prior art keywords
polishing pad
producing
producing polishing
pad
polishing
Prior art date
Application number
SG11201406031YA
Inventor
Teppei Tateno
Hirohito Miyasaka
Ryuma Matsuoka
Yoshie Kanazawa
Fumio Miyazawa
Original Assignee
Fujibo Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujibo Holdings Inc filed Critical Fujibo Holdings Inc
Publication of SG11201406031YA publication Critical patent/SG11201406031YA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/4236—Polycondensates having carboxylic or carbonic ester groups in the main chain containing only aliphatic groups
    • C08G18/4238—Polycondensates having carboxylic or carbonic ester groups in the main chain containing only aliphatic groups derived from dicarboxylic acids and dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/44—Polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4825—Polyethers containing two hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4854—Polyethers containing oxyalkylene groups having four carbon atoms in the alkylene group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/74—Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/76—Polyisocyanates or polyisothiocyanates cyclic aromatic
    • C08G18/7657—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
    • C08G18/7664—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups
    • C08G18/7671—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups containing only one alkylene bisphenyl group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C08L75/06—Polyurethanes from polyesters
SG11201406031YA 2012-03-26 2013-03-26 Polishing pad and method for producing polishing pad SG11201406031YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012070037A JP5844189B2 (en) 2012-03-26 2012-03-26 Polishing pad and polishing pad manufacturing method
PCT/JP2013/058690 WO2013146733A1 (en) 2012-03-26 2013-03-26 Polishing pad and method for producing polishing pad

Publications (1)

Publication Number Publication Date
SG11201406031YA true SG11201406031YA (en) 2014-10-30

Family

ID=49259984

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201406031YA SG11201406031YA (en) 2012-03-26 2013-03-26 Polishing pad and method for producing polishing pad

Country Status (8)

Country Link
US (1) US10071460B2 (en)
EP (1) EP2832774B1 (en)
JP (1) JP5844189B2 (en)
KR (1) KR101999418B1 (en)
CN (1) CN104321370B (en)
SG (1) SG11201406031YA (en)
TW (1) TWI592255B (en)
WO (1) WO2013146733A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101763872B1 (en) * 2013-10-04 2017-08-01 주식회사 엘지화학 Poly-urethane mounting pad
KR102394677B1 (en) 2014-05-21 2022-05-09 후지보 홀딩스 가부시키가이샤 Polishing pad and method for manufacturing same
JP6931281B2 (en) * 2016-12-06 2021-09-01 富士紡ホールディングス株式会社 Polishing pad and its manufacturing method
WO2018110590A1 (en) 2016-12-14 2018-06-21 Ｍｃｐｐイノベーション合同会社 Thermoplastic elastomer composition, extrusion-molded article, and medical tube
TWI621501B (en) * 2017-01-06 2018-04-21 三芳化學工業股份有限公司 Polishing pad and polishing apparatus
JP7020836B2 (en) * 2017-09-27 2022-02-16 富士紡ホールディングス株式会社 Holding pad and its manufacturing method
JP7020837B2 (en) * 2017-09-27 2022-02-16 富士紡ホールディングス株式会社 Holding pad and its manufacturing method
JP7331454B2 (en) * 2019-05-17 2023-08-23 Dic株式会社 Method for manufacturing porous body
US20210323116A1 (en) * 2020-04-18 2021-10-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Offset pore poromeric polishing pad
US11667061B2 (en) * 2020-04-18 2023-06-06 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of forming leveraged poromeric polishing pad
TW202225286A (en) 2020-09-30 2022-07-01 日商富士紡控股股份有限公司 Polishing pad and method for manufacturing polishing pad
CN114670119B (en) * 2021-04-27 2024-01-12 宁波赢伟泰科新材料有限公司 Chemical mechanical polishing pad capable of improving polishing efficiency and preparation method thereof
CN114716720A (en) * 2022-03-10 2022-07-08 陕西科技大学 Preparation method of vertical ordered polyurethane microporous membrane

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US3100721A (en) * 1961-02-21 1963-08-13 Du Pont Process for producing microporous films and coatings
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US4028451A (en) * 1969-06-03 1977-06-07 Porvair Limited Method of making water vapor permeable polymer sheet material
JPS5848579B2 (en) * 1974-10-03 1983-10-29 テイジンコ−ドレ カブシキガイシヤ Bitako Seishi - Tozairiyouno Seizouhou
US4927432A (en) 1986-03-25 1990-05-22 Rodel, Inc. Pad material for grinding, lapping and polishing
US4753838A (en) 1986-06-16 1988-06-28 Tsuguji Kimura Polishing sheet material and method for its production
US4841680A (en) * 1987-08-25 1989-06-27 Rodel, Inc. Inverted cell pad material for grinding, lapping, shaping and polishing
JPH02220838A (en) 1989-02-22 1990-09-04 Rodeele Nitta Kk Laminate and support material of member to be polished and polishing cloth used therewith
JPH1199480A (en) * 1997-09-30 1999-04-13 Teijin Ltd Polishing pad
WO2002002274A2 (en) * 2000-06-30 2002-01-10 Rodel Holdings, Inc. Base-pad for a polishing pad
JP2002117532A (en) * 2000-10-11 2002-04-19 Nippon Sheet Glass Co Ltd Glass substrate for information recording medium and its manufacturing method
US6949128B2 (en) * 2001-12-28 2005-09-27 3M Innovative Properties Company Method of making an abrasive product
JP4373152B2 (en) 2003-07-17 2009-11-25 東レコーテックス株式会社 Polishing sheet
KR20060099398A (en) 2005-03-08 2006-09-19 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드 Water-based polishing pads and methods of manufacture
EP1995053B1 (en) * 2006-02-20 2013-05-01 Daicel Chemical Industries, Ltd. Porous film and layered product including porous film
WO2007125943A1 (en) * 2006-04-26 2007-11-08 Toyo Boseki Kabushiki Kaisha Polymeric porous hollow fiber membrane
JP4465376B2 (en) 2006-09-08 2010-05-19 東洋ゴム工業株式会社 Polishing pad manufacturing method
WO2008029537A1 (en) 2006-09-08 2008-03-13 Toyo Tire & Rubber Co., Ltd. Method for production of polishing pad
JP5078527B2 (en) * 2007-09-28 2012-11-21 富士紡ホールディングス株式会社 Polishing cloth
US20110171890A1 (en) * 2008-08-08 2011-07-14 Kuraray Co., Ltd. Polishing pad and method for manufacturing the polishing pad
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JP5274286B2 (en) * 2009-02-06 2013-08-28 富士紡ホールディングス株式会社 Polishing pad manufacturing method
JP5534694B2 (en) 2009-03-30 2014-07-02 富士紡ホールディングス株式会社 Polishing pad and method of manufacturing polishing pad
JP5371661B2 (en) 2009-09-28 2013-12-18 富士紡ホールディングス株式会社 Polishing pad
JP5608398B2 (en) * 2010-03-26 2014-10-15 富士紡ホールディングス株式会社 Polishing pad

Also Published As

Publication number Publication date
CN104321370A (en) 2015-01-28
TW201350264A (en) 2013-12-16
WO2013146733A1 (en) 2013-10-03
KR101999418B1 (en) 2019-07-11
US20150068129A1 (en) 2015-03-12
EP2832774A1 (en) 2015-02-04
US10071460B2 (en) 2018-09-11
KR20140147859A (en) 2014-12-30
JP5844189B2 (en) 2016-01-13
JP2013199618A (en) 2013-10-03
TWI592255B (en) 2017-07-21
CN104321370B (en) 2017-07-07
EP2832774B1 (en) 2017-01-18
EP2832774A4 (en) 2015-10-14

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